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E. Steve Putna
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Beaverton, OR, US
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last 30 patents
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Patent Application
Reducing photoresist line edge roughness using chemically-assisted...
Publication number
20050084807
Publication date
Apr 21, 2005
Robert P. Meagley
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Patent Application
Photoresist performance through control of polymer characteristics
Publication number
20040265734
Publication date
Dec 30, 2004
Wang Yueh
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...