Dongdong HU

Person

Jiangsu, CN

People

Patents Grantslast 30 patents

Information Patent Grant
Reaction chamber lining
- Patent number 12,112,923
- Issue date Oct 8, 2024
- JIANGSU LEUVEN INSTRUMENTS CO. LTD
- Na Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multilayer magnetic tunnel junction etching method and MRAM device
- Patent number 12,063,866
- Issue date Aug 13, 2024
- JIANGSU LEUVEN INSTRUMENTS CO. LTD
- Juebin Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for etching magnetic tunnel junction
- Patent number 12,035,633
- Issue date Jul 9, 2024
- JIANGSU LEUVEN INSTRUMENTS CO. LTD
- Ziming Liu
Information Patent Grant
Etching uniformity regulating device and method
- Patent number 12,027,345
- Issue date Jul 2, 2024
- JIANGSU LEUVEN INSTRUMENTS CO. LTD
- Xiaobo Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Rotatable faraday cleaning apparatus and plasma processing system
- Patent number 12,009,188
- Issue date Jun 11, 2024
- JIANGSU LEUVEN INSTRUMENTS CO., LTD
- Haiyang Liu
- B08 - CLEANING
Information Patent Grant
Etching method for magnetic tunnel junction
- Patent number 11,963,455
- Issue date Apr 16, 2024
- JIANGSU LEUVEN INSTRUMENTS CO. LTD
- Kaidong Xu
Information Patent Grant
Device for blocking plasma backflow in process chamber to protect a...
- Patent number 11,955,323
- Issue date Apr 9, 2024
- JIANGSU LEUVEN INSTRUMENTS CO. LTD
- Na Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device manufacturing method
- Patent number 11,877,519
- Issue date Jan 16, 2024
- JIANGSU LEUVEN INSTRUMENTS CO. LTD
- Zhongyuan Jiang
Information Patent Grant
Inductively coupled plasma treatment system
- Patent number 11,837,439
- Issue date Dec 5, 2023
- JIANGSU LEUVEN INSTRUMENTS CO. LTD
- Haiyang Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Faraday cleaning device and plasma processing system
- Patent number 11,735,400
- Issue date Aug 22, 2023
- JIANGSU LEUVEN INSTRUMENTS CO., LTD
- Haiyang Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam etching system
- Patent number 11,373,842
- Issue date Jun 28, 2022
- JIANGSU LEUVEN INSTRUMENTS CO. LTD
- Na Li
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
CONTROL METHOD FOR SIDEWALL CONTAMINATION OF MRAM MAGNETIC TUNNEL
- Publication number 20240407267
- Publication date Dec 5, 2024
- JIANGSU LEUVEN INSTRUMENT CO. LTD
- Yuxin YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR REDUCING DAMAGE TO MAGNETIC TUNNEL JUNCTION OF MRAM
- Publication number 20240381778
- Publication date Nov 14, 2024
- JIANGSU LEUVEN INSTRUMENTS CO., LTD.
- Yuxin YANG
Information Patent Application
DUAL-WALL MULTI-STRUCTURE QUARTZ CYLINDER DEVICE
- Publication number 20230352267
- Publication date Nov 2, 2023
- JIANGSU LEUVEN INSTRUMENTS CO. LTD
- Haiyang LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM ETCHING MACHINE AND LIFTING AND ROTATING PLATFORM DEVICE T...
- Publication number 20230326709
- Publication date Oct 12, 2023
- JIANGSU LEUVEN INSTRUMENTS CO. LTD
- Haiyang LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING SYSTEM AND MULTI-SECTION FARADAY SHIELDING DEVICE...
- Publication number 20230274918
- Publication date Aug 31, 2023
- JIANGSU LEUVEN INSTRUMENTS CO. LTD
- Haiyang LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEPARATED GAS INLET STRUCTURE FOR BLOCKING PLASMA BACKFLOW
- Publication number 20230238218
- Publication date Jul 27, 2023
- JIANGSU LEUVEN INSTRUMENTS CO. LTD
- Haiyang LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING SYSTEM AND FARADAY SHIELDING APPARATUS WHICH CAN BE...
- Publication number 20230207284
- Publication date Jun 29, 2023
- BEIJING LEUVEN SEMICONDUCTOR TECHNOLOGY CO. LTD
- Song GUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION SOURCE BAFFLE, ION ETCHING MACHINE, AND USAGE METHOD THEREFOR
- Publication number 20230207250
- Publication date Jun 29, 2023
- JIANGSU LEUVEN INSTRUMENTS CO. LTD
- Yaoyao ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANTI-BREAKDOWN ION SOURCE DISCHARGE APPARATUS
- Publication number 20230207260
- Publication date Jun 29, 2023
