Dong Li

Person

Phoenix, AZ, US

People

Patents Grantslast 30 patents

Information Patent Grant
Methods for depositing a transition metal nitride film on a substra...
- Patent number 11,976,361
- Issue date May 7, 2024
- ASM IP Holding B.V.
- Eric James Shero
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for treatment of deposition reactor
- Patent number 11,967,488
- Issue date Apr 23, 2024
- ASM IP Holding B.V.
- Suvi Haukka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for depositing a material film on a substrate within a react...
- Patent number 11,501,973
- Issue date Nov 15, 2022
- ASM IP Holding B.V.
- Petri Raisanen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for depositing a transition metal nitride film on a substra...
- Patent number 11,306,395
- Issue date Apr 19, 2022
- ASM IP Holding B.V.
- Eric James Shero
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming a doped metal carbide film on a substrate and rel...
- Patent number 11,056,567
- Issue date Jul 6, 2021
- ASM IP Holding B.V.
- Dong Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for depositing a material film on a substrate within a react...
- Patent number 10,872,771
- Issue date Dec 22, 2020
- ASM IP Holding B.V.
- Petri Raisanen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Atomic layer deposition of metal carbide films using aluminum hydro...
- Patent number 9,631,272
- Issue date Apr 25, 2017
- ASM America, Inc.
- Dong Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Silane and borane treatments for titanium carbide films
- Patent number 9,583,348
- Issue date Feb 28, 2017
- ASM IP Holding B.V.
- Jerry Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma-enhanced atomic layer deposition of conductive material over...
- Patent number 9,466,574
- Issue date Oct 11, 2016
- ASM America, Inc.
- Robert B. Milligan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Silane and borane treatments for titanium carbide films
- Patent number 9,236,247
- Issue date Jan 12, 2016
- ASM IP Holding B.V.
- Jerry Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for treatment of deposition reactor
- Patent number 9,228,259
- Issue date Jan 5, 2016
- ASM IP Holding B.V.
- Suvi Haukka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Silane and borane treatments for titanium carbide films
- Patent number 8,841,182
- Issue date Sep 23, 2014
- ASM IP Holding B.V.
- Jerry Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition of ruthenium or ruthenium dioxide
- Patent number 8,329,569
- Issue date Dec 11, 2012
- ASM America, Inc.
- Dong Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma-enhanced pulsed deposition of metal carbide films
- Patent number 7,666,474
- Issue date Feb 23, 2010
- ASM America, Inc.
- Dong Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
METHOD, SYSTEM AND APPARATUS FOR SURFACE MODIFICATION
- Publication number 20240371662
- Publication date Nov 7, 2024
- ASM IP HOLDING B.V.
- Rajkumar Jakkaraju
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR TREATMENT OF DEPOSITION REACTOR
- Publication number 20240014012
- Publication date Jan 11, 2024
- ASM IP HOLDING B.V.
- Suvi Haukka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR DEPOSITION OF MOLYBDENUM FOR SOURCE/DRAIN C...
- Publication number 20230298902
- Publication date Sep 21, 2023
- ASM IP HOLDING B.V.
- Jiyeon Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STRUCTURE AND DEVICE INCLUDING METAL CARBON NITRIDE LAYER AND METHO...
- Publication number 20230238243
- Publication date Jul 27, 2023
- ASM IP HOLDING B.V.
- Mojtaba Samiee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR TREATMENT OF DEPOSITION REACTOR
- Publication number 20230230813
- Publication date Jul 20, 2023
- ASM IP HOLDING B.V.
- Suvi Haukka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEMS AND METHODS FOR CLEANING AND TREATING A SURFACE OF A SUBSTRATE
- Publication number 20230215763
- Publication date Jul 6, 2023
- ASM IP HOLDING B.V.
- YoungChol Byun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METAL-ON-METAL DEPOSITION METHODS FOR FILLING A GAP FEATURE ON A SU...
- Publication number 20230160057
- Publication date May 25, 2023
- ASM IP HOLDING B.V.
- Jiyeon Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METAL-ON-METAL DEPOSITION METHODS FOR FILLING A GAP FEATURE ON A SU...
- Publication number 20230163028
- Publication date May 25, 2023
- ASM IP HOLDING B.V.
- Salvatore Luiso
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR TREATMENT OF DEPOSITION REACTOR
