Donald Clifford Hofer

Person

San Martin, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
High silicon content monomers and polymers suitable for 193 nm bila...
- Patent number 6,653,048
- Issue date Nov 25, 2003
- International Business Machines Corp.
- Phillip Joe Brock
- G11 - INFORMATION STORAGE
Information Patent Grant
Process for using bilayer photoresist
- Patent number RE38282
- Issue date Oct 21, 2003
- International Business Machines Corporation
- Robert David Allen
- 430 - Radiation imagery chemistry: process, composition, or product thereof
Information Patent Grant
Hydroxycarborane photoresists and process for using same in bilayer...
- Patent number 6,482,566
- Issue date Nov 19, 2002
- International Business Machines Corporation
- Donald C. Hofer
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
High silicon content monomers and polymers suitable for 193 nm bila...
- Patent number 6,444,408
- Issue date Sep 3, 2002
- International Business Machines Corporation
- Phillip Joe Brock
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for imaging of photoresist
- Patent number 6,277,546
- Issue date Aug 21, 2001
- International Business Machines Corporation
- Gregory Breyta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition with radiation sensitive acid generator
- Patent number 6,165,673
- Issue date Dec 26, 2000
- International Business Machines Corporation
- Gregory Breyta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for using bilayer photoresist
- Patent number 5,985,524
- Issue date Nov 16, 1999
- International Business Machines Incorporated
- Robert David Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition with radiation sensitive acid generator
- Patent number 5,585,220
- Issue date Dec 17, 1996
- International Business Machines Corporation
- Gregory Breyta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for making an imaged oxygen-reactive ion etch barrier
- Patent number 4,464,460
- Issue date Aug 7, 1984
- International Business Machines Corporation
- Hiroyuki Hiraoka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for reducing homonuclear broadening in magnetic resonance sp...
- Patent number 4,291,272
- Issue date Sep 22, 1981
- International Business Machines Corporation
- Donald C. Hofer
- G01 - MEASURING TESTING
Information Patent Grant
NMR field frequency lock system
- Patent number 4,110,681
- Issue date Aug 29, 1978
- International Business Machines Corporation
- Donald C. Hofer
- G01 - MEASURING TESTING
Information Patent Grant
Quantitative analysis of nuclear magnetic resonance spectra having...
- Patent number 4,081,742
- Issue date Mar 28, 1978
- International Business Machines Corporation
- Donald C. Hofer
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
High silicon content monomers and polymers suitable for 193 nm bila...
- Publication number 20020127490
- Publication date Sep 12, 2002
- International Business Machines Corporation
- Phillip Joe Brock
- G11 - INFORMATION STORAGE

Donald Clifford Hofer

Person

Patents Grantslast 30 patents

High silicon content monomers and polymers suitable for 193 nm bila...

Process for using bilayer photoresist

Hydroxycarborane photoresists and process for using same in bilayer...

High silicon content monomers and polymers suitable for 193 nm bila...

Process for imaging of photoresist

Resist composition with radiation sensitive acid generator

Process for using bilayer photoresist

Resist composition with radiation sensitive acid generator

Process for making an imaged oxygen-reactive ion etch barrier

Method for reducing homonuclear broadening in magnetic resonance sp...

NMR field frequency lock system

Quantitative analysis of nuclear magnetic resonance spectra having...

Patents Applicationslast 30 patents

High silicon content monomers and polymers suitable for 193 nm bila...