- JIANGSU LEUVEN INSTRUMENTS CO. LTD
- Yaoyao ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING SYSTEM AND FARADAY SHIELDING APPARATUS WHICH CAN BE...
- Publication number 20230207283
- Publication date Jun 29, 2023
- BEIJING LEUVEN SEMICONDUCTOR TECHNOLOGY CO. LTD
- Song GUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FARADAY CLEANING DEVICE AND PLASMA PROCESSING SYSTEM
- Publication number 20220375733
- Publication date Nov 24, 2022
- JIANGSU LEUVEN INSTRUMENTS CO., LTD
- Haiyang LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING SYSTEM WITH FARADAY SHIELDING DEVICE
- Publication number 20220319817
- Publication date Oct 6, 2022
- JIANGSU LEUVEN INSTRUMENTS CO., LTD
- Xuedong LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING SYSTEM
- Publication number 20220319816
- Publication date Oct 6, 2022
- JIANGSU LEUVEN INSTRUMENTS CO. LTD
- Haiyang LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ROTATABLE FARADAY CLEANING APPARATUS AND PLASMA PROCESSING SYSTEM
- Publication number 20220297168
- Publication date Sep 22, 2022
- JIANGSU LEUVEN INSTRUMENTS CO., LTD
- Haiyang LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE FOR BLOCKING PLASMA BACKFLOW IN PROCESS CHAMBER TO PROTECT A...
- Publication number 20220254615
- Publication date Aug 11, 2022
- JIANGSU LEUVEN INSTRUMENTS CO. LTD
- Na LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INDUCTIVELY COUPLED PLASMA TREATMENT SYSTEM
- Publication number 20220254604
- Publication date Aug 11, 2022
- JIANGSU LEUVEN INSTRUMENTS CO. LTD
- Haiyang LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CERAMIC AIR INLET RADIO FREQUENCY CONNECTION TYPE CLEANING DEVICE
- Publication number 20220254605
- Publication date Aug 11, 2022
- JIANGSU LEUVEN INSTRUMENTS CO. LTD
- Haiyang LIU
- B08 - CLEANING
Information Patent Application
ETCHING UNIFORMITY REGULATING DEVICE AND METHOD
- Publication number 20220013331
- Publication date Jan 13, 2022
- JIANGSU LEUVEN INSTRUMENTS CO. LTD
- Xiaobo LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD FOR SINGLE-ISOLATED MAGNETIC TUNNEL JUNCTION
- Publication number 20210399215
- Publication date Dec 23, 2021
- JIANGSU LEUVEN INSTRUMENTS CO. LTD
- Dongdong HU
- G11 - INFORMATION STORAGE
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD
- Publication number 20210399217
- Publication date Dec 23, 2021
- JIANGSU LEUVEN INSTRUMENTS CO. LTD
- Zhongyuan JIANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING DEVICE AND METHOD OF INDUCTIVELY COUPLED PLASMA
- Publication number 20210398774
- Publication date Dec 23, 2021
- JIANGSU LEUVEN INSTRUMENTS CO. LTD
- Xiaobo LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REACTION CHAMBER LINING
- Publication number 20210398781
- Publication date Dec 23, 2021
- JIANGSU LEUVEN INSTRUMENTS CO. LTD
- Na LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ETCHING MAGNETIC TUNNEL JUNCTION
- Publication number 20210399216
- Publication date Dec 23, 2021
- JIANGSU LEUVEN INSTRUMENTS CO. LTD
- Ziming LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING MAGNETIC TUNNEL JUNCTION
- Publication number 20210399214
- Publication date Dec 23, 2021
- JIANGSU LEUVEN INSTRUMENTS CO., LTD
- Dongchen CHE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTILAYER MAGNETIC TUNNEL JUNCTION ETCHING METHOD AND MRAM DEVICE
- Publication number 20210376232
- Publication date Dec 2, 2021
- JIANGSU LEUVEN INSTRUMENTS CO. LTD
- Juebin WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD FOR MAGNETIC TUNNEL JUNCTION
- Publication number 20210351343
- Publication date Nov 11, 2021
- JIANGSU LEUVEN INSTRUMENTS CO. LTD
- Kaidong XU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM ETCHING SYSTEM
- Publication number 20200161088
- Publication date May 21, 2020
- JIANGSU LEUVEN INSTRUMENTS CO. LTD
- Na LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOWER ELECTRODE WAFER CHUCK OF AN ETCHING MACHINE
- Publication number 20190341288
- Publication date Nov 7, 2019
- JIANGSU LEUVEN INSTRUMMENTS CO. LTD
- Dongchen CHE
- H01 - BASIC ELECTRIC ELEMENTS