- Publication number 20220277937
- Publication date Sep 1, 2022
- ASM IP HOLDING B.V.
- Suvi Haukka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR DEPOSITING A TRANSITION METAL NITRIDE FILM ON A SUBSTRA...
- Publication number 20220228264
- Publication date Jul 21, 2022
- ASM IP HOLDING B.V.
- Eric James Shero
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR DEPOSITING A TITANIUM ALUMINUM CARBIDE FILM STRUCTURE O...
- Publication number 20220051895
- Publication date Feb 17, 2022
- ASM IP HOLDING B.V.
- Petri Raisanen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING A DOPED METAL CARBIDE FILM ON A SUBSTRATE AND RE...
- Publication number 20210328036
- Publication date Oct 21, 2021
- ASM IP HOLDING B.V.
- Dong Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR DEPOSITING A MATERIAL FILM ON A SUBSTRATE WITHIN A REACT...
- Publication number 20210066084
- Publication date Mar 4, 2021
- ASM IP HOLDING B.V.
- Petri Raisanen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FORMING A DOPED METAL CARBIDE FILM ON A SUBSTRATE AND REL...
- Publication number 20190348515
- Publication date Nov 14, 2019
- ASM IP HOLDING B.V.
- Dong Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR DEPOSITING A MATERIAL FILM ON A SUBSTRATE WITHIN A REACT...
- Publication number 20190221433
- Publication date Jul 18, 2019
- ASM IP HOLDING B.V.
- Petri Raisanen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR DEPOSITING A TRANSITION METAL NITRIDE FILM ON A SUBSTRA...
- Publication number 20190003052
- Publication date Jan 3, 2019
- ASM IP HOLDING B.V.
- Eric James Shero
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SILANE AND BORANE TREATMENTS FOR TITANIUM CARBIDE FILMS
- Publication number 20170154778
- Publication date Jun 1, 2017
- ASM IP HOLDING B.V.
- Jerry Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM FOR TREATMENT OF DEPOSITION REACTOR
- Publication number 20160376700
- Publication date Dec 29, 2016
- ASM IP HOLDING B.V.
- Suvi Haukka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SILANE AND BORANE TREATMENTS FOR TITANIUM CARBIDE FILMS
- Publication number 20160196977
- Publication date Jul 7, 2016
- ASM IP HOLDING B.V.
- Jerry Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR TREATMENT OF DEPOSITION REACTOR
- Publication number 20160115590
- Publication date Apr 28, 2016
- ASM IP HOLDING B.V.
- Suvi Haukka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SILANE AND BORANE TREATMENTS FOR TITANIUM CARBIDE FILMS
- Publication number 20150179440
- Publication date Jun 25, 2015
- ASM IP HOLDING B.V.
- Jerry Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILANE AND BORANE TREATMENTS FOR TITANIUM CARBIDE FILMS
- Publication number 20140273510
- Publication date Sep 18, 2014
- Jerry Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR TREATMENT OF DEPOSITION REACTOR
- Publication number 20140220247
- Publication date Aug 7, 2014
- ASM IP HOLDING B.V.
- Suvi Haukka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ATOMIC LAYER DEPOSITION OF METAL CARBIDE FILMS USING ALUMINUM HYDRO...
- Publication number 20140127405
- Publication date May 8, 2014
- ASM AMERICA, INC
- Dong Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA-ENHANCED ATOMIC LAYER DEPOSITION OF CONDUCTIVE MATERIAL OVER...
- Publication number 20140008803
- Publication date Jan 9, 2014
- ASM AMERICA, INC
- Robert B. Milligan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TERNARY METAL ALLOYS WITH TUNABLE STOICHIOMETRIES
- Publication number 20120100308
- Publication date Apr 26, 2012
- ASM AMERICA, INC
- Robert B. Milligan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITION OF RUTHENIUM OR RUTHENIUM DIOXIDE
- Publication number 20110027977
- Publication date Feb 3, 2011
- ASM AMERICA, INC
- Dong Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA-ENHANCED ATOMIC LAYER DEPOSITION OF CONDUCTIVE MATERIAL OVER...
- Publication number 20100193955
- Publication date Aug 5, 2010
- ASM AMERICA, INC
- Robert B. Milligan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ATOMIC LAYER DEPOSITION OF METAL CARBIDE FILMS USING ALUMINUM HYDRO...
- Publication number 20090315093
- Publication date Dec 24, 2009
- ASM AMERICA, INC
- Dong LI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA-ENHANCED PULSED DEPOSITION OF METAL CARBIDE FILMS
- Publication number 20090280267
- Publication date Nov 12, 2009
- ASM AMERICA, INC
- Dong Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Person

Patents Grantslast 30 patents

Methods for depositing a transition metal nitride film on a substra...

