Edward K. Pavelchek

Person

Stow, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Coating compositions for use with an overcoated photoresist
- Patent number 8,142,988
- Issue date Mar 27, 2012
- Rohm and Haas Electronic Materials LLC
- Anthony Zampini
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Dyed photoresists and methods and articles of manufacture comprisin...
- Patent number 7,632,630
- Issue date Dec 15, 2009
- Rohm and Haas Electronic Materials LLC
- James Michael Mori
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Dyed photoresists and methods and articles of manufacture comprisin...
- Patent number 7,147,983
- Issue date Dec 12, 2006
- Shipley Company, L.L.C.
- James Michael Mori
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Antireflective coating compositions
- Patent number 7,026,101
- Issue date Apr 11, 2006
- Shipley Company, L.L.C.
- Peter Trefonas, III
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Antireflective hard mask compositions
- Patent number 7,018,717
- Issue date Mar 28, 2006
- Shipley Company, L.L.C.
- Edward K. Pavelchek
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Antireflective hard mask compositions
- Patent number 6,890,448
- Issue date May 10, 2005
- Shipley Company, L.L.C.
- Edward K. Pavelchek
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Antireflective coating compositions
- Patent number 6,887,648
- Issue date May 3, 2005
- Shipley Company, L.L.C.
- Edward K. Pavelchek
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Planarizing antireflective coating compositions
- Patent number 6,855,466
- Issue date Feb 15, 2005
- Shipley Company, L.L.C.
- Edward K. Pavelchek
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Antireflective coating compositions comprising photoacid generators
- Patent number 6,849,373
- Issue date Feb 1, 2005
- Edward K. Pavelchek
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Antireflective coating compositions
- Patent number 6,767,689
- Issue date Jul 27, 2004
- Shipley Company, L.L.C.
- Edward K. Pavelchek
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Aperture fill
- Patent number 6,749,765
- Issue date Jun 15, 2004
- Shipley Company, L.L.C.
- Edward W. Rutter
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
High conformality antireflective coating compositions
- Patent number 6,653,049
- Issue date Nov 25, 2003
- Shipley Company, L.L.C.
- Edward K. Pavelchek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Antireflective coating compositions and exposure methods under 200 nm
- Patent number 6,602,652
- Issue date Aug 5, 2003
- Shipley Company, L.L.C.
- Timothy G. Adams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Aperture fill
- Patent number 6,461,717
- Issue date Oct 8, 2002
- Shipley Company, L.L.C.
- Edward W. Rutter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods utilizing antireflective coating compositions with exposure...
- Patent number 6,410,209
- Issue date Jun 25, 2002
- Shipley Company, L.L.C.
- Timothy G. Adams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Planarizing antireflective coating compositions
- Patent number 6,316,165
- Issue date Nov 13, 2001
- Shipley Company, L.L.C.
- Edward K. Pavelchek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Antireflective coating compositions comprising photoacid generators
- Patent number 6,261,743
- Issue date Jul 17, 2001
- Shipley Company, L.L.C.
- Edward K. Pavelchek
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
High conformality antireflective coating compositions
- Patent number 6,190,839
- Issue date Feb 20, 2001
- Shipley Company, L.L.C.
- Edward K. Pavelchek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Antireflective coating compositions comprising photoacid generators
- Patent number 5,939,236
- Issue date Aug 17, 1999
- Shipley Company, L.L.C.
- Edward K. Pavelchek
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Methods for treating photoresists
- Patent number 5,366,852
- Issue date Nov 22, 1994
- Shipley Company, Inc.
- Edward K. Pavelchek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Dyed photoresists and methods and articles of manufacture comprisin...
- Publication number 20090220888
- Publication date Sep 3, 2009
- Shipley Company, L.L.C.
- James Michael Mori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Coating compositions for use with an overcoated photoresist
- Publication number 20060275696
- Publication date Dec 7, 2006
- Rohm and Haas Electronic Materials L.L.C.
- Anthony Zampini
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Coating compositions for use with an overcoated photoresist
- Publication number 20060228646
- Publication date Oct 12, 2006
- Rohm and Haas Electronic Materials L.L.C.
- Anthony Zampini
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Dyed photoresists and methods and articles of manufacture comprisin...
- Publication number 20060204892
- Publication date Sep 14, 2006
- Shipley
- James Michael Mori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Antireflective coating compositions
- Publication number 20040219453
- Publication date Nov 4, 2004
- Shipley Company, L.L.C.
- Edward K. Pavelchek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Antireflective hard mask compositions
- Publication number 20030209515
- Publication date Nov 13, 2003
- Shipley Company, L.L.C.
- Edward K. Pavelchek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Antireflective coating compositions
- Publication number 20030008237
- Publication date Jan 9, 2003
- Shipley Company, L.L.C.
- Edward K. Pavelchek
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
ANTIREFLECTIVE HARD MASK COMPOSITIONS
- Publication number 20020195419
- Publication date Dec 26, 2002
- EDWARD K. PAVELCHEK
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Antireflective coating compositions
- Publication number 20020172896
- Publication date Nov 21, 2002
- Shipley Company, L.L.C.
- Timothy G. Adams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Aperture fill
- Publication number 20020110665
- Publication date Aug 15, 2002
- Shipley Company, L.L.C.
- Edward W. Rutter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANTIREFLECTIVE COATING COMPOSITIONS
- Publication number 20020102483
- Publication date Aug 1, 2002
- TIMOTHY ADAMS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Antireflective coating compositions
- Publication number 20020031729
- Publication date Mar 14, 2002
- Shipley Company, L.L.C.
- Peter Trefonas
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Planarizing antireflective coating compositions
- Publication number 20020022196
- Publication date Feb 21, 2002
- Shipley Company, L.L.C.
- Edward K. Pavelchek
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Antireflective coating compositions comprising photoacid generators
- Publication number 20020012875
- Publication date Jan 31, 2002
- Shipley Company, L.L.C.
- Edward K. Pavelchek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High conformality antireflective coating compositions
- Publication number 20010012598
- Publication date Aug 9, 2001
- Shipley Company, L.L.C.
- Edward K. Pavelchek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Edward K. Pavelchek

Person

Patents Grantslast 30 patents

Coating compositions for use with an overcoated photoresist

Dyed photoresists and methods and articles of manufacture comprisin...

Dyed photoresists and methods and articles of manufacture comprisin...

Antireflective coating compositions

Antireflective hard mask compositions

Antireflective hard mask compositions

Antireflective coating compositions

Planarizing antireflective coating compositions

Antireflective coating compositions comprising photoacid generators

Antireflective coating compositions

Aperture fill

High conformality antireflective coating compositions

Antireflective coating compositions and exposure methods under 200 nm

Aperture fill

Methods utilizing antireflective coating compositions with exposure...

Planarizing antireflective coating compositions

Antireflective coating compositions comprising photoacid generators

High conformality antireflective coating compositions

Antireflective coating compositions comprising photoacid generators

Methods for treating photoresists

Patents Applicationslast 30 patents

Dyed photoresists and methods and articles of manufacture comprisin...

Coating compositions for use with an overcoated photoresist

Coating compositions for use with an overcoated photoresist

Dyed photoresists and methods and articles of manufacture comprisin...

Antireflective coating compositions

Antireflective hard mask compositions

Antireflective coating compositions

ANTIREFLECTIVE HARD MASK COMPOSITIONS

Antireflective coating compositions

Aperture fill

ANTIREFLECTIVE COATING COMPOSITIONS

Antireflective coating compositions

Planarizing antireflective coating compositions

Antireflective coating compositions comprising photoacid generators

High conformality antireflective coating compositions