Dong-Shiuh Cheng

Person

Hsin-chu, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Structure and method for E-beam in-chip overlay mark
- Patent number 9,230,867
- Issue date Jan 5, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Dong-Hsu Cheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Structure and method for E-beam writing
- Patent number 9,136,092
- Issue date Sep 15, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chi-Ta Lu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System and method for lithography exposure with correction of overl...
- Patent number 9,081,293
- Issue date Jul 14, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Dong-Hsu Cheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Layout decomposition method
- Patent number 8,959,460
- Issue date Feb 17, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wen-Chun Huang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Structure and method for E-beam in-chip overlay mark
- Patent number 8,736,084
- Issue date May 27, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Dong-Hsu Cheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography performance check methods and apparatus
- Patent number 8,650,511
- Issue date Feb 11, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chi-Ta Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask making with error recognition
- Patent number 8,555,211
- Issue date Oct 8, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jia-Guei Jou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Cycle time reduction in data preparation
- Patent number 8,458,631
- Issue date Jun 4, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chi-Ta Lu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Superimpose photomask and method of patterning
- Patent number 8,133,661
- Issue date Mar 13, 2012
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsiao Chih Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle with antistatic coating
- Patent number 7,514,184
- Issue date Apr 7, 2009
- Taiwan Semiconductor Manufacturing Co.
- Wei-Yu Su
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle with antistatic coating
- Patent number 7,029,800
- Issue date Apr 18, 2006
- Taiwan Semiconductor Manufacturing Co. Ltd
- Wei-Yu Su
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle pod and reticle with cut areas
- Patent number 6,948,619
- Issue date Sep 27, 2005
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wei-Yu Su
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic discharge damage prevention method on masks
- Patent number 6,365,303
- Issue date Apr 2, 2002
- Taiwan Semiconductor Manufacturing Company
- Chang-Cheng Hung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electrostatic discharge-free container equipped with metal shield
- Patent number 6,247,599
- Issue date Jun 19, 2001
- Taiwan Semiconductor Manufacturing Company, Ltd
- Dong-Hsu Cheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Combination nozzle and vacuum hood that is self cleaning
- Patent number 5,988,526
- Issue date Nov 23, 1999
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chung-Hao Tzeng
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Method and apparatus for controlling air flow in a liquid coater
- Patent number 5,962,193
- Issue date Oct 5, 1999
- Taiwan Semiconductor Manufacturing Co. Ltd.
- Kuang-Hung Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for elimination of alignment field gap
- Patent number 5,871,889
- Issue date Feb 16, 1999
- Taiwan Semiconductor Manufacting Company, Ltd.
- Jian-Huei Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Avoid photoresist lifting by post-oxide-dep plasma treatment
- Patent number 5,807,660
- Issue date Sep 15, 1998
- Taiwan Semiconductor Manufacturing Company Ltd.
- Kuang-Hung Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for eliminating charging of photoresist on specimens during...
- Patent number 5,783,366
- Issue date Jul 21, 1998
- Taiwan Semiconductor Manufacturing Company Ltd.
- Hsin-Pai Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Combination nozzle and vacuum hood that is self cleaning
- Patent number 5,756,155
- Issue date May 26, 1998
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chung-Hao Tzeng
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...

Patents Applicationslast 30 patents

Information Patent Application
System and Method for Lithography Exposure With Correction of Overl...
- Publication number 20150316861
- Publication date Nov 5, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Dong-Hsu Cheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LAYOUT DECOMPOSITION METHOD
- Publication number 20150040082
- Publication date Feb 5, 2015
- TAIWAN SEMICONDUCTOR MANUFACTURING COMAPNY, LTD.
- Wen-Chun HUANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
System and Method for Lithography Exposure with Correction of Overl...
- Publication number 20140272717
- Publication date Sep 18, 2014
- Dong-Hsu Cheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Structure and Method for E-Beam In-Chip Overlay Mark
- Publication number 20140256067
- Publication date Sep 11, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Dong-Hsu Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Structure and Method for E-Beam Writing
- Publication number 20130268901
- Publication date Oct 10, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chi-Ta Lu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MASK MAKING WITH ERROR RECOGNITION
- Publication number 20130239072
- Publication date Sep 12, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jia-Guei Jou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
STRUCTURE AND METHOD FOR E-BEAM IN-CHIP OVERLAY MARK
- Publication number 20130147066
- Publication date Jun 13, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Dong-Hsu Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CYCLE TIME REDUCTION IN DATA PREPARATION
- Publication number 20130042210
- Publication date Feb 14, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chi-Ta Lu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Lithography Performance Check Methods and Apparatus
- Publication number 20110271239
- Publication date Nov 3, 2011
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chi-Ta Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUPERIMPOSE PHOTOMASK AND METHOD OF PATTERNING
- Publication number 20110091797
- Publication date Apr 21, 2011
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsiao Chih Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK AND METHOD OF FABRICATING A PHOTOMASK
- Publication number 20100081065
- Publication date Apr 1, 2010
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Dong-Hsu Cheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reticle with antistatic coating
- Publication number 20050186488
- Publication date Aug 25, 2005
- Taiwan Semiconductor Manufacturing Co. Ltd.
- Wei-Yu Su
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reticle with antistatic coating
- Publication number 20040076834
- Publication date Apr 22, 2004
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wei-Yu Su
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reticle pod
- Publication number 20040005209
- Publication date Jan 8, 2004
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wei-Yu Su
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Dong-Shiuh Cheng

Person

Patents Grantslast 30 patents

Structure and method for E-beam in-chip overlay mark

Structure and method for E-beam writing

System and method for lithography exposure with correction of overl...

Layout decomposition method

Structure and method for E-beam in-chip overlay mark

Lithography performance check methods and apparatus

Mask making with error recognition

Cycle time reduction in data preparation

Superimpose photomask and method of patterning

Reticle with antistatic coating

Reticle with antistatic coating

Reticle pod and reticle with cut areas

Electrostatic discharge damage prevention method on masks

Electrostatic discharge-free container equipped with metal shield

Combination nozzle and vacuum hood that is self cleaning

Method and apparatus for controlling air flow in a liquid coater

Method for elimination of alignment field gap

Avoid photoresist lifting by post-oxide-dep plasma treatment

Method for eliminating charging of photoresist on specimens during...

Combination nozzle and vacuum hood that is self cleaning

Patents Applicationslast 30 patents

System and Method for Lithography Exposure With Correction of Overl...

LAYOUT DECOMPOSITION METHOD

System and Method for Lithography Exposure with Correction of Overl...

Structure and Method for E-Beam In-Chip Overlay Mark

Structure and Method for E-Beam Writing

MASK MAKING WITH ERROR RECOGNITION

STRUCTURE AND METHOD FOR E-BEAM IN-CHIP OVERLAY MARK

CYCLE TIME REDUCTION IN DATA PREPARATION

Lithography Performance Check Methods and Apparatus

SUPERIMPOSE PHOTOMASK AND METHOD OF PATTERNING

PHOTOMASK AND METHOD OF FABRICATING A PHOTOMASK

Reticle with antistatic coating

Reticle with antistatic coating

Reticle pod