Douglas A. Buchberger JR.

Person

Livermore, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Chamber and methods of treating a substrate after exposure to radia...
- Patent number 12,181,801
- Issue date Dec 31, 2024
- Applied Materials, Inc.
- Dmitry Lubomirsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Rotating biasable pedestal and electrostatic chuck in semiconductor...
- Patent number 12,112,972
- Issue date Oct 8, 2024
- Applied Materials, Inc.
- Qiwei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for processing a substrate
- Patent number 11,955,333
- Issue date Apr 9, 2024
- Applied Materials, Inc.
- Jethro Tannos
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for post exposure bake of photoresist
- Patent number 11,934,103
- Issue date Mar 19, 2024
- Applied Materials, Inc.
- Douglas A Buchberger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for post exposure processing of photoresist wa...
- Patent number 11,899,366
- Issue date Feb 13, 2024
- Applied Materials, Inc.
- Viachslav Babayan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for post exposure bake of photoresist
- Patent number 11,815,816
- Issue date Nov 14, 2023
- Applied Materials, Inc.
- Douglas A Buchberger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for depositing dielectric material
- Patent number 11,631,591
- Issue date Apr 18, 2023
- Applied Materials, Inc.
- Bhargav S. Citla
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and methods for verification and re-use of process fluids
- Patent number 11,609,505
- Issue date Mar 21, 2023
- Applied Materials, Inc.
- Mangesh Ashok Bangar
- G01 - MEASURING TESTING
Information Patent Grant
In-situ method and apparatus for measuring fluid resistivity
- Patent number 11,555,730
- Issue date Jan 17, 2023
- Applied Materials, Inc.
- Douglas A. Buchberger
- G01 - MEASURING TESTING
Information Patent Grant
Multi-source ion beam etch system
- Patent number 11,387,071
- Issue date Jul 12, 2022
- Applied Materials, Inc.
- Qiwei Liang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric plasma process chamber
- Patent number 11,315,760
- Issue date Apr 26, 2022
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for post exposure processing of photoresist wa...
- Patent number 11,112,697
- Issue date Sep 7, 2021
- Applied Materials, Inc.
- Viachslav Babayan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for depositing dielectric material
- Patent number 11,114,306
- Issue date Sep 7, 2021
- Applied Materials, Inc.
- Bhargav Citla
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrostatic chuck having thermally isolated zones with minimal cr...
- Patent number 11,088,005
- Issue date Aug 10, 2021
- Applied Materials, Inc.
- Vijay D. Parkhe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Feedforward temperature control for plasma processing apparatus
- Patent number 10,854,425
- Issue date Dec 1, 2020
- Applied Materials, Inc.
- Chetan Mahadeswaraswamy
- G05 - CONTROLLING REGULATING
Information Patent Grant
Substrate support with symmetrical feed structure
- Patent number 10,770,328
- Issue date Sep 8, 2020
- Applied Materials, Inc.
- Xing Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric plasma process chamber
- Patent number 10,615,006
- Issue date Apr 7, 2020
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric plasma process chamber
- Patent number 10,580,620
- Issue date Mar 3, 2020
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric plasma process chamber
- Patent number 10,546,728
- Issue date Jan 28, 2020
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric plasma process chamber
- Patent number 10,535,502
- Issue date Jan 14, 2020
- Applied Materials, Inc.
- James D. Carducci
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method and apparatus for post exposure processing of photoresist wa...
- Patent number 10,474,033
- Issue date Nov 12, 2019
- Applied Materials, Inc.
- Viachslav Babayan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Symmetric plasma process chamber
- Patent number 10,453,656
- Issue date Oct 22, 2019
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for controlling temperature uniformity of a substrate
- Patent number 10,386,126
- Issue date Aug 20, 2019
- Applied Materials, Inc.
- Kallol Bera
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Grant
Electrostatic chuck having thermally isolated zones with minimal cr...
- Patent number 10,304,715
- Issue date May 28, 2019
- Applied Materials, Inc.
- Vijay D. Parkhe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for post exposure processing of photoresist wa...
- Patent number 10,203,604
- Issue date Feb 12, 2019
- Applied Materials, Inc.
- Viachslav Babayan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inductively coupled plasma source with top coil over a ceiling and...
- Patent number 10,131,994
- Issue date Nov 20, 2018
- Applied Materials, Inc.
- Andrew Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate support with symmetrical feed structure
- Patent number 10,096,494
- Issue date Oct 9, 2018
- Applied Materials, Inc.
- Xing Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pulsed plasma for film deposition
- Patent number 10,096,466
- Issue date Oct 9, 2018
- Applied Materials, Inc.
- Jun Xue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck having thermally isolated zones with minimal cr...
- Patent number 9,991,148
- Issue date Jun 5, 2018
- Applied Materials, Inc.
- Vijay D. Parkhe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fast response fluid control system
- Patent number 9,916,967
- Issue date Mar 13, 2018
- Applied Materials, Inc.
- Douglas A. Buchberger
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
BIASABLE ELECTROSTATIC CHUCK
- Publication number 20240234108
- Publication date Jul 11, 2024
- Applied Materials, Inc.
