Douglas Van Den Broeke

Person

Sunnyvale, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method, program product and apparatus for performing double exposur...
- Patent number 8,910,091
- Issue date Dec 9, 2014
- ASML Netherlands B.V.
- Jang Fung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for performing model-based OPC for pattern dec...
- Patent number 8,644,589
- Issue date Feb 4, 2014
- ASML Masktools B.V.
- Duan-Fu Stephen Hsu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus for performing dark field double dipole lithog...
- Patent number 8,632,930
- Issue date Jan 21, 2014
- ASML Masktools B.V.
- Duan-Fu Stephen Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method, program product and apparatus for model based scattering ba...
- Patent number 8,495,529
- Issue date Jul 23, 2013
- ASML Masktools B.V.
- Douglas van Den Broeke
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for performing model-based OPC for pattern dec...
- Patent number 8,391,605
- Issue date Mar 5, 2013
- ASML Masktools B.V.
- Duan-Fu Stephen Hsu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method, program product and apparatus for performing mask feature p...
- Patent number 8,132,130
- Issue date Mar 6, 2012
- ASML Masktools B.V.
- Jang Fung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method, program product and apparatus for performing double exposur...
- Patent number 8,122,391
- Issue date Feb 21, 2012
- ASML Masktools B.V.
- Jang Fung Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus for performing model-based OPC for pattern dec...
- Patent number 8,111,921
- Issue date Feb 7, 2012
- ASML Masktools B.V.
- Duan-Fu Stephen Hsu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Scattering bar OPC application method for sub-half wavelength litho...
- Patent number 8,039,180
- Issue date Oct 18, 2011
- ASML Masktools B.V.
- Thomas Laidig
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method, program product and apparatus for translating geometrical d...
- Patent number 8,040,573
- Issue date Oct 18, 2011
- ASML Masktools B.V.
- Xuelong Shi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
CPL mask and a method and program product for generating the same
- Patent number 7,998,355
- Issue date Aug 16, 2011
- ASML Masktools B.V.
- Douglas Van Den Broeke
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for performing dark field double dipole lithog...
- Patent number 7,981,576
- Issue date Jul 19, 2011
- ASML Masktools B.V.
- Duan-Fu Stephen Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Scattering bar OPC application method for sub-half wavelength litho...
- Patent number 7,892,707
- Issue date Feb 22, 2011
- ASML Masktools B.V.
- Thomas Laidig
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
CPL mask and a method and program product for generating the same
- Patent number 7,892,703
- Issue date Feb 22, 2011
- ASML Masktools B.V.
- Jang Fung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for performing dark field double dipole lithog...
- Patent number 7,824,826
- Issue date Nov 2, 2010
- ASML Masktools B.V.
- Duan-Fu Stephen Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method, program product and apparatus for performing double exposur...
- Patent number 7,681,171
- Issue date Mar 16, 2010
- ASML Masktooks B.V.
- Jang Fung Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of achieving CD linearity control for full-chip CPL manufact...
- Patent number 7,667,216
- Issue date Feb 23, 2010
- ASML Masktools B.V.
- Doug Van Den Broeke
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method, program product and apparatus for model based scattering ba...
- Patent number 7,620,930
- Issue date Nov 17, 2009
- ASML Masktools B.V.
- Douglas Van Den Broeke
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for performing pattern pitch-split decomposition utilizing a...
- Patent number 7,617,476
- Issue date Nov 10, 2009
- ASML Masktools B.V.
- Duan-Fu Stephen Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for generating OPC rules for placement of scat...
- Patent number 7,614,034
- Issue date Nov 3, 2009
- ASML Masktools B.V.
- Douglas Van Den Broeke
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for improved manufacturability and patterning of sub-wavelen...
- Patent number 7,604,909
- Issue date Oct 20, 2009
- ASML Masktools B.V.
- Chung-Wei Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for performing model based placement of phase-...
- Patent number 7,550,235
- Issue date Jun 23, 2009
- ASML Masktools B.V.
- Xuelong Shi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for decomposing semiconductor device patterns...
- Patent number 7,549,140
- Issue date Jun 16, 2009
- ASML Masktools B.V.
- Doug Van Den Broeke
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for improved lithographic patterning utilizing optimized ill...
- Patent number 7,523,438
- Issue date Apr 21, 2009
- ASML Masktools B.V.
- Michael Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for performing transmission tuning of a mask pattern to impr...
- Patent number 7,514,183
- Issue date Apr 7, 2009
- ASML Masktools B.V.
- Stephen D. Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Scattering bar OPC application method for sub-half wavelength litho...
- Patent number 7,485,396
- Issue date Feb 3, 2009
- ASML Masktools B.V.
- Thomas Laidig
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illuminator controlled tone reversal printing
- Patent number 7,421,677
- Issue date Sep 2, 2008
- ASML Netherlands B.V.
- Steven G. Hansen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Eigen decomposition based OPC model
- Patent number 7,398,508
- Issue date Jul 8, 2008
- ASML Masktooks B.V.
- Xuelong Shi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method, program product and apparatus for generating assist feature...
- Patent number 7,376,930
- Issue date May 20, 2008
- ASML Masktools B.V.
- Kurt E. Wampler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Scattering bar OPC application method for sub-half wavelength litho...
