Doug Kreszowski

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Saginaw, MI, US

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Patents Grantslast 30 patents

Information Patent Grant
Applying edge-on photoluminescence to measure bulk impurities of se...
- Patent number 9,261,464
- Issue date Feb 16, 2016
- Hemlock Semiconductor Corporation
- Doug Kreszowski
- G01 - MEASURING TESTING
Information Patent Grant
Method of analyzing carbon concentration in crystalline silicon
- Patent number 7,520,932
- Issue date Apr 21, 2009
- Dow Corning Corporation
- Doug Kreszowski
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
LOW IMPURITY DETECTION METHOD FOR CHARACTERIZING METALS WITHIN A SU...
- Publication number 20170269004
- Publication date Sep 21, 2017
- HEMLOCK SEMICONDUCTOR CORPORATION
- Adam Fournier
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR DETERMINING A CONCENTRATION OF METAL IMPURITIES CONTAMIN...
- Publication number 20160320275
- Publication date Nov 3, 2016
- Douglas H. Kreszowski
- G01 - MEASURING TESTING
Information Patent Application
METHODS OF FORMING AND ANALYZING DOPED SILICON
- Publication number 20150284873
- Publication date Oct 8, 2015
- HEMLOCK SEMICONDUCTOR CORPORATION
- Douglas Homer Kreszowski
- C30 - CRYSTAL GROWTH
Information Patent Application
APPLYING EDGE-ON PHOTOLUMINESCENCE TO MEASURE BULK IMPURITIES OF SE...
- Publication number 20130075627
- Publication date Mar 28, 2013
- HEMLOCK SEMICONDUCTOR CORPORATION
- Doug Kreszowski
- G01 - MEASURING TESTING
Information Patent Application
QUANTITATIVE MEASUREMENT OF GAS PHASE PROCESS INTERMEDIATES USING R...
- Publication number 20120070362
- Publication date Mar 22, 2012
- HEMLOCK SEMICONDUCTOR CORPORATION
- Greg Harms
- G01 - MEASURING TESTING
Information Patent Application
Method Of Analyzing Carbon Concentration In Crystalline Silicon
- Publication number 20070238189
- Publication date Oct 11, 2007
- Dow Corning Corporation
- Doug Kreszowski
- G01 - MEASURING TESTING