Donis Flagello

Person

People

Patents Grantslast 30 patents

Information Patent Grant
Illumination system with curved 1d-patterned mask for use in EUV-ex...
- Patent number 11,300,884
- Issue date Apr 12, 2022
- Nikon Corporation
- Daniel Gene Smith
- G02 - OPTICS
Information Patent Grant
Euv lithography system for dense line patterning
- Patent number 11,099,483
- Issue date Aug 24, 2021
- Nikon Corporation
- Donis G. Flagello
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV lithography system for dense line patterning
- Patent number 10,890,849
- Issue date Jan 12, 2021
- Nikon Corporation
- Donis G. Flagello
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dynamic patterning method that removes phase conflicts and improves...
- Patent number 10,310,387
- Issue date Jun 4, 2019
- Nikon Corporation
- Shane R. Palmer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Using customized lens pupil optimization to enhance lithographic im...
- Patent number 10,133,184
- Issue date Nov 20, 2018
- Nikon Corporation
- Donis G. Flagello
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic substrate and a device
- Patent number 9,366,952
- Issue date Jun 14, 2016
- ASML Holding N.V.
- Donis George Flagello
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Fast illumination simulator based on a calibrated flexible point-sp...
- Patent number 9,091,941
- Issue date Jul 28, 2015
- Nikon Corporation
- Daniel Gene Smith
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic method
- Patent number 9,086,633
- Issue date Jul 21, 2015
- ASML Holding N.V.
- Donis George Flagello
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Fast photoresist model
- Patent number 8,910,093
- Issue date Dec 9, 2014
- Nikon Corporation
- Donis G. Flagello
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method or matching high-numerical aperture scanners
- Patent number 8,588,508
- Issue date Nov 19, 2013
- Nikon Corporation
- Shane Roy Palmer
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optimized polarization illumination
- Patent number 8,395,757
- Issue date Mar 12, 2013
- ASML Masktools B.V.
- Robert Socha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device manufacturing method and mask for use therein
- Patent number 8,252,487
- Issue date Aug 28, 2012
- ASML Netherlands B.V.
- Marcel Mathijs Theodore Marie Dierichs
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,952,803
- Issue date May 31, 2011
- ASML Netherlands B.V.
- Donis George Flagello
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optimized polarization illumination
- Patent number 7,710,544
- Issue date May 4, 2010
- ASML Masktools B.V.
- Robert Socha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,684,013
- Issue date Mar 23, 2010
- ASML Netherlands B.V.
- Steven George Hansen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,548,302
- Issue date Jun 16, 2009
- ASML Netherlands B.V.
- Arno Jan Bleeker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and methods for use thereof
- Patent number 7,538,875
- Issue date May 26, 2009
- ASML Netherlands B.V.
- Remco Marcel Van Dijk
- G01 - MEASURING TESTING
Information Patent Grant
Stationary and dynamic radial transverse electric polarizer for hig...
- Patent number 7,511,884
- Issue date Mar 31, 2009
- ASML Netherlands B.V.
- Donis Flagello
- G02 - OPTICS
Information Patent Grant
Variable illumination source
- Patent number 7,317,506
- Issue date Jan 8, 2008
- ASML Netherlands B.V.
- Donis George Flagello
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optimized polarization illumination
- Patent number 7,292,315
- Issue date Nov 6, 2007
- ASML Masktools B.V.
- Robert Socha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Enhanced lithographic resolution through double exposure
- Patent number 7,256,873
- Issue date Aug 14, 2007
- ASML Netherlands B.V.
- Jozef Maria Finders
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Stationary and dynamic radial transverse electric polarizer for hig...
- Patent number 7,221,501
- Issue date May 22, 2007
- ASML Netherlands B.V.
- Donis Flagello
- G02 - OPTICS
Information Patent Grant
Stationary and dynamic radial transverse electric polarizer for hig...
- Patent number 7,206,059
- Issue date Apr 17, 2007
- ASML Netherlands B.V.
- Donis George Flagello
- G02 - OPTICS
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,113,259
- Issue date Sep 26, 2006
- ASML Netherlands B.V.
- Donis Flagello
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Gradient immersion lithography
- Patent number 6,954,256
- Issue date Oct 11, 2005
- ASML Netherlands B.V.
- Donis Flagello
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Stationary and dynamic radial transverse electric polarizer for hig...
- Patent number 6,943,941
- Issue date Sep 13, 2005
- ASML Netherlands B.V.
- Donis Flagello
- G02 - OPTICS
Information Patent Grant
Assist features for use in lithographic projection
- Patent number 6,887,625
- Issue date May 3, 2005
- ASML Netherlands B.V.
- Johannes Jacobus Matheus Baselmans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic method and apparatus
- Patent number 6,855,486
- Issue date Feb 15, 2005
- ASML Netherlands B.V.
- Jozef M Finders
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
CURVED RETICLE BY MECHANICAL AND PHASE BENDING ALONG ORTHOGONAL AXES
- Publication number 20220357666
- Publication date Nov 10, 2022
- Nikon Corporation
- Donis G. Flagello
- G02 - OPTICS
Information Patent Application
ILLUMINATION SYSTEM WITH CURVED 1D-PATTERNED MASK FOR USE IN EUV-EX...
