Dongho Heo

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Fremont, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Mask trimming
- Patent number 8,864,931
- Issue date Oct 21, 2014
- Lam Research Corporation
- Supriya Goyal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma process with photoresist mask pretreatment
- Patent number 8,277,670
- Issue date Oct 2, 2012
- Lam Research Corporation
- Dongho Heo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
De-fluoridation process
- Patent number 8,172,948
- Issue date May 8, 2012
- Lam Research Corporation
- Dongho Heo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Infinitely selective photoresist mask etch
- Patent number 7,910,489
- Issue date Mar 22, 2011
- Lam Research Corporation
- Ji Soo Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask trimming
- Patent number 7,838,426
- Issue date Nov 23, 2010
- Lam Research Corporation
- Supriya Goyal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask trimming with ARL etch
- Patent number 7,785,484
- Issue date Aug 31, 2010
- Lam Research Corporation
- Dongho Heo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
De-fluoridation process
- Patent number 7,309,646
- Issue date Dec 18, 2007
- Lam Research Corporation
- Dongho Heo
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
MASK TRIMMING
- Publication number 20110030895
- Publication date Feb 10, 2011
- LAM RESEARCH CORPORATION
- Supriya Goyal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESS WITH PHOTORESIST MASK PRETREATMENT
- Publication number 20090286400
- Publication date Nov 19, 2009
- LAM RESEARCH CORPORATION
- Dongho Heo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK TRIMMING
- Publication number 20090050271
- Publication date Feb 26, 2009
- LAM RESEARCH CORPORATION
- Supriya Goyal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK TRIMMING WITH ARL ETCH
- Publication number 20090050603
- Publication date Feb 26, 2009
- LAM RESEARCH CORPORATION
- Dongho Heo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DE-FLUORIDATION PROCESS
- Publication number 20080083502
- Publication date Apr 10, 2008
- LAM RESEARCH CORPORATION
- Dongho Heo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Infinitely selective photoresist mask etch
- Publication number 20070193973
- Publication date Aug 23, 2007
- Lam Research Corporation
- Ji Soo Kim
- H01 - BASIC ELECTRIC ELEMENTS