Dong-Yo Jheng

Person

Hsinchu, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Optical proximity correction and photomasks
- Patent number 11,789,370
- Issue date Oct 17, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Dong-Yo Jheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical proximity correction and photomasks
- Patent number 11,243,472
- Issue date Feb 8, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Dong-Yo Jheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Hybrid double patterning method for semiconductor manufacture
- Patent number 10,770,304
- Issue date Sep 8, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ken-Hsien Hsieh
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optical proximity correction and photomasks
- Patent number 10,678,142
- Issue date Jun 9, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Dong-Yo Jheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Hybrid double patterning method for semiconductor manufacture
- Patent number 10,483,120
- Issue date Nov 19, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ken-Hsien Hsieh
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Hybrid double patterning method for semiconductor manufacture
- Patent number 10,276,394
- Issue date Apr 30, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ken-Hsien Hsieh
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
OPTICAL PROXIMITY CORRECTION AND PHOTOMASKS
- Publication number 20230384691
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Co., LTD
- Dong-Yo Jheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optical Proximity Correction and Photomasks
- Publication number 20220155692
- Publication date May 19, 2022
- Taiwan Semiconductor Manufacturing Co., LTD
- Dong-Yo Jheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optical Proximity Correction and Photomasks
- Publication number 20200301289
- Publication date Sep 24, 2020
- Taiwan Semiconductor Manufacturing Co., LTD
- Dong-Yo Jheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Hybrid Double Patterning Method for Semiconductor Manufacture
- Publication number 20200083058
- Publication date Mar 12, 2020
- Taiwan Semiconductor Manufacturing Co., LTD
- Ken-Hsien Hsieh
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Hybrid Double Patterning Method for Semiconductor Manufacture
- Publication number 20190252200
- Publication date Aug 15, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ken-Hsien Hsieh
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Optical Proximity Correction and Photomasks
- Publication number 20190146355
- Publication date May 16, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Dong-Yo Jheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Hybrid Double Patterning Method for Semiconductor Manufacture
- Publication number 20190080921
- Publication date Mar 14, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ken-Hsien Hsieh
- G06 - COMPUTING CALCULATING COUNTING

Dong-Yo Jheng

Person

Patents Grantslast 30 patents

Optical proximity correction and photomasks

Optical proximity correction and photomasks

Hybrid double patterning method for semiconductor manufacture

Optical proximity correction and photomasks

Hybrid double patterning method for semiconductor manufacture

Hybrid double patterning method for semiconductor manufacture

Patents Applicationslast 30 patents

OPTICAL PROXIMITY CORRECTION AND PHOTOMASKS

Optical Proximity Correction and Photomasks

Optical Proximity Correction and Photomasks

Hybrid Double Patterning Method for Semiconductor Manufacture

Hybrid Double Patterning Method for Semiconductor Manufacture

Optical Proximity Correction and Photomasks

Hybrid Double Patterning Method for Semiconductor Manufacture