EDGAR GENIO

Person

Santa Clara, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Metrology of thin film devices using an addressable micromirror array
- Patent number 8,130,373
- Issue date Mar 6, 2012
- Applied Materials, Inc.
- Edgar Genio
- G01 - MEASURING TESTING
Information Patent Grant
Spectrometric metrology of workpieces using a permanent window as a...
- Patent number 8,027,031
- Issue date Sep 27, 2011
- Applied Materials, Inc.
- Edgar Genio
- G01 - MEASURING TESTING
Information Patent Grant
Metrology of thin film devices using an addressable micromirror array
- Patent number 8,018,586
- Issue date Sep 13, 2011
- Applied Materials, Inc.
- Edgar Genio
- G01 - MEASURING TESTING
Information Patent Grant
Spectrographic metrology of patterned wafers
- Patent number 7,969,568
- Issue date Jun 28, 2011
- Applied Materials, Inc.
- James Matthew Holden
- G01 - MEASURING TESTING
Information Patent Grant
Spectrometric metrology of workpieces using a permanent window as a...
- Patent number 7,911,603
- Issue date Mar 22, 2011
- Applied Materials, Inc.
- Edgar Genio
- G01 - MEASURING TESTING
Information Patent Grant
Evaluation of openings in a dielectric layer
- Patent number 7,379,185
- Issue date May 27, 2008
- Applied Materials, Inc.
- Peter G. Borden
- G01 - MEASURING TESTING
Information Patent Grant
High throughput measurement of via defects in interconnects
- Patent number 7,026,175
- Issue date Apr 11, 2006
- Applied Materials, Inc.
- Jiping Li
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
METROLOGY OF THIN FILM DEVICES USING AN ADDRESSABLE MICROMIRROR ARRAY
- Publication number 20110254953
- Publication date Oct 20, 2011
- Applied Materials, Inc.
- EDGAR GENIO
- G01 - MEASURING TESTING
Information Patent Application
SPECTROMETRIC METROLOGY OF WORKPIECES USING A PERMANENT WINDOW AS A...
- Publication number 20110130995
- Publication date Jun 2, 2011
- Applied Materials, Inc.
- EDGAR GENIO
- G01 - MEASURING TESTING
Information Patent Application
SPECTROMETRIC METROLOGY OF WORKPIECES USING A PERMANENT WINDOW AS A...
- Publication number 20100106444
- Publication date Apr 29, 2010
- Applied Materials, Inc.
- EDGAR GENIO
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY OF THIN FILM DEVICES USING AN ADDRESSABLE MICROMIRROR ARRAY
- Publication number 20100106456
- Publication date Apr 29, 2010
- Applied Materials, Inc.
- EDGAR GENIO
- G01 - MEASURING TESTING
Information Patent Application
SPECTROGRAPHIC METROLOGY OF PATTERNED WAFERS
- Publication number 20100103411
- Publication date Apr 29, 2010
- Applied Materials, Inc.
- JAMES Matthew HOLDEN
- G01 - MEASURING TESTING
Information Patent Application
Evaluation of openings in a dielectric layer
- Publication number 20060094136
- Publication date May 4, 2006
- Peter G. Borden
- G01 - MEASURING TESTING
Information Patent Application
High throughput measurement of via defects in interconnects
- Publication number 20050214956
- Publication date Sep 29, 2005
- Applied Materials, Inc.
- Jiping Li
- G01 - MEASURING TESTING

EDGAR GENIO

Person

Patents Grantslast 30 patents

Metrology of thin film devices using an addressable micromirror array

Spectrometric metrology of workpieces using a permanent window as a...

Metrology of thin film devices using an addressable micromirror array

Spectrographic metrology of patterned wafers

Spectrometric metrology of workpieces using a permanent window as a...

Evaluation of openings in a dielectric layer

High throughput measurement of via defects in interconnects

Patents Applicationslast 30 patents

METROLOGY OF THIN FILM DEVICES USING AN ADDRESSABLE MICROMIRROR ARRAY

SPECTROMETRIC METROLOGY OF WORKPIECES USING A PERMANENT WINDOW AS A...

SPECTROMETRIC METROLOGY OF WORKPIECES USING A PERMANENT WINDOW AS A...

METROLOGY OF THIN FILM DEVICES USING AN ADDRESSABLE MICROMIRROR ARRAY

SPECTROGRAPHIC METROLOGY OF PATTERNED WAFERS

Evaluation of openings in a dielectric layer

High throughput measurement of via defects in interconnects