- Patent number 7,354,681
- Issue date Apr 8, 2008
- ASML Masktools B.V.
- Thomas Laidig
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
DIGITAL LITHOGRAPHY EXPOSURE UNIT BOUNDARY SMOOTHING
- Publication number 20240280911
- Publication date Aug 22, 2024
- Applied Materials, Inc.
- CHI-MING TSAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS TO IMPROVE PROCESS WINDOW AND RESOLUTION FOR DIGITAL LITHOG...
- Publication number 20230314953
- Publication date Oct 5, 2023
- Applied Materials, Inc.
- Chi-Ming TSAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MURA REDUCTION METHOD
- Publication number 20230152684
- Publication date May 18, 2023
- Applied Materials, Inc.
- Douglas Joseph VAN DEN BROEKE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
UNIVERSAL METROLOGY FILE, PROTOCOL, AND PROCESS FOR MASKLESS LITHOG...
- Publication number 20220382171
- Publication date Dec 1, 2022
- Applied Materials, Inc.
- Tamer COSKUN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FOCUS CENTERING METHOD FOR DIGITAL LITHOGRAPHY
- Publication number 20180024448
- Publication date Jan 25, 2018
- Applied Materials, Inc.
- Yeishin TUNG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD, PROGRAM PRODUCT AND APPARATUS FOR PERFORMING DOUBLE EXPOSUR...
- Publication number 20150095858
- Publication date Apr 2, 2015
- Jang Fung Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method and Apparatus for Performing Model-Based OPC for Pattern Dec...
- Publication number 20130182940
- Publication date Jul 18, 2013
- ASML NETHERLANDS B.V.
- Duan-Fu Stephen Hsu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method, Program Product and Apparatus for Performing Double Exposur...
- Publication number 20130055171
- Publication date Feb 28, 2013
- ASML MASKTOOLS B.V.
- Jang Fung Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method and Apparatus for Performing Model-Based OPC for Pattern Dec...
- Publication number 20120122023
- Publication date May 17, 2012
- ASML MASKTOOLS B.V.
- Duan-Fu Stephen Hsu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method and Apparatus for Performing Dark Field Double Dipole Lithog...
- Publication number 20110236808
- Publication date Sep 29, 2011
- ASML Mask Tools B.V.
- Duan-Fu Stephen Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Scattering Bar OPC Application Method for Sub-Half Wavelength Litho...
- Publication number 20110143268
- Publication date Jun 16, 2011
- ASML MASKTOOLS B.V.
- Thomas Laidig
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and Apparatus for Performing Dark Field Double Dipole Lithog...
- Publication number 20110014552
- Publication date Jan 20, 2011
- ASML Mask Tools B.V.
- Duan-Fu Stephen Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for performing pattern pitch-split decomposition utilizing a...
- Publication number 20080092106
- Publication date Apr 17, 2008
- Duan-Fu Stephen Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and apparatus for performing model-based OPC for pattern dec...
- Publication number 20080069432
- Publication date Mar 20, 2008
- Duan-Fu Stephen Hsu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method, program product and apparatus for translating geometrical d...
- Publication number 20080068668
- Publication date Mar 20, 2008
- Xuelong Shi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and apparatus for performing dark field double dipole lithog...
- Publication number 20080020296
- Publication date Jan 24, 2008
- Duan-Fu Stephen Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for improved manufacturability and patterning of sub-wavelen...
- Publication number 20080014509
- Publication date Jan 17, 2008
- Chung-Wei Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and apparatus for generating OPC rules for placement of scat...
- Publication number 20070122719
- Publication date May 31, 2007
- Douglas Van Den Broeke
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CPL mask and a method and program product for generating the same
- Publication number 20070065733
- Publication date Mar 22, 2007
- Jang Fung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method, program product and apparatus for performing mask feature p...
- Publication number 20070031740
- Publication date Feb 8, 2007
- Jang Fung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method, program product and apparatus for performing double exposur...
- Publication number 20060277521
- Publication date Dec 7, 2006
- Jang Fung Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20060146307
- Publication date Jul 6, 2006
- ASML NETHERLANDS B.V.
- Steven George Hansen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for performing transmission tuning of a mask pattern to impr...
- Publication number 20050196682
- Publication date Sep 8, 2005
- Stephen D. Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Illuminator controlled tone reversal printing
- Publication number 20050094121
- Publication date May 5, 2005
- ASML NETHERLANDS B.V.
- Steven G. Hansen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method, program product and apparatus for generating assist feature...
- Publication number 20050053848
- Publication date Mar 10, 2005
- Kurt E. Wampler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Illuminator controlled tone reversal printing
- Publication number 20040207829
- Publication date Oct 21, 2004
- ASML NETHERLANDS, B.V.
- Steven G. Hansen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and apparatus for defining mask patterns utilizing a spatial...
- Publication number 20040006757
- Publication date Jan 8, 2004
- Jang Fung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for improved lithographic patterning utilizing multiple cohe...
- Publication number 20030073013
- Publication date Apr 17, 2003
- Michael Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Binary and phase-shift photomasks
- Publication number 20030022072
- Publication date Jan 30, 2003
- Diverging Technologies, Inc.
- Jim G. Campi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Douglas Van Den Broeke