- Paneendra Prakash Bhat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROCESS CELL FOR FILED GUIDED POST EXPOSURE BAKE PROCESS
- Publication number 20240160117
- Publication date May 16, 2024
- Applied Materials, Inc.
- Dmitry LUBOMIRSKY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHAMBER AND METHODS OF COOLING A SUBSTRATE AFTER BAKING
- Publication number 20230161260
- Publication date May 25, 2023
- Applied Materials, Inc.
- Dmitry LUBOMIRSKY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHAMBER AND METHODS OF TREATING A SUBSTRATE AFTER EXPOSURE TO RADIA...
- Publication number 20220350251
- Publication date Nov 3, 2022
- Applied Materials, Inc.
- Dmitry LUBOMIRSKY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHODS FOR VERIFICATION AND RE-USE OF PROCESS FLUIDS
- Publication number 20220317579
- Publication date Oct 6, 2022
- Applied Materials, Inc.
- Mangesh Ashok BANGAR
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ROTATING BIASABLE PEDESTAL AND ELECTROSTATIC CHUCK IN SEMICONDUCTOR...
- Publication number 20220319896
- Publication date Oct 6, 2022
- Applied Materials, Inc.
- Qiwei LIANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
- Publication number 20220298636
- Publication date Sep 22, 2022
- Soham Sunjay ASRANI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
- Publication number 20220301867
- Publication date Sep 22, 2022
- Applied Materials, Inc.
- Jethro TANNOS
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS FOR POST EXPOSURE BAKE OF PHOTORESIST
- Publication number 20220269179
- Publication date Aug 25, 2022
- Applied Materials, Inc.
- Douglas A. BUCHBERGER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS FOR POST EXPOSURE BAKE OF PHOTORESIST
- Publication number 20220269180
- Publication date Aug 25, 2022
- Applied Materials, Inc.
- Douglas A. BUCHBERGER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS FOR POST EXPOSURE BAKE OF PHOTORESIST
- Publication number 20220260917
- Publication date Aug 18, 2022
- Applied Materials, Inc.
- Douglas A. BUCHBERGER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYMMETRIC PLASMA PROCESS CHAMBER
- Publication number 20220254606
- Publication date Aug 11, 2022
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR POST EXPOSURE BAKE OF PHOTORESIST
- Publication number 20220199414
- Publication date Jun 23, 2022
- Applied Materials, Inc.
- Douglas A. BUCHBERGER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU METHOD AND APPARATUS FOR MEASURING FLUID RESISTIVITY
- Publication number 20220113177
- Publication date Apr 14, 2022
- Applied Materials, Inc.
- Douglas A. BUCHBERGER
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND APPARATUS FOR POST EXPOSURE PROCESSING OF PHOTORESIST WA...
- Publication number 20220004104
- Publication date Jan 6, 2022
- Applied Materials, Inc.
- Viachslav Babayan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR DEPOSITING DIELECTRIC MATERIAL
- Publication number 20210384040
- Publication date Dec 9, 2021
- Bhargav S. CITLA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-SOURCE ION BEAM ETCH SYSTEM
- Publication number 20210104374
- Publication date Apr 8, 2021
- Applied Materials, Inc.
- Qiwei Liang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYMMETRIC PLASMA PROCESS CHAMBER
- Publication number 20200185192
- Publication date Jun 11, 2020
- Applied Materials, Inc.
- James D. Carducci
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
METHODS FOR DEPOSITING DIELECTRIC MATERIAL
- Publication number 20200090946
- Publication date Mar 19, 2020
- Applied Materials, Inc.
- Bhargav S. CITLA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK HAVING THERMALLY ISOLATED ZONES WITH MINIMAL CR...
- Publication number 20190279893
- Publication date Sep 12, 2019
- Applied Materials, Inc.
- Vijay D. Parkhe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR POST EXPOSURE PROCESSING OF PHOTORESIST WA...
- Publication number 20190187563
- Publication date Jun 20, 2019
- Applied Materials, Inc.
- Viachslav Babayan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HYDROPHOBIC ELECTROSTATIC CHUCK
- Publication number 20190115241
- Publication date Apr 18, 2019
- Kim VELLORE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma Reactor Having Radial Struts for Substrate Support
- Publication number 20190085467
- Publication date Mar 21, 2019
- Applied Materials, Inc.
- Andrew Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE SUPPORT WITH SYMMETRICAL FEED STRUCTURE
- Publication number 20190051551
- Publication date Feb 14, 2019
- XING LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CARRIER FOR DIE BONDING APPLICATIONS
- Publication number 20180374736
- Publication date Dec 27, 2018
- Applied Materials, Inc.
- Niranjan KUMAR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK HAVING THERMALLY ISOLATED ZONES WITH MINIMAL CR...
- Publication number 20180269098
- Publication date Sep 20, 2018
- Applied Materials, Inc.
- Vijay D. Parkhe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STRESS BALANCED ELECTROSTATIC SUBSTRATE CARRIER WITH CONTACTS
- Publication number 20180122679
- Publication date May 3, 2018
- Applied Materials, Inc.
- Shambhu N. Roy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSED WAFER AS TOP PLATE OF A WORKPIECE CARRIER IN SEMICONDUCTO...
- Publication number 20180025931
- Publication date Jan 25, 2018
- Applied Materials, Inc.
- Srinivas D. Nemani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR POST EXPOSURE PROCESSING OF PHOTORESIST WA...
- Publication number 20170363960
- Publication date Dec 21, 2017
- Applied Materials, Inc.
- Viachslav Babayan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Inductively Coupled Plasma Source with Multiple Dielectric Windows...
- Publication number 20170350018
- Publication date Dec 7, 2017
- Applied Materials, Inc.
- Andrew Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Douglas A. Buchberger JR.

