Ebo H. Croffie

Person

Portland, OR, US

People

Patents Grantslast 30 patents

Information Patent Grant
Maskless vortex phase shift optical direct write lithography
- Patent number 9,188,848
- Issue date Nov 17, 2015
- Avago Technologies General IP (Singapore) Pte. Ltd.
- Nicholas K. Eib
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Edge-based full chip mask topography modeling
- Patent number 8,918,743
- Issue date Dec 23, 2014
- Synopsys, Inc.
- Qiliang Yan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Compact and accurate wafer topography proximity effect modeling for...
- Patent number 8,719,736
- Issue date May 6, 2014
- Synopsys, Inc.
- Hongbo Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Maskless vortex phase shift optical direct write lithography
- Patent number 8,377,633
- Issue date Feb 19, 2013
- LSI Corporation
- Nicholas K. Eib
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Maskless vortex phase shift optical direct write lithography
- Patent number 8,057,963
- Issue date Nov 15, 2011
- LSI Corporation
- Nicholas K. Eib
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optimized mirror design for optical direct write
- Patent number 7,738,078
- Issue date Jun 15, 2010
- LSI Corporation
- Nicholas K. Eib
- G02 - OPTICS
Information Patent Grant
Method and apparatus for modifying a layout to improve manufacturin...
- Patent number 7,509,624
- Issue date Mar 24, 2009
- Synopsys, Inc.
- Lawrence S. Melvin, III
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method and systems for utilizing simplified resist process models t...
- Patent number 7,494,752
- Issue date Feb 24, 2009
- LSI Corporation
- Ebo H. Croffie
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Yield-limiting design-rules-compliant pattern library generation an...
- Patent number 7,458,060
- Issue date Nov 25, 2008
- LSI Logic Corporation
- Ebo H. Croffie
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Process and apparatus for achieving single exposure pattern transfe...
- Patent number 7,372,547
- Issue date May 13, 2008
- LSI Corporation
- Nicholas K. Eib
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for verifying the post-optical proximity corre...
- Patent number 7,325,222
- Issue date Jan 29, 2008
- LSI Logic Corporation
- Nadya G. Strelkova
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process window compliant corrections of design layout
- Patent number 7,313,508
- Issue date Dec 25, 2007
- LSI Corporation
- Ebo Croffie
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optimized mirror design for optical direct write
- Patent number 7,270,942
- Issue date Sep 18, 2007
- LSI Corporation
- Nicholas K. Eib
- G02 - OPTICS
Information Patent Grant
OPC based illumination optimization with mask error constraints
- Patent number 7,264,906
- Issue date Sep 4, 2007
- LSI Corporation
- Ebo H. Croffie
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process and apparatus for generating a strong phase shift optical p...
- Patent number 7,189,498
- Issue date Mar 13, 2007
- LSI Logic Corporation
- Nicholas K. Eib
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for utilizing an isofocal contour to perform opti...
- Patent number 7,117,475
- Issue date Oct 3, 2006
- LSI Logic Corporation
- Ebo Croffie
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multiple alternating phase shift technology for amplifying resolution
- Patent number 7,001,695
- Issue date Feb 21, 2006
- LSI Logic Corporation
- Ebo H. Croffie
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Maskless Vortex Phase Shift Optical Direct Write Lithography
- Publication number 20130107240
- Publication date May 2, 2013
- LSI Corporation
- Nicholas K. Eib
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Maskless Vortex Phase Shift Optical Direct Write Lithography
- Publication number 20120038896
- Publication date Feb 16, 2012
- LSI Corporation
- Nicholas K. Eib
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTIMIZED MIRROR DESIGN FOR OPTICAL DIRECT WRITE
- Publication number 20070247604
- Publication date Oct 25, 2007
- LSI Logic Corporation
- Nicholas K. Eib
- G02 - OPTICS
Information Patent Application
Yield-limiting design-rules-compliant pattern library generation an...
- Publication number 20070157153
- Publication date Jul 5, 2007
- Ebo H. Croffie
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method and apparatus for modifying a layout to improve manufacturin...
- Publication number 20060212839
- Publication date Sep 21, 2006
- Lawrence S. Melvin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and systems for utilizing simplified resist process models t...
- Publication number 20060183039
- Publication date Aug 17, 2006
- LSI Logic Corporation
- Ebo H. Croffie
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Maskless vortex phase shift optical direct write lithography
- Publication number 20050275814
- Publication date Dec 15, 2005
- LSI Logic Corporation, a Delaware Corporation
- Nicholas K. Eib
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and system for utilizing an isofocal contour to perform opti...
- Publication number 20050262467
- Publication date Nov 24, 2005
- Ebo Croffie
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process and apparatus for achieving single exposure pattern transfe...
- Publication number 20050237508
- Publication date Oct 27, 2005
- LSI Logic Corporation
- Nicholas K. Eib
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for verifying ret latent image sensitivity to mask manufactu...
- Publication number 20050204328
- Publication date Sep 15, 2005
- Nadya G. Strelkova
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process and apparatus for applying apodization to maskless optical...
- Publication number 20050151949
- Publication date Jul 14, 2005
- LSI Logic Corporation
- Nicholas K. Eib
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optimized mirror design for optical direct write
- Publication number 20050088640
- Publication date Apr 28, 2005
- LSI Logic Corporation
- Nicholas K. Eib
- G02 - OPTICS
Information Patent Application
Attenuated film with etched quartz phase shift mask
- Publication number 20050019673
- Publication date Jan 27, 2005
- Kunal Taravade
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Phase edge darkening binary masks
- Publication number 20050014075
- Publication date Jan 20, 2005
- Ebo H. Croffie
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Multiple alternating phase shift technology for amplifying resolution
- Publication number 20040224239
- Publication date Nov 11, 2004
- Ebo H. Croffie
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process window compliant corrections of design layout
- Publication number 20040128118
- Publication date Jul 1, 2004
- Ebo Croffie
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Ebo H. Croffie

