Don W. Jillie Jr.

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Cupertino, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Process for etching silicon dioxide layer without micro masking effect
- Patent number 5,296,094
- Issue date Mar 22, 1994
- Intel Corporation
- Hongging Shan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching process for MOS circuit pregate etching utiliizing a...
- Patent number 4,808,259
- Issue date Feb 28, 1989
- Intel Corporation
- Don W. Jillie
- H01 - BASIC ELECTRIC ELEMENTS