Dongdong HU

Person

Patents Grantslast 30 patents

Reaction chamber lining

Multilayer magnetic tunnel junction etching method and MRAM device

Method for etching magnetic tunnel junction

Etching uniformity regulating device and method

Rotatable faraday cleaning apparatus and plasma processing system

Etching method for magnetic tunnel junction

Device for blocking plasma backflow in process chamber to protect a...

Semiconductor device manufacturing method

Inductively coupled plasma treatment system

Faraday cleaning device and plasma processing system

Ion beam etching system

Patents Applicationslast 30 patents

CONTROL METHOD FOR SIDEWALL CONTAMINATION OF MRAM MAGNETIC TUNNEL

METHOD FOR REDUCING DAMAGE TO MAGNETIC TUNNEL JUNCTION OF MRAM

DUAL-WALL MULTI-STRUCTURE QUARTZ CYLINDER DEVICE

ION BEAM ETCHING MACHINE AND LIFTING AND ROTATING PLATFORM DEVICE T...

PLASMA PROCESSING SYSTEM AND MULTI-SECTION FARADAY SHIELDING DEVICE...

SEPARATED GAS INLET STRUCTURE FOR BLOCKING PLASMA BACKFLOW

PLASMA ETCHING SYSTEM AND FARADAY SHIELDING APPARATUS WHICH CAN BE...

ION SOURCE BAFFLE, ION ETCHING MACHINE, AND USAGE METHOD THEREFOR

ANTI-BREAKDOWN ION SOURCE DISCHARGE APPARATUS

PLASMA ETCHING SYSTEM AND FARADAY SHIELDING APPARATUS WHICH CAN BE...

FARADAY CLEANING DEVICE AND PLASMA PROCESSING SYSTEM

PLASMA PROCESSING SYSTEM WITH FARADAY SHIELDING DEVICE

PLASMA ETCHING SYSTEM

ROTATABLE FARADAY CLEANING APPARATUS AND PLASMA PROCESSING SYSTEM

DEVICE FOR BLOCKING PLASMA BACKFLOW IN PROCESS CHAMBER TO PROTECT A...

INDUCTIVELY COUPLED PLASMA TREATMENT SYSTEM

CERAMIC AIR INLET RADIO FREQUENCY CONNECTION TYPE CLEANING DEVICE

ETCHING UNIFORMITY REGULATING DEVICE AND METHOD

ETCHING METHOD FOR SINGLE-ISOLATED MAGNETIC TUNNEL JUNCTION

SEMICONDUCTOR DEVICE MANUFACTURING METHOD

ETCHING DEVICE AND METHOD OF INDUCTIVELY COUPLED PLASMA

REACTION CHAMBER LINING

METHOD FOR ETCHING MAGNETIC TUNNEL JUNCTION

METHOD FOR MANUFACTURING MAGNETIC TUNNEL JUNCTION

MULTILAYER MAGNETIC TUNNEL JUNCTION ETCHING METHOD AND MRAM DEVICE

ETCHING METHOD FOR MAGNETIC TUNNEL JUNCTION

ION BEAM ETCHING SYSTEM

LOWER ELECTRODE WAFER CHUCK OF AN ETCHING MACHINE