Eberhard Kuhn

Person

Hemhofen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Silicon-containing resist for photolithography
- Patent number 7,052,820
- Issue date May 30, 2006
- Infineon Technologies AG
- Jörg Rottstegge
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Process for increasing the etch resistance and for reducing the hol...
- Patent number 7,018,784
- Issue date Mar 28, 2006
- Infineon Technologies AG
- Jörg Rottstegge
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative resist process with simultaneous development and aromatiza...
- Patent number 6,946,236
- Issue date Sep 20, 2005
- Infineon Technologies AG
- Jörg Rottstegge
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for sidewall amplification of resist structures and for the...
- Patent number 6,893,972
- Issue date May 17, 2005
- Infineon Technologies AG
- Jörg Rottstegge
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Negative resist process with simultaneous development and silylation
- Patent number 6,770,423
- Issue date Aug 3, 2004
- Infineon Technologies AG
- Jörg Rottstegge
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dry-developable positive resist
- Patent number 5,733,706
- Issue date Mar 31, 1998
- Siemens Aktiengesellschaft
- Recai Sezi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative resists with high thermal stability comprising end capped...
- Patent number 5,486,447
- Issue date Jan 23, 1996
- Siemens Aktiengesellschaft
- Albert Hammerschmidt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for the preparation of polyimide and polyisoindoloquinazolin...
- Patent number 4,654,415
- Issue date Mar 31, 1987
- Siemens Aktiengesellschaft
- Hellmut Ahne
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polyoxazole precursor and the preparation thereof
- Patent number 4,398,009
- Issue date Aug 9, 1983
- Siemens Aktiengesellschaft
- Hellmut Ahne
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polyimidazole and polyimidazopyrrolone precursor stages and the pre...
- Patent number 4,397,999
- Issue date Aug 9, 1983
- Siemens Aktiengesellschaft
- Hellmut Ahne
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for the preparation of heat-resistant relief structures usin...
- Patent number 4,395,482
- Issue date Jul 26, 1983
- Siemens Aktiengesellschaft
- Hellmut Ahne
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polyimide, polyisoindoloquinazoline dione, polyoxazine dione and po...
- Patent number 4,385,165
- Issue date May 24, 1983
- Siemens Aktiengesellschaft
- Hellmut Ahne
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation-reactive precursor stages of highly heat-resistant polymers
- Patent number 4,371,685
- Issue date Feb 1, 1983
- Siemens Aktiengesellschaft
- Hellmut Ahne
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for the preparation of highly heat-resistant relief structur...
- Patent number 4,366,230
- Issue date Dec 28, 1982
- Siemens Aktiengesellschaft
- Hellmut Ahne
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Heat resistant positive resists containing polyoxazoles
- Patent number 4,339,521
- Issue date Jul 13, 1982
- Siemens Aktiengesellschaft
- Hellmut Ahne
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for the preparation of highly heat-resistant relief
- Patent number 4,332,882
- Issue date Jun 1, 1982
- Siemens Aktiengesellschaft
- Hellmut Ahne
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for the manufacture of highly heat-resistant relief structures
- Patent number 4,332,883
- Issue date Jun 1, 1982
- Siemens Aktiengesellschaft
- Hellmut Ahne
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
N-Azidosulfonylaryl-maleinimides
- Patent number 4,329,556
- Issue date May 11, 1982
- Siemens Aktiengesellschaft
- Roland Rubner
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method for the preparation of highly heat-resistant relief structur...
- Patent number 4,311,785
- Issue date Jan 19, 1982
- Siemens Aktiengesellschaft
- Hellmut Ahne
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for the preparation of relief structures by phototechniques
- Patent number 4,292,398
- Issue date Sep 29, 1981
- Siemens Aktiengesellschaft
- Roland Rubner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for the preparation of relief structures by phototechniques
- Patent number 4,287,294
- Issue date Sep 1, 1981
- Siemens Aktiengesellschaft
- Roland Rubner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for the preparation of relief structures
- Patent number RE30186
- Issue date Jan 8, 1980
- Siemens Aktiengesellschaft
- Roland Rubner
- 430 - Radiation imagery chemistry: process, composition, or product thereof

Patents Applicationslast 30 patents

Information Patent Application
Process for increasing the etch resistance and for reducing the hol...
- Publication number 20040043330
- Publication date Mar 4, 2004
- Jorg Rottstegge
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Silicon-containing resist for photolithography
- Publication number 20030108812
- Publication date Jun 12, 2003
- Jorg Rottstegge
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process for sidewall amplification of resist structures and for the...
- Publication number 20030091936
- Publication date May 15, 2003
- Jorg Rottstegge
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Negative resist process with simultaneous development and silylation
- Publication number 20030082488
- Publication date May 1, 2003
- Jorg Rottstegge
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Negative resist process with simultaneous development and aromatiza...
- Publication number 20030073037
- Publication date Apr 17, 2003
- Jorg Rottstegge
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Eberhard Kuhn

Person

Patents Grantslast 30 patents

Silicon-containing resist for photolithography

Process for increasing the etch resistance and for reducing the hol...

Negative resist process with simultaneous development and aromatiza...

Process for sidewall amplification of resist structures and for the...

Negative resist process with simultaneous development and silylation

Dry-developable positive resist

Negative resists with high thermal stability comprising end capped...

Method for the preparation of polyimide and polyisoindoloquinazolin...

Polyoxazole precursor and the preparation thereof

Polyimidazole and polyimidazopyrrolone precursor stages and the pre...

Method for the preparation of heat-resistant relief structures usin...

Polyimide, polyisoindoloquinazoline dione, polyoxazine dione and po...

Radiation-reactive precursor stages of highly heat-resistant polymers

Method for the preparation of highly heat-resistant relief structur...

Heat resistant positive resists containing polyoxazoles

Method for the preparation of highly heat-resistant relief

Method for the manufacture of highly heat-resistant relief structures

N-Azidosulfonylaryl-maleinimides

Method for the preparation of highly heat-resistant relief structur...

Method for the preparation of relief structures by phototechniques

Method for the preparation of relief structures by phototechniques

Method for the preparation of relief structures

Patents Applicationslast 30 patents

Process for increasing the etch resistance and for reducing the hol...

Silicon-containing resist for photolithography

Process for sidewall amplification of resist structures and for the...

Negative resist process with simultaneous development and silylation

Negative resist process with simultaneous development and aromatiza...