Method for treatment of deposition reactor

Method for depositing a material film on a substrate within a react...

Methods for depositing a transition metal nitride film on a substra...

Method of forming a doped metal carbide film on a substrate and rel...

Method for depositing a material film on a substrate within a react...

Atomic layer deposition of metal carbide films using aluminum hydro...

Silane and borane treatments for titanium carbide films

Plasma-enhanced atomic layer deposition of conductive material over...

Silane and borane treatments for titanium carbide films

Method for treatment of deposition reactor

Silane and borane treatments for titanium carbide films

Deposition of ruthenium or ruthenium dioxide

Plasma-enhanced pulsed deposition of metal carbide films

Patents Applicationslast 30 patents

METHOD, SYSTEM AND APPARATUS FOR SURFACE MODIFICATION

METHOD FOR TREATMENT OF DEPOSITION REACTOR

SYSTEMS AND METHODS FOR DEPOSITION OF MOLYBDENUM FOR SOURCE/DRAIN C...

STRUCTURE AND DEVICE INCLUDING METAL CARBON NITRIDE LAYER AND METHO...

METHOD FOR TREATMENT OF DEPOSITION REACTOR

SYSTEMS AND METHODS FOR CLEANING AND TREATING A SURFACE OF A SUBSTRATE

METAL-ON-METAL DEPOSITION METHODS FOR FILLING A GAP FEATURE ON A SU...

METAL-ON-METAL DEPOSITION METHODS FOR FILLING A GAP FEATURE ON A SU...

METHOD FOR TREATMENT OF DEPOSITION REACTOR

METHODS FOR DEPOSITING A TRANSITION METAL NITRIDE FILM ON A SUBSTRA...

METHODS FOR DEPOSITING A TITANIUM ALUMINUM CARBIDE FILM STRUCTURE O...

METHOD FOR FORMING A DOPED METAL CARBIDE FILM ON A SUBSTRATE AND RE...

METHOD FOR DEPOSITING A MATERIAL FILM ON A SUBSTRATE WITHIN A REACT...

METHOD OF FORMING A DOPED METAL CARBIDE FILM ON A SUBSTRATE AND REL...

METHOD FOR DEPOSITING A MATERIAL FILM ON A SUBSTRATE WITHIN A REACT...

METHODS FOR DEPOSITING A TRANSITION METAL NITRIDE FILM ON A SUBSTRA...

SILANE AND BORANE TREATMENTS FOR TITANIUM CARBIDE FILMS

SYSTEM FOR TREATMENT OF DEPOSITION REACTOR

SILANE AND BORANE TREATMENTS FOR TITANIUM CARBIDE FILMS

METHOD AND SYSTEM FOR TREATMENT OF DEPOSITION REACTOR

SILANE AND BORANE TREATMENTS FOR TITANIUM CARBIDE FILMS

SILANE AND BORANE TREATMENTS FOR TITANIUM CARBIDE FILMS

METHOD AND SYSTEM FOR TREATMENT OF DEPOSITION REACTOR

ATOMIC LAYER DEPOSITION OF METAL CARBIDE FILMS USING ALUMINUM HYDRO...

PLASMA-ENHANCED ATOMIC LAYER DEPOSITION OF CONDUCTIVE MATERIAL OVER...

TERNARY METAL ALLOYS WITH TUNABLE STOICHIOMETRIES

DEPOSITION OF RUTHENIUM OR RUTHENIUM DIOXIDE

PLASMA-ENHANCED ATOMIC LAYER DEPOSITION OF CONDUCTIVE MATERIAL OVER...

ATOMIC LAYER DEPOSITION OF METAL CARBIDE FILMS USING ALUMINUM HYDRO...

PLASMA-ENHANCED PULSED DEPOSITION OF METAL CARBIDE FILMS