- Publication number 20200073251
- Publication date Mar 5, 2020
- Nikon Corporation
- Daniel Gene Smith
- G02 - OPTICS
Information Patent Application
EUV LITHOGRAPHY SYSTEM FOR DENSE LINE PATTERNING
- Publication number 20170336715
- Publication date Nov 23, 2017
- Nikon Corporation
- Donis G. Flagello
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV LITHOGRAPHY SYSTEM FOR DENSE LINE PATTERNING
- Publication number 20170336716
- Publication date Nov 23, 2017
- Nikon Corporation
- Donis G. Flagello
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC SUBSTRATE AND A DEVICE
- Publication number 20150277222
- Publication date Oct 1, 2015
- ASML Holding N.V.
- Donis George FLAGELLO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DYNAMIC PATTERNING METHOD THAT REMOVES PHASE CONFLICTS AND IMPROVES...
- Publication number 20150234295
- Publication date Aug 20, 2015
- NIKON CORPORATION
- Shane R. Palmer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FAST ILLUMINATION SIMULATOR BASED ON A CALIBRATED FLEXIBLE POINT- S...
- Publication number 20140211186
- Publication date Jul 31, 2014
- Daniel G. Smith
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Using Customized Lens Pupil Optimization to Enhance Lithographic Im...
- Publication number 20130286369
- Publication date Oct 31, 2013
- Nikon Corporation
- Donis G. Flagello
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Scanning Lithography using point source imaging arrays
- Publication number 20130065185
- Publication date Mar 14, 2013
- Donis G. Flagello
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Fast Illumination Simulator Based on a Calibrated Flexible Point Sp...
- Publication number 20120212722
- Publication date Aug 23, 2012
- Nikon Corporation
- Daniel Gene Smith
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Fast photoresist model
- Publication number 20120079436
- Publication date Mar 29, 2012
- Nikon Corporation
- Donis G. Flagello
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for matching high-numerical aperture scanners
- Publication number 20120039523
- Publication date Feb 16, 2012
- Nikon Corporation
- Shane Roy Palmer
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
OPTIMIZED POLARIZATION ILLUMINATION
- Publication number 20110051114
- Publication date Mar 3, 2011
- Robert SOCHA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Diffractive Optical Element, Lithographic Apparatus and Semiconduct...
- Publication number 20100041239
- Publication date Feb 18, 2010
- ASML NETHERLANDS B.V.
- Donis George FLAGELLO
- G02 - OPTICS
Information Patent Application
LITHOGRAPHIC METHOD
- Publication number 20090286053
- Publication date Nov 19, 2009
- ASML NETHERLANDS B.V.
- Donis George FLAGELLO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic System, Lithographic Apparatus and Device Manufacturin...
- Publication number 20090208878
- Publication date Aug 20, 2009
- ASML NETHERLANDS B.V.
- Erik Roelof LOOPSTRA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND METHOD OF CONTROLLING
- Publication number 20080284998
- Publication date Nov 20, 2008
- Carl Zeiss SMT AG
- Bernd Geh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optimized polarization illumination
- Publication number 20080043215
- Publication date Feb 21, 2008
- ASML MASKTOOLS B.V.
- Robert Socha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEVICE MANUFACTURING METHOD
- Publication number 20080030708
- Publication date Feb 7, 2008
- ASML NETHERLANDS B.V.
- Steven George Hansen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20070273853
- Publication date Nov 29, 2007
- ASML NETHERLANDS B.V.
- Arno Jan Bleeker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20070263269
- Publication date Nov 15, 2007
- ASML NETHERLANDS B.V.
- Donis George Flagello
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Enhanced lithographic resolution through double exposure
- Publication number 20070258073
- Publication date Nov 8, 2007
- ASML NETHERLANDS B.V.
- Jozef Maria Finders
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Variable illumination source
- Publication number 20070013888
- Publication date Jan 18, 2007
- ASML NETHERLANDS B.V.
- Donis George Flagello
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20070002300
- Publication date Jan 4, 2007
- ASML NETHERLANDS B.V.
- Steven George Hansen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20060256311
- Publication date Nov 16, 2006
- ASML NETHERLANDS B.V.
- Steven Hansen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20060007421
- Publication date Jan 12, 2006
- ASML NETHERLANDS B.V.
- Donis Flagello
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Stationary and dynamic radial transverse electric polarizer for hig...
- Publication number 20050259324
- Publication date Nov 24, 2005
- ASML NETHERLANDS B.V.
- Donis Flagello
- G02 - OPTICS
Information Patent Application
Lithographic apparatus and methods for use thereof
- Publication number 20050206879
- Publication date Sep 22, 2005
- ASML NETHERLANDS B.V.
- Remco Marcel Van Dijk
- G01 - MEASURING TESTING
Information Patent Application
Stationary and dynamic radial transverse electric polarizer for hig...
- Publication number 20050180008
- Publication date Aug 18, 2005
- ASML NETHERLANDS B.V.
- Donis Flagello
- G02 - OPTICS
Information Patent Application
Enhanced lithographic resolution through double exposure
- Publication number 20050162627
- Publication date Jul 28, 2005
- ASML NETHERLANDS B.V.
- Jozef Maria Finders
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Donis Flagello

