Edward C. Eisner

Person

Lexington, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Scanning magnet design with enhanced efficiency
- Patent number 11,114,270
- Issue date Sep 7, 2021
- Axcelis Technologies, Inc.
- Bo Vanderberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scan and corrector magnet designs for high throughput scanned beam...
- Patent number 11,037,754
- Issue date Jun 15, 2021
- Axcelis Technologies, Inc.
- Edward Eisner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tetrode extraction apparatus for ion source
- Patent number 10,573,485
- Issue date Feb 25, 2020
- Axcelis Technologies, Inc.
- Wilhelm Platow
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scan and corrector magnet designs for high throughput scanned beam...
- Patent number 10,553,392
- Issue date Feb 4, 2020
- Axcelis Technologies, Inc.
- Edward Eisner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam profiling speed enhancement for scanned beam implanters
- Patent number 10,483,086
- Issue date Nov 19, 2019
- Axcelis Technologies, Inc.
- Andy M. Ray
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation system having beam angle control in drift and dece...
- Patent number 10,037,877
- Issue date Jul 31, 2018
- Axcelis Technologies, Inc.
- Bo H. Vanderberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Combined electrostatic lens system for ion implantation
- Patent number 9,679,739
- Issue date Jun 13, 2017
- Axcelis Technologies, Inc.
- Edward C. Eisner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Combined multipole magnet and dipole scanning magnet
- Patent number 9,620,327
- Issue date Apr 11, 2017
- Axcelis Technologies, Inc.
- Edward C. Eisner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam line design to reduce energy contamination
- Patent number 8,963,107
- Issue date Feb 24, 2015
- Axcelis Technologies, Inc.
- Edward C. Eisner
- G01 - MEASURING TESTING
Information Patent Grant
Methods for beam current modulation by ion source parameter modulation
- Patent number 8,803,110
- Issue date Aug 12, 2014
- Axcelis Technologies, Inc.
- Michael A. Graf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for improved uniformity control with dynamic b...
- Patent number 8,653,486
- Issue date Feb 18, 2014
- Axcelis Technologies, Inc.
- Edward C. Eisner
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
System and method for ion implantation with improved productivity a...
- Patent number 8,637,838
- Issue date Jan 28, 2014
- Axcelis Technologies, Inc.
- Edward C. Eisner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for improved uniformity control with dynamic b...
- Patent number 8,421,039
- Issue date Apr 16, 2013
- Axcelis Technologies, Inc.
- Edward C. Eisner
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Uniformity of a scanned ion beam
- Patent number 8,378,313
- Issue date Feb 19, 2013
- Axcelis Technologies, Inc.
- Edward C. Eisner
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Ion beam angle calibration and emittance measurement system for rib...
- Patent number 8,168,941
- Issue date May 1, 2012
- Axcelis Technologies, Inc.
- Marvin Farley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion source with adjustable aperture
- Patent number 8,089,052
- Issue date Jan 3, 2012
- Axcelis Technologies, Inc.
- Daniel Tieger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation with diminished scanning field effects
- Patent number 8,008,636
- Issue date Aug 30, 2011
- Axcelis Technologies, Inc.
- Edward C. Eisner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method of controlling broad beam uniformity
- Patent number 7,858,955
- Issue date Dec 28, 2010
- Axcelis Technologies, Inc.
- Shu Satoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System for magnetic scanning and correction of an ion beam
- Patent number 7,615,763
- Issue date Nov 10, 2009
- Axcelis Technologies, Inc.
- Bo H. Vanderberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for rapidly switching off an ion beam
- Patent number 7,589,333
- Issue date Sep 15, 2009
- Axcelis Technologies, Inc.
- Michael A. Graf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Throughput enhancement for scanned beam ion implanters
- Patent number 7,566,886
- Issue date Jul 28, 2009
- Axcelis Technologies, Inc.
- Edward C. Eisner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam scanning control methods and systems for ion implantation...
- Patent number 7,550,751
- Issue date Jun 23, 2009
- Axcelis Technologies, Inc.
- Victor M. Benveniste
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Ion implanter with ionization chamber electrode design
- Patent number 7,453,074
- Issue date Nov 18, 2008
- Axcelis Technologies, Inc.
- Edward C. Eisner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for beam angle adjustment in ion implanters
- Patent number 7,399,980
- Issue date Jul 15, 2008
- Axcelis Technologies. Inc.
- Bo H. Vanderberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for beam angle adjustment in ion implanters
- Patent number 7,227,160
- Issue date Jun 5, 2007
- Axcelis Technologies, Inc.
- Bo H. Vanderberg
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
MAGNETIC FOCUSING DEVICE LOW ENERGY ION BEAMS
- Publication number 20250046563
- Publication date Feb 6, 2025
- Axcelis Technologies, Inc.
- Wilhelm Peter Platow
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SCAN AND CORRECTOR MAGNET DESIGNS FOR HIGH THROUGHPUT SCANNED BEAM...
- Publication number 20200194221
- Publication date Jun 18, 2020
- Axcelis Technologies, Inc.
- Edward Eisner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SCANNING MAGNET DESIGN WITH ENHANCED EFFICIENCY
- Publication number 20200066478
- Publication date Feb 27, 2020
- Axcelis Technologies, Inc.
- Bo Vanderberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Combined Electrostatic Lens System for Ion Implantation
- Publication number 20160189912
- Publication date Jun 30, 2016
- Axcelis Technologies, Inc.
- Edward C. Eisner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Combined Multipole Magnet and Dipole Scanning Magnet
- Publication number 20160189913
- Publication date Jun 30, 2016
- Axcelis Technologies, Inc.
- Edward C. Eisner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Beam Profiling Speed Enhancement for Scanned Beam Implanters
- Publication number 20160189926
- Publication date Jun 30, 2016
- Axcelis Technologies, Inc.
- Andy M. Ray
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR BEAM ANGLE ADJUSTMENT IN ION IMPLANTERS WIT...
- Publication number 20160189917
- Publication date Jun 30, 2016
- Axcelis Technologies, Inc.
- Bo H. Vanderberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BEAM LINE DESIGN TO REDUCE ENERGY CONTAMINATION
- Publication number 20130181139
- Publication date Jul 18, 2013
- Axcelis Technologies, Inc.
- Edward C. EISNER
- G01 - MEASURING TESTING
Information Patent Application
SYSTEM AND METHOD FOR ION IMPLANTATION WITH IMPROVED PRODUCTIVITY A...
- Publication number 20130146760
- Publication date Jun 13, 2013
- Axcelis Technologies, Inc.
- Edward C. Eisner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR IMPROVED UNIFORMITY CONTROL WITH DYNAMIC B...
- Publication number 20130099131
- Publication date Apr 25, 2013
- Axcelis Technologies, Inc.
- Edward C. Eisner
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
Uniformity of a Scanned Ion Beam
- Publication number 20120248326
- Publication date Oct 4, 2012
- Axcelis Technologies, Inc.
- Edward C. Eisner
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
Method and Apparatus for Improved Uniformity Control with Dynamic B...
- Publication number 20120248324
- Publication date Oct 4, 2012
- Axcelis Technologies, Inc.
- Edward C. Eisner
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
Throughput Enhancement for Scanned Beam Ion Implanters
- Publication number 20110272567
- Publication date Nov 10, 2011
- Axcelis Technologies, Inc.
- Edward C. Eisner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM ANGLE CALIBRATION AND EMITTANCE MEASUREMENT SYSTEM FOR RIB...
- Publication number 20100181470
- Publication date Jul 22, 2010
- Axcelis Technologies, Inc.
- Marvin Farley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTATION WITH DIMINISHED SCANNING FIELD EFFECTS
- Publication number 20100155623
- Publication date Jun 24, 2010
- Axcelis Technologies, Inc.
- Edward C. Eisner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADJUSTABLE DEFLECTION OPTICS FOR ION IMPLANTATION
- Publication number 20100065761
- Publication date Mar 18, 2010
- Axcelis Technologies, Inc.
- Michael A. Graf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD OF CONTROLLING BROAD BEAM UNIFORMITY
- Publication number 20090321657
- Publication date Dec 31, 2009
- Axcelis Technologies, Inc.
- Shu Satoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION SOURCE WITH ADJUSTABLE APERTURE
- Publication number 20090266997
- Publication date Oct 29, 2009
- Axcelis Technologies, Inc.
- Daniel Tieger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for beam current modulation by ion source parameter modulation
- Publication number 20080078957
- Publication date Apr 3, 2008
- Axcelis Technologies, Inc.
- Michael A. Graf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for rapidly switching off an ion beam
- Publication number 20080078955
- Publication date Apr 3, 2008
- Axcelis Technologies, Inc.
- Michael A. Graf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion beam scanning control methods and systems for ion implantation...
- Publication number 20080067444
- Publication date Mar 20, 2008
- Axcelis Technologies, Inc.
- Victor M. Benveniste
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
System for magnetic scanning and correction of an ion beam
- Publication number 20080067436
- Publication date Mar 20, 2008
- Axcelis Technologies, Inc.
- Bo H. Vanderberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Systems and methods for beam angle adjustment in ion implanters
- Publication number 20080061228
- Publication date Mar 13, 2008
- Bo H. Vanderberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Throughput enhancement for scanned beam ion implanters
- Publication number 20080035862
- Publication date Feb 14, 2008
- Axcelis Technologies, Inc.
- Edward C. Eisner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion implanter with ionization chamber electrode design
- Publication number 20070125965
- Publication date Jun 7, 2007
- Axcelis Technologies, Inc.
- Edward C. Eisner
- H01 - BASIC ELECTRIC ELEMENTS

Edward C. Eisner

Person

Patents Grantslast 30 patents

Scanning magnet design with enhanced efficiency

Scan and corrector magnet designs for high throughput scanned beam...

Tetrode extraction apparatus for ion source

Scan and corrector magnet designs for high throughput scanned beam...

Beam profiling speed enhancement for scanned beam implanters

Ion implantation system having beam angle control in drift and dece...

Combined electrostatic lens system for ion implantation

Combined multipole magnet and dipole scanning magnet

Beam line design to reduce energy contamination

Methods for beam current modulation by ion source parameter modulation

Method and apparatus for improved uniformity control with dynamic b...

System and method for ion implantation with improved productivity a...

Method and apparatus for improved uniformity control with dynamic b...

Uniformity of a scanned ion beam

Ion beam angle calibration and emittance measurement system for rib...

Ion source with adjustable aperture

Ion implantation with diminished scanning field effects

System and method of controlling broad beam uniformity

System for magnetic scanning and correction of an ion beam

Methods for rapidly switching off an ion beam

Throughput enhancement for scanned beam ion implanters

Ion beam scanning control methods and systems for ion implantation...

Ion implanter with ionization chamber electrode design

Systems and methods for beam angle adjustment in ion implanters

Systems and methods for beam angle adjustment in ion implanters

Patents Applicationslast 30 patents

MAGNETIC FOCUSING DEVICE LOW ENERGY ION BEAMS

SCAN AND CORRECTOR MAGNET DESIGNS FOR HIGH THROUGHPUT SCANNED BEAM...

SCANNING MAGNET DESIGN WITH ENHANCED EFFICIENCY

Combined Electrostatic Lens System for Ion Implantation

Combined Multipole Magnet and Dipole Scanning Magnet

Beam Profiling Speed Enhancement for Scanned Beam Implanters

SYSTEMS AND METHODS FOR BEAM ANGLE ADJUSTMENT IN ION IMPLANTERS WIT...

BEAM LINE DESIGN TO REDUCE ENERGY CONTAMINATION

SYSTEM AND METHOD FOR ION IMPLANTATION WITH IMPROVED PRODUCTIVITY A...

METHOD AND APPARATUS FOR IMPROVED UNIFORMITY CONTROL WITH DYNAMIC B...

Uniformity of a Scanned Ion Beam

Method and Apparatus for Improved Uniformity Control with Dynamic B...

Throughput Enhancement for Scanned Beam Ion Implanters

ION BEAM ANGLE CALIBRATION AND EMITTANCE MEASUREMENT SYSTEM FOR RIB...

ION IMPLANTATION WITH DIMINISHED SCANNING FIELD EFFECTS

ADJUSTABLE DEFLECTION OPTICS FOR ION IMPLANTATION

SYSTEM AND METHOD OF CONTROLLING BROAD BEAM UNIFORMITY

ION SOURCE WITH ADJUSTABLE APERTURE

Methods for beam current modulation by ion source parameter modulation

Methods for rapidly switching off an ion beam

Ion beam scanning control methods and systems for ion implantation...

System for magnetic scanning and correction of an ion beam

Systems and methods for beam angle adjustment in ion implanters

Throughput enhancement for scanned beam ion implanters

Ion implanter with ionization chamber electrode design