Donghyeon NA

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Hwaseong-si, KR

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Patents Grantslast 30 patents

Information Patent Grant
Method of measuring parameters of plasma, apparatus for measuring p...
- Patent number 12,222,362
- Issue date Feb 11, 2025
- Samsung Electronics Co., Ltd.
- Yoonbum Nam
- G01 - MEASURING TESTING
Information Patent Grant
Plasma etching method and semiconductor device fabrication method i...
- Patent number 12,020,903
- Issue date Jun 25, 2024
- Samsung Electronics Co., Ltd.
- Yonghee Kim
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Apparatus and method fabricating semiconductor device
- Patent number 12,014,905
- Issue date Jun 18, 2024
- Samsung Electronics Co., Ltd.
- Nam Kyun Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method and semiconductor device fabrication method i...
- Patent number 11,545,341
- Issue date Jan 3, 2023
- Samsung Electronics Co., Ltd.
- Yonghee Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck and plasma processing apparatus including the same
- Patent number 11,367,597
- Issue date Jun 21, 2022
- Samsung Electronics Co., Ltd.
- Yongwoo Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma control apparatus and plasma processing system including the...
- Patent number 11,282,679
- Issue date Mar 22, 2022
- Samsung Electronics Co., Ltd.
- Donghyeon Na
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING APPARATUS FOR ETCHING A SUBSTRATE BY USING PLASMA
- Publication number 20250226187
- Publication date Jul 10, 2025
- Samsung Electronics Co., Ltd.
- Heewon MIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20250226259
- Publication date Jul 10, 2025
- Samsung Electronics Co., Ltd.
- Woojin Jang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA GENERATION CIRCUIT AND SUBSTRATE PROCESSING DEVICE INCLUDING...
- Publication number 20250218727
- Publication date Jul 3, 2025
- Samsung Electronics Co., Ltd.
- Sungyong LIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250183004
- Publication date Jun 5, 2025
- Samsung Electronics Co., Ltd.
- Hwasoo SEOK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20250183005
- Publication date Jun 5, 2025
- Samsung Electronics Co., Ltd.
- Changho Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PROCESSING A SUBSTRATE
- Publication number 20250174433
- Publication date May 29, 2025
- SAMSUNG ELECTRONICS CO,. LTD.
- Donghyeon NA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MEASURING PARAMETERS OF PLASMA, APPARATUS FOR MEASURING P...
- Publication number 20250146917
- Publication date May 8, 2025
- Samsung Electronics Co., Ltd.
- Yoonbum Nam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND A SUBSTRATE PROCESSING METHOD US...
- Publication number 20250104969
- Publication date Mar 27, 2025
- Samsung Electronics Co., Ltd.
- HYUN BAE KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MAGNETIC ELEMENT ASSEMBLY AND SUBSTRATE PROCESSING APPARATUS INCLUD...
- Publication number 20250069861
- Publication date Feb 27, 2025
- Samsung Electronics Co., Ltd.
- Myeongsoo Shin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20240420930
- Publication date Dec 19, 2024
- Pusan National University Industry-University Cooperation Foundation
- Changho Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA CONTROL APPARATUS AND METHOD USING THE SAME
- Publication number 20240128054
- Publication date Apr 18, 2024
- Samsung Electronics Co., Ltd.
- Changho Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240038505
- Publication date Feb 1, 2024
- Samsung Electronics Co., Ltd.
- Donghyeon Na
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20230154729
- Publication date May 18, 2023
- SAMSUNG ELECTRONICSC CO., LTD.
- Donghyeon NA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHUCK ASSEMBLY, FABRICATION SYSTEM THEREWITH, AND METHOD OF FABRICA...
- Publication number 20230145476
- Publication date May 11, 2023
- Samsung Electronics Co., Ltd.
- Seongha JEONG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA ETCHING METHOD AND SEMICONDUCTOR DEVICE FABRICATION METHOD I...
- Publication number 20230084124
- Publication date Mar 16, 2023
- Samsung Electronics Co., Ltd.
- Yonghee KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MEASURING PARAMETERS OF PLASMA, APPARATUS FOR MEASURING P...
- Publication number 20230060400
- Publication date Mar 2, 2023
- Samsung Electronics Co., Ltd.
- Yoonbum Nam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FABRICATING SEMICONDUCTOR DEVICE
- Publication number 20220165552
- Publication date May 26, 2022
- Samsung Electronics Co., Ltd.
- NAM KYUN KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD AND SEMICONDUCTOR DEVICE FABRICATION METHOD I...
- Publication number 20210104382
- Publication date Apr 8, 2021
- Samsung Electronics Co., Ltd.
- Yonghee KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA CONTROL APPARATUS AND PLASMA PROCESSING SYSTEM INCLUDING THE...
- Publication number 20200373126
- Publication date Nov 26, 2020
- Samsung Electronics Co., Ltd.
- Donghyeon NA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK AND PLASMA PROCESSING APPARATUS INCLUDING THE SAME
- Publication number 20200013595
- Publication date Jan 9, 2020
- Samsung Electronics Co., Ltd.
- Yongwoo LEE
- H01 - BASIC ELECTRIC ELEMENTS

Donghyeon NA

Person

Patents Grantslast 30 patents

Method of measuring parameters of plasma, apparatus for measuring p...

Plasma etching method and semiconductor device fabrication method i...

Apparatus and method fabricating semiconductor device

Plasma etching method and semiconductor device fabrication method i...

Electrostatic chuck and plasma processing apparatus including the same

Plasma control apparatus and plasma processing system including the...

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING APPARATUS FOR ETCHING A SUBSTRATE BY USING PLASMA

SUBSTRATE PROCESSING APPARATUS

PLASMA GENERATION CIRCUIT AND SUBSTRATE PROCESSING DEVICE INCLUDING...

PLASMA PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD

METHOD OF PROCESSING A SUBSTRATE

METHOD OF MEASURING PARAMETERS OF PLASMA, APPARATUS FOR MEASURING P...

SUBSTRATE PROCESSING APPARATUS AND A SUBSTRATE PROCESSING METHOD US...

MAGNETIC ELEMENT ASSEMBLY AND SUBSTRATE PROCESSING APPARATUS INCLUD...

SUBSTRATE PROCESSING APPARATUS

PLASMA CONTROL APPARATUS AND METHOD USING THE SAME

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCT...

CHUCK ASSEMBLY, FABRICATION SYSTEM THEREWITH, AND METHOD OF FABRICA...

PLASMA ETCHING METHOD AND SEMICONDUCTOR DEVICE FABRICATION METHOD I...

METHOD OF MEASURING PARAMETERS OF PLASMA, APPARATUS FOR MEASURING P...

APPARATUS AND METHOD FABRICATING SEMICONDUCTOR DEVICE

PLASMA ETCHING METHOD AND SEMICONDUCTOR DEVICE FABRICATION METHOD I...

PLASMA CONTROL APPARATUS AND PLASMA PROCESSING SYSTEM INCLUDING THE...

ELECTROSTATIC CHUCK AND PLASMA PROCESSING APPARATUS INCLUDING THE SAME