Donna L. Smatlak

Person

Belmont, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Technique for improving ion implantation throughput and dose unifor...
- Patent number 7,683,347
- Issue date Mar 23, 2010
- Varian Semiconductor Equipment Associates, Inc.
- Atul Gupta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Techniques for confining electrons in an ion implanter
- Patent number 7,655,922
- Issue date Feb 2, 2010
- Varian Semiconductor Equipment Associates, Inc.
- Donna L. Smatlak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method, system, and apparatus for improving doping uniformity in hi...
- Patent number 7,462,844
- Issue date Dec 9, 2008
- Varian Semiconductor Equipment Associates, Inc.
- Shengwu Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion source configuration for production of ionized clusters, ionize...
- Patent number 7,459,704
- Issue date Dec 2, 2008
- Varian Semiconductor Equipment Associates, Inc.
- Joseph C. Olson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron injection in ion implanter magnets
- Patent number 7,402,816
- Issue date Jul 22, 2008
- Varian Semiconductor Equipment Associates, Inc.
- Anthony Renau
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Uniformity control multiple tilt axes, rotating wafer and variable...
- Patent number 7,166,854
- Issue date Jan 23, 2007
- Varian Semiconductor Equipment Associates, Inc.
- Anthony Renau
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Uniformity control using multiple fixed wafer orientations and vari...
- Patent number 7,161,161
- Issue date Jan 9, 2007
- Varian Semiconductor Equipment Associates, Inc.
- Anthony Renau
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for determining beam parallelism and direction
- Patent number 6,791,094
- Issue date Sep 14, 2004
- Varian Semiconductor Equipment Associates, Inc.
- Joseph C. Olson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for alignment of ion beam systems using beam...
- Patent number 6,403,972
- Issue date Jun 11, 2002
- Varian Semiconductor Equipment Associates, Inc.
- Antonella Cucchetti
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Continuous, real time microwave plasma element sensor
- Patent number 5,479,254
- Issue date Dec 26, 1995
- Paul P. Woskov
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
TECHNIQUES FOR CONFINING ELECTRONS IN AN ION IMPLANTER
- Publication number 20080135775
- Publication date Jun 12, 2008
- Varian Semiconductor Equipment Associates, Inc.
- Donna L. Smatlak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUE FOR IMPROVING ION IMPLANTATION THROUGHPUT AND DOSE UNIFOR...
- Publication number 20080078953
- Publication date Apr 3, 2008
- Varian Semiconductor Equipment Associates, Inc.
- Atul GUPTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method, system, and apparatus for improving doping uniformity in hi...
- Publication number 20070085037
- Publication date Apr 19, 2007
- Shengwu Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron injection in ion implanter magnets
- Publication number 20060169912
- Publication date Aug 3, 2006
- Varian Semiconductor Equipment Associates, Inc.
- Anthony Renau
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Ion source configuration for production of ionized clusters, ionize...
- Publication number 20060169915
- Publication date Aug 3, 2006
- Varian Semiconductor Equipment Associates, Inc.
- Joseph C. Olson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Uniformity control using multiple tilt axes, rotating wafer and var...
- Publication number 20050263721
- Publication date Dec 1, 2005
- Anthony Renau
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Uniformity control using multiple fixed wafer orientations and vari...
- Publication number 20050258379
- Publication date Nov 24, 2005
- Anthony Renau
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma immersion ion implantion apparatus and method
- Publication number 20050205211
- Publication date Sep 22, 2005
- Vikram Singh
- H01 - BASIC ELECTRIC ELEMENTS

Donna L. Smatlak

Person

Patents Grantslast 30 patents

Technique for improving ion implantation throughput and dose unifor...

Techniques for confining electrons in an ion implanter

Method, system, and apparatus for improving doping uniformity in hi...

Ion source configuration for production of ionized clusters, ionize...

Electron injection in ion implanter magnets

Uniformity control multiple tilt axes, rotating wafer and variable...

Uniformity control using multiple fixed wafer orientations and vari...

Method and apparatus for determining beam parallelism and direction

Methods and apparatus for alignment of ion beam systems using beam...

Continuous, real time microwave plasma element sensor

Patents Applicationslast 30 patents

TECHNIQUES FOR CONFINING ELECTRONS IN AN ION IMPLANTER

TECHNIQUE FOR IMPROVING ION IMPLANTATION THROUGHPUT AND DOSE UNIFOR...

Method, system, and apparatus for improving doping uniformity in hi...

Electron injection in ion implanter magnets

Ion source configuration for production of ionized clusters, ionize...

Uniformity control using multiple tilt axes, rotating wafer and var...

Uniformity control using multiple fixed wafer orientations and vari...

Plasma immersion ion implantion apparatus and method