Edward Gipstein

Person

Saratoga, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Preparation of resist image with methacrylate polymers
- Patent number 4,011,351
- Issue date Mar 8, 1977
- International Business Machines Corporation
- Edward Gipstein
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive polymeric electron beam resists of very great sensitivity
- Patent number 3,996,393
- Issue date Dec 7, 1976
- International Business Machines Corporation
- Charles A. Cortellino
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Use of nitrocellulose containing 10.5 to 12% nitrogen as electron b...
- Patent number 3,985,915
- Issue date Oct 12, 1976
- International Business Machines Corporation
- Edward Gipstein
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resists containing dimethylglutarimide units
- Patent number 3,964,908
- Issue date Jun 22, 1976
- International Business Machines Corporation
- Joachim Bargon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Thermally stable positive polycarbonate electron beam resists
- Patent number 3,961,099
- Issue date Jun 1, 1976
- International Business Machines Corporation
- Edward Gipstein
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electron beam positive resists containing acetate polymers
- Patent number 3,931,435
- Issue date Jan 6, 1976
- International Business Machines Corporation
- Edward Gipstein
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Edward Gipstein

Person

Patents Grantslast 30 patents

Preparation of resist image with methacrylate polymers

Positive polymeric electron beam resists of very great sensitivity

Use of nitrocellulose containing 10.5 to 12% nitrogen as electron b...

Positive resists containing dimethylglutarimide units

Thermally stable positive polycarbonate electron beam resists

Electron beam positive resists containing acetate polymers