Donald L. White

Person

Lake Parsippany, NJ, US

People

Patents Grantslast 30 patents

Information Patent Grant
Holder, system, and process for improving overlay in lithography
- Patent number 6,847,433
- Issue date Jan 25, 2005
- Agere Systems, INC
- Donald L. White
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Lithographic process for device fabrication using dark-field illumi...
- Patent number 6,379,868
- Issue date Apr 30, 2002
- Agere Systems Guardian Corp.
- Donald Lawrence White
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic process for device fabrication using a multilayer mask...
- Patent number 6,042,995
- Issue date Mar 28, 2000
- Lucent Technologies Inc.
- Donald Lawrence White
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Optical lithographical imaging system including optical transmissio...
- Patent number RE35753
- Issue date Mar 24, 1998
- Lucent Technologies Inc.
- Eric L. Raab
- 430 - Radiation imagery chemistry: process, composition, or product thereof
Information Patent Grant
High resolution remote position detection using segmented gratings
- Patent number 5,654,540
- Issue date Aug 5, 1997
- Stuart Stanton
- G01 - MEASURING TESTING
Information Patent Grant
Sub-micron through-the-lens positioning utilizing out of phase segm...
- Patent number 5,596,413
- Issue date Jan 21, 1997
- Lucent Technologies Inc.
- Stuart Stanton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern delineating apparatus for use in the EUV spectrum
- Patent number 5,521,031
- Issue date May 28, 1996
- AT&T Corp.
- Donald M. Tennant
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Device fabrication using DUV/EUV pattern delineation
- Patent number 5,510,230
- Issue date Apr 23, 1996
- AT&T Corp.
- Donald M. Tennant
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Fluoresence imaging
- Patent number 5,498,923
- Issue date Mar 12, 1996
- AT&T Corp.
- Bruno M. La Fontaine
- G02 - OPTICS
Information Patent Grant
Device fabrication entailing synchrotron radiation
- Patent number 5,439,781
- Issue date Aug 8, 1995
- AT&T Corp.
- Alastair A. MacDowell
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Device fabrication entailing plasma-derived x-ray delineation
- Patent number 5,339,346
- Issue date Aug 16, 1994
- AT&T Bell Laboratories
- Donald L. White
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Optical lithographical imaging system including optical transmissio...
- Patent number 5,320,918
- Issue date Jun 14, 1994
- AT&T Bell Laboratories
- Eric L. Raab
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sub-micron device fabrication with a phase shift mask having multip...
- Patent number 5,229,255
- Issue date Jul 20, 1993
- AT&T Bell Laboratories
- Donald L. White
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sub-micron device fabrication
- Patent number 5,217,831
- Issue date Jun 8, 1993
- AT&T Bell Laboratories
- Donald L. White
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sub-micron imaging
- Patent number 5,091,979
- Issue date Feb 25, 1992
- AT&T Bell Laboratories
- Donald L. White
- G02 - OPTICS
Information Patent Grant
Resolution doubling lithography technique
- Patent number 4,947,413
- Issue date Aug 7, 1990
- AT&T Bell Laboratories
- Tatiana E. Jewell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment of lithographic system
- Patent number 4,923,301
- Issue date May 8, 1990
- American Telephone and Telegraph Company
- Donald L. White
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask-to-wafer alignment utilizing zone plates
- Patent number 4,614,433
- Issue date Sep 30, 1986
- AT&T Bell Laboratories
- Martin Feldman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wafer tilt compensation in zone plate alignment system
- Patent number 4,398,824
- Issue date Aug 16, 1983
- Bell Telephone Laboratories, Incorporated
- Martin Feldman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for aligning mask and wafer members
- Patent number 4,326,805
- Issue date Apr 27, 1982
- Bell Telephone Laboratories, Incorporated
- Martin Feldman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for determining feature-size accuracy of circuit patterns
- Patent number 3,998,639
- Issue date Dec 21, 1976
- Bell Telephone Laboratories, Incorporated
- Martin Feldman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection of masks and wafers by image dissection
- Patent number 3,963,354
- Issue date Jun 15, 1976
- Bell Telephone Laboratories, Incorporated
- Martin Feldman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Holder, system, and process for improving overlay in lithography
- Publication number 20030081193
- Publication date May 1, 2003
- Donald L. White
- B82 - NANO-TECHNOLOGY

Donald L. White

Person

Patents Grantslast 30 patents

Holder, system, and process for improving overlay in lithography

Lithographic process for device fabrication using dark-field illumi...

Lithographic process for device fabrication using a multilayer mask...

Optical lithographical imaging system including optical transmissio...

High resolution remote position detection using segmented gratings

Sub-micron through-the-lens positioning utilizing out of phase segm...

Pattern delineating apparatus for use in the EUV spectrum

Device fabrication using DUV/EUV pattern delineation

Fluoresence imaging

Device fabrication entailing synchrotron radiation

Device fabrication entailing plasma-derived x-ray delineation

Optical lithographical imaging system including optical transmissio...

Sub-micron device fabrication with a phase shift mask having multip...

Sub-micron device fabrication

Sub-micron imaging

Resolution doubling lithography technique

Alignment of lithographic system

Mask-to-wafer alignment utilizing zone plates

Wafer tilt compensation in zone plate alignment system

Method and apparatus for aligning mask and wafer members

Methods for determining feature-size accuracy of circuit patterns

Inspection of masks and wafers by image dissection

Patents Applicationslast 30 patents

Holder, system, and process for improving overlay in lithography