Douglas P. Nadeau

Person

Underhill, VT, US

People

Patents Grantslast 30 patents

Information Patent Grant
Design structure for facilitating engineering changes in integrated...
- Patent number 7,480,888
- Issue date Jan 20, 2009
- International Business Machines Corporation
- Clarence Rosser Ogilvie
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Brush pressure control system for chemical and mechanical treatment...
- Patent number 6,647,579
- Issue date Nov 18, 2003
- International Business Machines Corp.
- Paul A. Manfredi
- B08 - CLEANING
Information Patent Grant
Off-concentric polishing system design
- Patent number 6,432,823
- Issue date Aug 13, 2002
- International Business Machines Corporation
- Cuc K. Huynh
- B24 - GRINDING POLISHING
Information Patent Grant
Method for chemical mechanical polishing of semiconductor wafer
- Patent number 6,300,246
- Issue date Oct 9, 2001
- International Business Machines Corporation
- Cuc K. Huynh
- B24 - GRINDING POLISHING
Information Patent Grant
Wafer carrier rinsing mechanism
- Patent number 6,287,178
- Issue date Sep 11, 2001
- International Business Machines Corporation
- Cuc Kim Huynh
- B08 - CLEANING
Information Patent Grant
In-situ automated CMP wedge conditioner
- Patent number 6,273,797
- Issue date Aug 14, 2001
- International Business Machines Corporation
- Kent R. Becker
- B24 - GRINDING POLISHING
Information Patent Grant
CMP wet application wafer sensor
- Patent number 6,247,368
- Issue date Jun 19, 2001
- International Business Machines Corporation
- Scott R. Cline
- G01 - MEASURING TESTING
Information Patent Grant
Downstream monitor for CMP brush cleaners
- Patent number 5,974,868
- Issue date Nov 2, 1999
- International Business Machines Corporation
- Donald M. Decain
- B08 - CLEANING
Information Patent Grant
CMP polishing pad backside modifications for advantageous polishing...
- Patent number 5,913,713
- Issue date Jun 22, 1999
- International Business Machines Corporation
- Roger W. Cheek
- B24 - GRINDING POLISHING
Information Patent Grant
Brush conditioner wing
- Patent number 5,894,622
- Issue date Apr 20, 1999
- International Business Machines Corporation
- Paul A. Manfredi
- B08 - CLEANING
Information Patent Grant
Downstream monitor for CMP brush cleaners
- Patent number 5,834,642
- Issue date Nov 10, 1998
- International Business Machines Corporation
- Donald M. Decain
- B08 - CLEANING
Information Patent Grant
Silicon wafer cleaning and polishing pads
- Patent number 5,778,481
- Issue date Jul 14, 1998
- International Business Machines Corporation
- Michael R. Amsden
- B08 - CLEANING
Information Patent Grant
Process for removing residue from a semiconductor wafer after chemi...
- Patent number 5,704,987
- Issue date Jan 6, 1998
- International Business Machines Corporation
- Cuc Kim Huynh
- B08 - CLEANING

Patents Applicationslast 30 patents

Information Patent Application
STOP MOTION IMAGING DETECTION SYSTEM AND METHOD
- Publication number 20050244047
- Publication date Nov 3, 2005
- International Business Machines Corporation
- Frederick W. Kern
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Off-concentric polishing system design
- Publication number 20020182866
- Publication date Dec 5, 2002
- Cuc K. Huynh
- B24 - GRINDING POLISHING
Information Patent Application
Brush pressure control system for chemical and mechanical treatment...
- Publication number 20020073495
- Publication date Jun 20, 2002
- Paul A. Manfredi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Wafer carrier rinsing mechanism
- Publication number 20010023166
- Publication date Sep 20, 2001
- Cuc Kim Huynh
- B24 - GRINDING POLISHING

Douglas P. Nadeau

Person

Patents Grantslast 30 patents

Design structure for facilitating engineering changes in integrated...

Brush pressure control system for chemical and mechanical treatment...

Off-concentric polishing system design

Method for chemical mechanical polishing of semiconductor wafer

Wafer carrier rinsing mechanism

In-situ automated CMP wedge conditioner

CMP wet application wafer sensor

Downstream monitor for CMP brush cleaners

CMP polishing pad backside modifications for advantageous polishing...

Brush conditioner wing

Downstream monitor for CMP brush cleaners

Silicon wafer cleaning and polishing pads

Process for removing residue from a semiconductor wafer after chemi...

Patents Applicationslast 30 patents

STOP MOTION IMAGING DETECTION SYSTEM AND METHOD

Off-concentric polishing system design

Brush pressure control system for chemical and mechanical treatment...

Wafer carrier rinsing mechanism