Person

Patents Grantslast 30 patents

Maskless vortex phase shift optical direct write lithography

Edge-based full chip mask topography modeling

Compact and accurate wafer topography proximity effect modeling for...

Maskless vortex phase shift optical direct write lithography

Maskless vortex phase shift optical direct write lithography

Optimized mirror design for optical direct write

Method and apparatus for modifying a layout to improve manufacturin...

Method and systems for utilizing simplified resist process models t...

Yield-limiting design-rules-compliant pattern library generation an...

Process and apparatus for achieving single exposure pattern transfe...

Method and apparatus for verifying the post-optical proximity corre...

Process window compliant corrections of design layout

Optimized mirror design for optical direct write

OPC based illumination optimization with mask error constraints

Process and apparatus for generating a strong phase shift optical p...

Method and system for utilizing an isofocal contour to perform opti...

Multiple alternating phase shift technology for amplifying resolution

Patents Applicationslast 30 patents

Maskless Vortex Phase Shift Optical Direct Write Lithography

Maskless Vortex Phase Shift Optical Direct Write Lithography

OPTIMIZED MIRROR DESIGN FOR OPTICAL DIRECT WRITE

Yield-limiting design-rules-compliant pattern library generation an...

Method and apparatus for modifying a layout to improve manufacturin...

Method and systems for utilizing simplified resist process models t...

Maskless vortex phase shift optical direct write lithography

Method and system for utilizing an isofocal contour to perform opti...

Process and apparatus for achieving single exposure pattern transfe...

Method for verifying ret latent image sensitivity to mask manufactu...

Process and apparatus for applying apodization to maskless optical...

Optimized mirror design for optical direct write

Attenuated film with etched quartz phase shift mask

Phase edge darkening binary masks

Multiple alternating phase shift technology for amplifying resolution

Process window compliant corrections of design layout