Person

Patents Grantslast 30 patents

Method, program product and apparatus for performing double exposur...

Method and apparatus for performing model-based OPC for pattern dec...

Method and apparatus for performing dark field double dipole lithog...

Method, program product and apparatus for model based scattering ba...

Method and apparatus for performing model-based OPC for pattern dec...

Method, program product and apparatus for performing mask feature p...

Method, program product and apparatus for performing double exposur...

Method and apparatus for performing model-based OPC for pattern dec...

Scattering bar OPC application method for sub-half wavelength litho...

Method, program product and apparatus for translating geometrical d...

CPL mask and a method and program product for generating the same

Method and apparatus for performing dark field double dipole lithog...

Scattering bar OPC application method for sub-half wavelength litho...

CPL mask and a method and program product for generating the same

Method and apparatus for performing dark field double dipole lithog...

Method, program product and apparatus for performing double exposur...

Method of achieving CD linearity control for full-chip CPL manufact...

Method, program product and apparatus for model based scattering ba...

Method for performing pattern pitch-split decomposition utilizing a...

Method and apparatus for generating OPC rules for placement of scat...

Method for improved manufacturability and patterning of sub-wavelen...

Method and apparatus for performing model based placement of phase-...

Method and apparatus for decomposing semiconductor device patterns...

Method for improved lithographic patterning utilizing optimized ill...

Method for performing transmission tuning of a mask pattern to impr...

Scattering bar OPC application method for sub-half wavelength litho...

Illuminator controlled tone reversal printing

Eigen decomposition based OPC model

Method, program product and apparatus for generating assist feature...

Scattering bar OPC application method for sub-half wavelength litho...

Patents Applicationslast 30 patents

DIGITAL LITHOGRAPHY EXPOSURE UNIT BOUNDARY SMOOTHING

METHODS TO IMPROVE PROCESS WINDOW AND RESOLUTION FOR DIGITAL LITHOG...

MURA REDUCTION METHOD

UNIVERSAL METROLOGY FILE, PROTOCOL, AND PROCESS FOR MASKLESS LITHOG...

FOCUS CENTERING METHOD FOR DIGITAL LITHOGRAPHY

METHOD, PROGRAM PRODUCT AND APPARATUS FOR PERFORMING DOUBLE EXPOSUR...

Method and Apparatus for Performing Model-Based OPC for Pattern Dec...

Method, Program Product and Apparatus for Performing Double Exposur...

Method and Apparatus for Performing Model-Based OPC for Pattern Dec...

Method and Apparatus for Performing Dark Field Double Dipole Lithog...

Scattering Bar OPC Application Method for Sub-Half Wavelength Litho...

Method and Apparatus for Performing Dark Field Double Dipole Lithog...

Method for performing pattern pitch-split decomposition utilizing a...

Method and apparatus for performing model-based OPC for pattern dec...

Method, program product and apparatus for translating geometrical d...

Method and apparatus for performing dark field double dipole lithog...

Method for improved manufacturability and patterning of sub-wavelen...

Method and apparatus for generating OPC rules for placement of scat...

CPL mask and a method and program product for generating the same

Method, program product and apparatus for performing mask feature p...

Method, program product and apparatus for performing double exposur...

Lithographic apparatus and device manufacturing method

Method for performing transmission tuning of a mask pattern to impr...

Illuminator controlled tone reversal printing

Method, program product and apparatus for generating assist feature...

Illuminator controlled tone reversal printing

Method and apparatus for defining mask patterns utilizing a spatial...

Method for improved lithographic patterning utilizing multiple cohe...

Binary and phase-shift photomasks