Dongsoo Lee

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Fremont, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Inductively coupled plasma source for plasma processing
- Patent number 9,653,264
- Issue date May 16, 2017
- Mattson Technology, Inc.
- Vladimir Nagorny
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Inductively Coupled Plasma Source for Plasma Processing
- Publication number 20170243721
- Publication date Aug 24, 2017
- Mattson Technology, Inc.
- Vladimir Nagorny
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INDUCTIVELY COUPLED PLASMA SOURCE FOR PLASMA PROCESSING
- Publication number 20120152901
- Publication date Jun 21, 2012
- Mattson Technology, Inc.
- Vladimir Nagorny
- H01 - BASIC ELECTRIC ELEMENTS