Dustin Zachary Austin

Person

Corvallis, OR, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method to clean SnO2 film from chamber
- Patent number 11,915,923
- Issue date Feb 27, 2024
- Lam Research Corporation
- Akhil Singhal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching metal-oxide and protecting chamber components
- Patent number 11,717,866
- Issue date Aug 8, 2023
- Lam Research Corporation
- Akhil N. Singhal
- B08 - CLEANING
Information Patent Grant
Modification of SNO2 surface for EUV lithography
- Patent number 11,031,244
- Issue date Jun 8, 2021
- Lam Research Corporation
- Akhil Singhal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to clean SnO2 film from chamber
- Patent number 10,840,082
- Issue date Nov 17, 2020
- Lam Research Corporation
- Akhil Singhal
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA ENHANCED ATOMIC LAYER DEPOSITION OF SILICON-CONTAINING FILMS
- Publication number 20240327973
- Publication date Oct 3, 2024
- LAM RESEARCH CORPORATION
- Ravi KUMAR
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REDUCING INTRALEVEL CAPACITANCE IN SEMICONDUCTOR DEVICES
- Publication number 20230307290
- Publication date Sep 28, 2023
- LAM RESEARCH CORPORATION
- Joseph R. ABEL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONFORMAL THERMAL CVD WITH CONTROLLED FILM PROPERTIES AND HIGH DEPO...
- Publication number 20230245896
- Publication date Aug 3, 2023
- LAM RESEARCH CORPORATION
- Awnish Gupta
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEAM MITIGATION AND INTEGRATED LINER FOR GAP FILL
- Publication number 20230175117
- Publication date Jun 8, 2023
- LAM RESEARCH CORPORATION
- Dustin Zachary AUSTIN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROTECTIVE COATING FOR A SEMICONDUCTOR REACTION CHAMBER
- Publication number 20230038880
- Publication date Feb 9, 2023
- LAM RESEARCH CORPORATION
- Alon Ganany
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ETCHING METAL-OXIDE AND PROTECTING CHAMBER COMPONENTS
- Publication number 20220258216
- Publication date Aug 18, 2022
- LAM RESEARCH CORPORATION
- Akhil N. Singhal
- B08 - CLEANING
Information Patent Application
EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY USING AN INTERVENING LAYER OR...
- Publication number 20220197147
- Publication date Jun 23, 2022
- LAM RESEARCH CORPORATION
- Andrew LIANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ETCHING METAL-OXIDE AND PROTECTING CHAMBER COMPONENTS
- Publication number 20210308726
- Publication date Oct 7, 2021
- LAM RESEARCH CORPORATION
- Akhil N. Singhal
- B08 - CLEANING
Information Patent Application
METHOD TO CLEAN SNO2 FILM FROM CHAMBER
- Publication number 20210057208
- Publication date Feb 25, 2021
- LAM RESEARCH CORPORATION
- Akhil Singhal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODIFICATION OF SNO2 SURFACE FOR EUV LITHOGRAPHY
- Publication number 20200058492
- Publication date Feb 20, 2020
- LAM RESEARCH CORPORATION
- Akhil Singhal
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD TO CLEAN SNO2 FILM FROM CHAMBER
- Publication number 20200051807
- Publication date Feb 13, 2020
- LAM RESEARCH CORPORATION
- Akhil Singhal
- H01 - BASIC ELECTRIC ELEMENTS

Dustin Zachary Austin

Person

Patents Grantslast 30 patents

Method to clean SnO2 film from chamber

Etching metal-oxide and protecting chamber components

Modification of SNO2 surface for EUV lithography

Method to clean SnO2 film from chamber

Patents Applicationslast 30 patents

PLASMA ENHANCED ATOMIC LAYER DEPOSITION OF SILICON-CONTAINING FILMS

REDUCING INTRALEVEL CAPACITANCE IN SEMICONDUCTOR DEVICES

CONFORMAL THERMAL CVD WITH CONTROLLED FILM PROPERTIES AND HIGH DEPO...

SEAM MITIGATION AND INTEGRATED LINER FOR GAP FILL

PROTECTIVE COATING FOR A SEMICONDUCTOR REACTION CHAMBER

ETCHING METAL-OXIDE AND PROTECTING CHAMBER COMPONENTS

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY USING AN INTERVENING LAYER OR...

ETCHING METAL-OXIDE AND PROTECTING CHAMBER COMPONENTS

METHOD TO CLEAN SNO2 FILM FROM CHAMBER

MODIFICATION OF SNO2 SURFACE FOR EUV LITHOGRAPHY

METHOD TO CLEAN SNO2 FILM FROM CHAMBER