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Doug Van Den Broeke
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Sunnyvale, CA, US
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Patents Grants
last 30 patents
Information
Patent Grant
Use of intersecting subresolution features for microlithography
Patent number
6,139,994
Issue date
Oct 31, 2000
Doug Van Den Broeke
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Patents Applications
last 30 patents
Information
Patent Application
CPL mask and a method and program product for generating the same
Publication number
20080067143
Publication date
Mar 20, 2008
Douglas Van den Broeke
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Method and apparatus for providing optical proximity features to a...
Publication number
20070162889
Publication date
Jul 12, 2007
ASML MASKTOOLS B.V.
Douglas Van Den Broeke
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Method of achieving CD linearity control for full-chip CPL manufact...
Publication number
20070148562
Publication date
Jun 28, 2007
ASML MASKTOOLS B.V.
Doug Van Den Broeke
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Method, program product and apparatus for model based scattering ba...
Publication number
20060075377
Publication date
Apr 6, 2006
Douglas Van Den Broeke
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Optical proximity correction method utilizing phase-edges as sub-re...
Publication number
20050271953
Publication date
Dec 8, 2005
ASML MASKTOOLS B.V.
Douglas Van Den Broeke
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Method for improved lithographic patterning utilizing multiple cohe...
Publication number
20050186491
Publication date
Aug 25, 2005
ASML MASKTOOLS B.V.
Michael Hsu
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Eigen decomposition based OPC model
Publication number
20050149902
Publication date
Jul 7, 2005
Xuelong Shi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Feature optimization using interference mapping lithography
Publication number
20050142470
Publication date
Jun 30, 2005
ASML MASKTOOLS B.V.
Robert John Socha
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Method and apparatus for performing model based placement of phase-...
Publication number
20050142449
Publication date
Jun 30, 2005
Xuelong Shi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Method and apparatus for decomposing semiconductor device patterns...
Publication number
20050125765
Publication date
Jun 9, 2005
ASML MASKTOOLS, B.V.
Doug Van Den Broeke
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Scattering bar OPC application method for sub-half wavelength litho...
Publication number
20050074677
Publication date
Apr 7, 2005
Thomas Laidig
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Method of optical proximity correction design for contact hole mask
Publication number
20040229133
Publication date
Nov 18, 2004
Robert John Socha
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Method and apparatus for providing optical proximity features to a...
Publication number
20040209170
Publication date
Oct 21, 2004
Douglas Van Den Broeke
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Method of achieving CD linearity control for full-chip CPL manufact...
Publication number
20040115539
Publication date
Jun 17, 2004
Doug Van Den Broeke
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Method and apparatus for decomposing semiconductor device patterns...
Publication number
20040010770
Publication date
Jan 15, 2004
Doug Van Den Broeke
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Optical proximity correction method utilizing phase-edges as sub-re...
Publication number
20030064298
Publication date
Apr 3, 2003
ASML MASKTOOLS, B.V.
Douglas Van Den Broeke
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Method and apparatus for making photomasks with improved inside cor...
Publication number
20020051913
Publication date
May 2, 2002
Doug Van Den Broeke
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY