Edo Maria HULSEBOS

Person

's-Hertogenbosch, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Alignment method and associated alignment and lithographic apparatuses
- Patent number 12,032,305
- Issue date Jul 9, 2024
- ASML Netherlands B.V.
- Edo Maria Hulsebos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Determining a correction to a process
- Patent number 11,994,845
- Issue date May 28, 2024
- ASML Netherlands B.V.
- Sarathi Roy
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Measurement apparatus and a method for determining a substrate grid
- Patent number 11,966,166
- Issue date Apr 23, 2024
- ASML Netherlands B.V.
- Franciscus Godefridus Casper Bijnen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Alignment method and associated alignment and lithographic apparatuses
- Patent number 11,927,892
- Issue date Mar 12, 2024
- ASML Netherlands B.V.
- Franciscus Godefridus Casper Bijnen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining deformation
- Patent number 11,181,836
- Issue date Nov 23, 2021
- ASML Netherlands B.V.
- Edo Maria Hulsebos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Determining a correction to a process
- Patent number 11,086,305
- Issue date Aug 10, 2021
- ASML Netherlands B.V.
- Sarathi Roy
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Measurement apparatus and a method for determining a substrate grid
- Patent number 11,079,684
- Issue date Aug 3, 2021
- ASML Netherlands B.V.
- Franciscus Godefridus Casper Bijnen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Lithographic method
- Patent number 11,029,610
- Issue date Jun 8, 2021
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic method
- Patent number 10,962,887
- Issue date Mar 30, 2021
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of controlling a lithographic apparatus and device manufactu...
- Patent number 10,901,326
- Issue date Jan 26, 2021
- ASML Netherlands B.V.
- Edo Maria Hulsebos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of controlling a lithographic apparatus and device manufactu...
- Patent number 10,620,549
- Issue date Apr 14, 2020
- ASML Netherlands B.V.
- Edo Maria Hulsebos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic method
- Patent number 10,527,958
- Issue date Jan 7, 2020
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for processing a substrate in a lithographic a...
- Patent number 10,527,957
- Issue date Jan 7, 2020
- ASML Netherlands B.V.
- Cayetano Sanchez-Fabres Cobaleda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment method
- Patent number 10,514,620
- Issue date Dec 24, 2019
- ASML Holding N.V.
- Franciscus Godefridus Casper Bijnen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 10,474,045
- Issue date Nov 12, 2019
- ASML Netherlands B.V.
- Franciscus Godefridus Casper Bijnen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of controlling a lithographic apparatus and device manufactu...
- Patent number 10,331,040
- Issue date Jun 25, 2019
- ASML Netherlands B.V.
- Edo Maria Hulsebos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 10,139,740
- Issue date Nov 27, 2018
- ASML Netherlands B.V.
- Franciscus Godefridus Casper Bijnen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 9,665,012
- Issue date May 30, 2017
- ASML Netherlands B.V.
- Edo Maria Hulsebos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment system and alignment marks for use therewith
- Patent number 8,208,139
- Issue date Jun 26, 2012
- ASML Netherlands B.V.
- Edo Maria Hulsebos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment system and alignment marks for use therewith
- Patent number 8,208,140
- Issue date Jun 26, 2012
- ASML Netherlands B.V.
- Edo Maria Hulsebos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
DETERMINING A CORRECTION TO A PROCESS
- Publication number 20240345569
- Publication date Oct 17, 2024
- ASML NETHERLANDS B.V.
- Sarathi ROY
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
A METHOD FOR MODELING MEASUREMENT DATA OVER A SUBSTRATE AREA AND AS...
- Publication number 20230221655
- Publication date Jul 13, 2023
- ASML NETHERLANDS B.V.
- Edo Maria HULSEBOS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ALIGNMENT METHOD AND ASSOCIATED ALIGNMENT AND LITHOGRAPHIC APPARATUSES
- Publication number 20230168595
- Publication date Jun 1, 2023
- ASML NETHERLANDS B.V.
- Edo Maria HULSEBOS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ALIGNMENT METHOD AND ASSOCIATED ALIGNMENT AND LITHOGRAPHIC APPARATUSES
- Publication number 20230004097
- Publication date Jan 5, 2023
- ASML NETHERLANDS B.V.
- Franciscus Godefridus Casper BIJNEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEASUREMENT APPARATUS AND A METHOD FOR DETERMINING A SUBSTRATE GRID
- Publication number 20210341846
- Publication date Nov 4, 2021
- ASML NETHERLANDS B.V.
- Franciscus Godefridus Casper BIJNEN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DETERMINING A CORRECTION TO A PROCESS
- Publication number 20210333785
- Publication date Oct 28, 2021
- ASML NETHERLANDS B.V.
- Sarathi ROY
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DETERMINING A CORRECTION TO A PROCESS
- Publication number 20210165399
- Publication date Jun 3, 2021
- ASML NETHERLANDS B.V.
- Sarathi ROY
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR DETERMINING DEFORMATION
- Publication number 20210149316
- Publication date May 20, 2021
- ASML NETHERLANDS B.V.
- Edo Maria HULSEBOS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC METHOD
- Publication number 20200272061
- Publication date Aug 27, 2020
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF CONTROLLING A LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTU...
- Publication number 20200201194
- Publication date Jun 25, 2020
- ASML NETHERLANDS B.V.
- Edo Maria Hulsebos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC METHOD
- Publication number 20200081356
- Publication date Mar 12, 2020
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF CONTROLLING A LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTU...
- Publication number 20190265598
- Publication date Aug 29, 2019
- ASML NETHERLANDS B.V.
- Edo Maria HULSEBOS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEASUREMENT APPARATUS AND A METHOD FOR DETERMINING A SUBSTRATE GRID
- Publication number 20190235391
- Publication date Aug 1, 2019
- ASML NETHERLANDS B.V.
- Franciscus Godefridus Casper BIJNEN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ALIGNMENT METHOD
- Publication number 20190227446
- Publication date Jul 25, 2019
- ASML NETHERLANDS B.V.
- Franciscus Godefridus Casper BIJNEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC METHOD
- Publication number 20190094721
- Publication date Mar 28, 2019
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR PROCESSING A SUBSTRATE IN A LITHOGRAPHIC A...
- Publication number 20180356742
- Publication date Dec 13, 2018
- ASML NETHERLANDS B.V.
- Cayetano SANCHEZ-FABRES COBALEDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF CONTROLLING A LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTU...
- Publication number 20180284621
- Publication date Oct 4, 2018
- ASML NETHERLANDS B.V.
- Edo Maria HULSEBOS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20180196363
- Publication date Jul 12, 2018
- ASML NETHERLANDS B.V.
- Franciscus Godefridus Casper BIJNEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20150241791
- Publication date Aug 27, 2015
- ASML NETHERLANDS B.V.
- Edo Maria Hulsebos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Alignment System and Alignment Marks for Use Therewith
- Publication number 20100214550
- Publication date Aug 26, 2010
- ASML NETHERLANDS B.V.
- Edo Maria HULSEBOS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Alignment System and Alignment Marks for Use Therewith
- Publication number 20090176167
- Publication date Jul 9, 2009
- ASML NETHERLANDS B.V.
- Edo Maria HULSEBOS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Edo Maria HULSEBOS

Person

Patents Grantslast 30 patents

Alignment method and associated alignment and lithographic apparatuses

Determining a correction to a process

Measurement apparatus and a method for determining a substrate grid

Alignment method and associated alignment and lithographic apparatuses

Method for determining deformation

Determining a correction to a process

Measurement apparatus and a method for determining a substrate grid

Lithographic method

Lithographic method

Method of controlling a lithographic apparatus and device manufactu...

Method of controlling a lithographic apparatus and device manufactu...

Lithographic method

Method and apparatus for processing a substrate in a lithographic a...

Alignment method

Lithographic apparatus and device manufacturing method

Method of controlling a lithographic apparatus and device manufactu...

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Alignment system and alignment marks for use therewith

Alignment system and alignment marks for use therewith

Patents Applicationslast 30 patents

DETERMINING A CORRECTION TO A PROCESS

A METHOD FOR MODELING MEASUREMENT DATA OVER A SUBSTRATE AREA AND AS...

ALIGNMENT METHOD AND ASSOCIATED ALIGNMENT AND LITHOGRAPHIC APPARATUSES

ALIGNMENT METHOD AND ASSOCIATED ALIGNMENT AND LITHOGRAPHIC APPARATUSES

MEASUREMENT APPARATUS AND A METHOD FOR DETERMINING A SUBSTRATE GRID

DETERMINING A CORRECTION TO A PROCESS

DETERMINING A CORRECTION TO A PROCESS

METHOD FOR DETERMINING DEFORMATION

LITHOGRAPHIC METHOD

METHOD OF CONTROLLING A LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTU...

LITHOGRAPHIC METHOD

METHOD OF CONTROLLING A LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTU...

MEASUREMENT APPARATUS AND A METHOD FOR DETERMINING A SUBSTRATE GRID

ALIGNMENT METHOD

LITHOGRAPHIC METHOD

METHOD AND APPARATUS FOR PROCESSING A SUBSTRATE IN A LITHOGRAPHIC A...

METHOD OF CONTROLLING A LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTU...

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

Alignment System and Alignment Marks for Use Therewith

Alignment System and Alignment Marks for Use Therewith