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Douglas Powell
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Highland Heights, OH, US
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last 30 patents
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Patent Grant
Method to reduce dislocation density in silicon using stress
Patent number
8,389,999
Issue date
Mar 5, 2013
Massachusetts Institute of Technology
Anthony Buonassisi
H01 - BASIC ELECTRIC ELEMENTS
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last 30 patents
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Patent Application
METHOD TO REDUCE DISLOCATION DENSITY IN SILICON USING STRESS
Publication number
20110073869
Publication date
Mar 31, 2011
Massachusetts Institute of Technology
Anthony Buonassisi
H01 - BASIC ELECTRIC ELEMENTS