Dongseok Han

Person

Daegu, KR

People

Patents Grantslast 30 patents

Information Patent Grant
Method of measuring parameters of plasma, apparatus for measuring p...
- Patent number 12,222,362
- Issue date Feb 11, 2025
- Samsung Electronics Co., Ltd.
- Yoonbum Nam
- G01 - MEASURING TESTING
Information Patent Grant
Substrate processing apparatus and method of manufacturing semicond...
- Patent number 12,183,555
- Issue date Dec 31, 2024
- Samsung Electronics Co., Ltd.
- Seunghan Baek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etching at low temperature and plasma etching apparatus
- Patent number 10,818,503
- Issue date Oct 27, 2020
- Samsung Electronics Co., Ltd.
- Cheonkyu Lee
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20250226259
- Publication date Jul 10, 2025
- Samsung Electronics Co., Ltd.
- Woojin Jang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MEASURING PARAMETERS OF PLASMA, APPARATUS FOR MEASURING P...
- Publication number 20250146917
- Publication date May 8, 2025
- Samsung Electronics Co., Ltd.
- Yoonbum Nam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEALING RING
- Publication number 20250116332
- Publication date Apr 10, 2025
- Samsung Electronics Co., Ltd.
- Jihwan Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COOLANT TUBE BLOCK ASSEMBLY AND SEMICONDUCTOR PROCESSING DEVICE INC...
- Publication number 20240379334
- Publication date Nov 14, 2024
- Samsung Electronics Co., Ltd.
- Woojin Jang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240038505
- Publication date Feb 1, 2024
- Samsung Electronics Co., Ltd.
- Donghyeon Na
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICOND...
- Publication number 20230143049
- Publication date May 11, 2023
- Samsung Electronics Co., Ltd.
- Seunghan Baek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUS RING, SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME, AND...
- Publication number 20230143327
- Publication date May 11, 2023
- Samsung Electronics Co., Ltd.
- DONGSEOK HAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MEASURING PARAMETERS OF PLASMA, APPARATUS FOR MEASURING P...
- Publication number 20230060400
- Publication date Mar 2, 2023
- Samsung Electronics Co., Ltd.
- Yoonbum Nam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ETCHING AT LOW TEMPERATURE AND PLASMA ETCHING APPARATUS
- Publication number 20190385860
- Publication date Dec 19, 2019
- Samsung Electronics Co., Ltd.
- CHEONKYU LEE
- H01 - BASIC ELECTRIC ELEMENTS

Dongseok Han

Person

Patents Grantslast 30 patents

Method of measuring parameters of plasma, apparatus for measuring p...

Substrate processing apparatus and method of manufacturing semicond...

Method of etching at low temperature and plasma etching apparatus

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING APPARATUS

METHOD OF MEASURING PARAMETERS OF PLASMA, APPARATUS FOR MEASURING P...

SEALING RING

COOLANT TUBE BLOCK ASSEMBLY AND SEMICONDUCTOR PROCESSING DEVICE INC...

PLASMA PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICOND...

FOCUS RING, SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME, AND...

METHOD OF MEASURING PARAMETERS OF PLASMA, APPARATUS FOR MEASURING P...

METHOD OF ETCHING AT LOW TEMPERATURE AND PLASMA ETCHING APPARATUS