Person

Patents Grantslast 30 patents

Illumination system with curved 1d-patterned mask for use in EUV-ex...

Euv lithography system for dense line patterning

EUV lithography system for dense line patterning

Dynamic patterning method that removes phase conflicts and improves...

Using customized lens pupil optimization to enhance lithographic im...

Lithographic substrate and a device

Fast illumination simulator based on a calibrated flexible point-sp...

Lithographic method

Fast photoresist model

Method or matching high-numerical aperture scanners

Optimized polarization illumination

Device manufacturing method and mask for use therein

Lithographic apparatus and device manufacturing method

Optimized polarization illumination

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Lithographic apparatus and methods for use thereof

Stationary and dynamic radial transverse electric polarizer for hig...

Variable illumination source

Optimized polarization illumination

Enhanced lithographic resolution through double exposure

Stationary and dynamic radial transverse electric polarizer for hig...

Stationary and dynamic radial transverse electric polarizer for hig...

Lithographic apparatus and device manufacturing method

Gradient immersion lithography

Stationary and dynamic radial transverse electric polarizer for hig...

Assist features for use in lithographic projection

Lithographic method and apparatus

Patents Applicationslast 30 patents

CURVED RETICLE BY MECHANICAL AND PHASE BENDING ALONG ORTHOGONAL AXES

ILLUMINATION SYSTEM WITH CURVED 1D-PATTERNED MASK FOR USE IN EUV-EX...

EUV LITHOGRAPHY SYSTEM FOR DENSE LINE PATTERNING

EUV LITHOGRAPHY SYSTEM FOR DENSE LINE PATTERNING

LITHOGRAPHIC SUBSTRATE AND A DEVICE

DYNAMIC PATTERNING METHOD THAT REMOVES PHASE CONFLICTS AND IMPROVES...

FAST ILLUMINATION SIMULATOR BASED ON A CALIBRATED FLEXIBLE POINT- S...

Using Customized Lens Pupil Optimization to Enhance Lithographic Im...

Scanning Lithography using point source imaging arrays

Fast Illumination Simulator Based on a Calibrated Flexible Point Sp...

Fast photoresist model

Method for matching high-numerical aperture scanners

OPTIMIZED POLARIZATION ILLUMINATION

Diffractive Optical Element, Lithographic Apparatus and Semiconduct...

LITHOGRAPHIC METHOD

Lithographic System, Lithographic Apparatus and Device Manufacturin...

LITHOGRAPHIC APPARATUS AND METHOD OF CONTROLLING

Optimized polarization illumination

DEVICE MANUFACTURING METHOD

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Enhanced lithographic resolution through double exposure

Variable illumination source

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Stationary and dynamic radial transverse electric polarizer for hig...

Lithographic apparatus and methods for use thereof

Stationary and dynamic radial transverse electric polarizer for hig...

Enhanced lithographic resolution through double exposure