Person

Patents Grantslast 30 patents

Chamber and methods of treating a substrate after exposure to radia...

Rotating biasable pedestal and electrostatic chuck in semiconductor...

Methods and apparatus for processing a substrate

Apparatus for post exposure bake of photoresist

Method and apparatus for post exposure processing of photoresist wa...

Apparatus for post exposure bake of photoresist

Methods for depositing dielectric material

Apparatus and methods for verification and re-use of process fluids

In-situ method and apparatus for measuring fluid resistivity

Multi-source ion beam etch system

Symmetric plasma process chamber

Method and apparatus for post exposure processing of photoresist wa...

Methods for depositing dielectric material

Electrostatic chuck having thermally isolated zones with minimal cr...

Feedforward temperature control for plasma processing apparatus

Substrate support with symmetrical feed structure

Symmetric plasma process chamber

Symmetric plasma process chamber

Symmetric plasma process chamber

Symmetric plasma process chamber

Method and apparatus for post exposure processing of photoresist wa...

Symmetric plasma process chamber

Apparatus for controlling temperature uniformity of a substrate

Electrostatic chuck having thermally isolated zones with minimal cr...

Method and apparatus for post exposure processing of photoresist wa...

Inductively coupled plasma source with top coil over a ceiling and...

Substrate support with symmetrical feed structure

Pulsed plasma for film deposition

Electrostatic chuck having thermally isolated zones with minimal cr...

Fast response fluid control system

Patents Applicationslast 30 patents

BIASABLE ELECTROSTATIC CHUCK

PROCESS CELL FOR FILED GUIDED POST EXPOSURE BAKE PROCESS

CHAMBER AND METHODS OF COOLING A SUBSTRATE AFTER BAKING

CHAMBER AND METHODS OF TREATING A SUBSTRATE AFTER EXPOSURE TO RADIA...

APPARATUS AND METHODS FOR VERIFICATION AND RE-USE OF PROCESS FLUIDS

ROTATING BIASABLE PEDESTAL AND ELECTROSTATIC CHUCK IN SEMICONDUCTOR...

METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE

METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE

APPARATUS FOR POST EXPOSURE BAKE OF PHOTORESIST

APPARATUS FOR POST EXPOSURE BAKE OF PHOTORESIST

APPARATUS FOR POST EXPOSURE BAKE OF PHOTORESIST

SYMMETRIC PLASMA PROCESS CHAMBER

APPARATUS FOR POST EXPOSURE BAKE OF PHOTORESIST

IN-SITU METHOD AND APPARATUS FOR MEASURING FLUID RESISTIVITY

METHOD AND APPARATUS FOR POST EXPOSURE PROCESSING OF PHOTORESIST WA...

METHODS FOR DEPOSITING DIELECTRIC MATERIAL

MULTI-SOURCE ION BEAM ETCH SYSTEM

SYMMETRIC PLASMA PROCESS CHAMBER

METHODS FOR DEPOSITING DIELECTRIC MATERIAL

ELECTROSTATIC CHUCK HAVING THERMALLY ISOLATED ZONES WITH MINIMAL CR...

METHOD AND APPARATUS FOR POST EXPOSURE PROCESSING OF PHOTORESIST WA...

HYDROPHOBIC ELECTROSTATIC CHUCK

Plasma Reactor Having Radial Struts for Substrate Support

SUBSTRATE SUPPORT WITH SYMMETRICAL FEED STRUCTURE

ELECTROSTATIC CARRIER FOR DIE BONDING APPLICATIONS

ELECTROSTATIC CHUCK HAVING THERMALLY ISOLATED ZONES WITH MINIMAL CR...

STRESS BALANCED ELECTROSTATIC SUBSTRATE CARRIER WITH CONTACTS

PROCESSED WAFER AS TOP PLATE OF A WORKPIECE CARRIER IN SEMICONDUCTO...

METHOD AND APPARATUS FOR POST EXPOSURE PROCESSING OF PHOTORESIST WA...

Inductively Coupled Plasma Source with Multiple Dielectric Windows...