Edita Tejnil

Person

San Carlos, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Pattern optical similarity determination
- Patent number 9,798,226
- Issue date Oct 24, 2017
- Mentor Graphics Corporation
- Edita Tejnil
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern optical similarity determination
- Patent number 9,459,523
- Issue date Oct 4, 2016
- Mentor Graphics Corporation
- Edita Tejnil
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method, program product and apparatus for creating optimal test pat...
- Patent number 8,792,147
- Issue date Jul 29, 2014
- ASML Netherlands B.V.
- Edita Tejnil
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Method, program product and apparatus for modeling resist developme...
- Patent number 8,521,481
- Issue date Aug 27, 2013
- ASML Masktools B.V.
- Edita Tejnil
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for etching devices used in lithography
- Patent number 7,732,106
- Issue date Jun 8, 2010
- Intel Corporation
- Edita Tejnil
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imaging and devices in lithography
- Patent number 7,438,997
- Issue date Oct 21, 2008
- Intel Corporation
- Edita Tejnil
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of performing multiple stage model calibration for optical i...
- Patent number 7,433,791
- Issue date Oct 7, 2008
- ASML Masktools B.V.
- Sangbong Park
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for correcting focus-dependent line shifts in printing with...
- Patent number 7,326,501
- Issue date Feb 5, 2008
- Intel Corporation
- Edita Tejnil
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Image focus monitor for alternating phase shift masks
- Patent number 7,033,708
- Issue date Apr 25, 2006
- Intel Corporation
- Edita Tejnil
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet radiation imaging
- Patent number 6,972,419
- Issue date Dec 6, 2005
- Intel Corporation
- Edita Tejnil
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Method of generating optical assist features for two-mask exposure...
- Patent number 6,800,406
- Issue date Oct 5, 2004
- Intel Corporation
- Edita Tejnil
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method to inspect patterns with high resolution photoemission
- Patent number 6,774,990
- Issue date Aug 10, 2004
- Intel Corporation
- Ted Liang
- G01 - MEASURING TESTING
Information Patent Grant
Optical assist feature for two-mask exposure lithography
- Patent number 6,632,576
- Issue date Oct 14, 2003
- Intel Corporation
- Edita Tejnil
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for physical image based inspection system
- Patent number 6,625,800
- Issue date Sep 23, 2003
- Intel Corporation
- Qi-De Qian
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for a reflective mask that is inspected at a f...
- Patent number 6,506,526
- Issue date Jan 14, 2003
- Intel Corporation
- Alan R. Stivers
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Method and apparatus for a reflective mask that is inspected at a f...
- Patent number 6,410,193
- Issue date Jun 25, 2002
- Intel Corporation
- Alan R. Stivers
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Phase-shifting point diffraction interferometer grating designs
- Patent number 6,195,169
- Issue date Feb 27, 2001
- The Regents of the University of California
- Patrick Naulleau
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
Pattern Optical Similarity Determination
- Publication number 20160363854
- Publication date Dec 15, 2016
- Mentor Graphics Corporation
- Edita Tejnil
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Pattern Optical Similarity Determination
- Publication number 20150294053
- Publication date Oct 15, 2015
- Mentor Graphics Corporation
- Edita Tejnil
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Optical Lithographic Process Model Calibration
- Publication number 20100082313
- Publication date Apr 1, 2010
- Edita Tejnil
- G01 - MEASURING TESTING
Information Patent Application
IMAGING AND DEVICES IN LITHOGRAPHY
- Publication number 20090042111
- Publication date Feb 12, 2009
- Intel Corporation
- Edita Tejnil
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method, program product and apparatus for creating optimal test pat...
- Publication number 20080068667
- Publication date Mar 20, 2008
- Edita Tejnil
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
Method, program product and apparatus for modeling resist developme...
- Publication number 20080059128
- Publication date Mar 6, 2008
- Edita Tejnil
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of performing multiple stage model calibration for optical i...
- Publication number 20070213967
- Publication date Sep 13, 2007
- Sangbong Park
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Imaging and devices in lithography
- Publication number 20050255388
- Publication date Nov 17, 2005
- Intel Corporation
- Edita Tejnil
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET RADIATION IMAGING
- Publication number 20050243390
- Publication date Nov 3, 2005
- Edita Tejnil
- G01 - MEASURING TESTING
Information Patent Application
Image focus monitor for alternating phase shift masks
- Publication number 20040234869
- Publication date Nov 25, 2004
- Edita Tejnil
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Assembling pellicle frames and photomasks
- Publication number 20040200572
- Publication date Oct 14, 2004
- Edita Tejnil
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Method for correcting focus-dependent line shifts in printing with...
- Publication number 20040180267
- Publication date Sep 16, 2004
- Edita Tejnil
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optical assist feature for two-mask exposure lithography
- Publication number 20040053145
- Publication date Mar 18, 2004
- Edita Tejnil
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method to inspect patterns with high resolution photoemission
- Publication number 20040036862
- Publication date Feb 26, 2004
- Ted Liang
- G01 - MEASURING TESTING
Information Patent Application
Optical assist feature for two-mask exposure lithography
- Publication number 20020086218
- Publication date Jul 4, 2002
- Edita Tejnil
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and apparatus for a reflective mask that is inspected at a f...
- Publication number 20010051304
- Publication date Dec 13, 2001
- Alan R. Stivers
- B82 - NANO-TECHNOLOGY

Edita Tejnil

Person

Patents Grantslast 30 patents

Pattern optical similarity determination

Pattern optical similarity determination

Method, program product and apparatus for creating optimal test pat...

Method, program product and apparatus for modeling resist developme...

Methods for etching devices used in lithography

Imaging and devices in lithography

Method of performing multiple stage model calibration for optical i...

Method for correcting focus-dependent line shifts in printing with...

Image focus monitor for alternating phase shift masks

Extreme ultraviolet radiation imaging

Method of generating optical assist features for two-mask exposure...

Method to inspect patterns with high resolution photoemission

Optical assist feature for two-mask exposure lithography

Method and apparatus for physical image based inspection system

Method and apparatus for a reflective mask that is inspected at a f...

Method and apparatus for a reflective mask that is inspected at a f...

Phase-shifting point diffraction interferometer grating designs

Patents Applicationslast 30 patents

Pattern Optical Similarity Determination

Pattern Optical Similarity Determination

Optical Lithographic Process Model Calibration

IMAGING AND DEVICES IN LITHOGRAPHY

Method, program product and apparatus for creating optimal test pat...

Method, program product and apparatus for modeling resist developme...

Method of performing multiple stage model calibration for optical i...

Imaging and devices in lithography

EXTREME ULTRAVIOLET RADIATION IMAGING

Image focus monitor for alternating phase shift masks

Assembling pellicle frames and photomasks

Method for correcting focus-dependent line shifts in printing with...

Optical assist feature for two-mask exposure lithography

Method to inspect patterns with high resolution photoemission

Optical assist feature for two-mask exposure lithography

Method and apparatus for a reflective mask that is inspected at a f...