Edward L Haywood

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Atomic layer deposition of HfAlC as a metal gate workfunction mater...
- Patent number 9,607,904
- Issue date Mar 28, 2017
- Intermolecular, Inc.
- Albert Sanghyup Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vapor based processing system with purge mode
- Patent number 8,906,160
- Issue date Dec 9, 2014
- Intermolecular, Inc.
- Richard Endo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Yttrium and titanium high-k dielectric films
- Patent number 8,900,418
- Issue date Dec 2, 2014
- Intermolecular, Inc.
- Imran Hashim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Yttrium and titanium high-k dielectric films
- Patent number 8,901,708
- Issue date Dec 2, 2014
- Intermolecular, Inc.
- Imran Hashim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Yttrium and titanium high-K dielectric film
- Patent number 8,900,422
- Issue date Dec 2, 2014
- Intermolecular, Inc.
- Imran Hashim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System and method for step coverage measurement
- Patent number 8,859,301
- Issue date Oct 14, 2014
- Intermolecular, Inc.
- Hanhong Chen
- G01 - MEASURING TESTING
Information Patent Grant
High temperature ALD process of metal oxide for DRAM applications
- Patent number 8,835,273
- Issue date Sep 16, 2014
- Intermolecular, Inc.
- Hanhong Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High temperature ALD process for metal oxide for DRAM applications
- Patent number 8,829,647
- Issue date Sep 9, 2014
- Intermolecular, Inc.
- Hanhong Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for forming high-K crystalline films and related devices
- Patent number 8,809,160
- Issue date Aug 19, 2014
- Intermolecular, Inc.
- Hanhong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Titanium based high-K dielectric films
- Patent number 8,737,036
- Issue date May 27, 2014
- Intermolecular, Inc.
- Hanhong Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Integration of non-noble DRAM electrode
- Patent number 8,652,927
- Issue date Feb 18, 2014
- Intermolecular, Inc.
- Sandra Malhotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhanced non-noble electrode layers for DRAM capacitor cell
- Patent number 8,647,943
- Issue date Feb 11, 2014
- Intermolecular, Inc.
- Hanhong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhanced non-noble electrode layers for DRAM capacitor cell
- Patent number 8,581,318
- Issue date Nov 12, 2013
- Intermolecular, Inc.
- Hanhong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for depositing high-K dielectrics
- Patent number 8,574,985
- Issue date Nov 5, 2013
- Intermolecular, Inc.
- Xiangxin Rui
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming an ALD material
- Patent number 8,563,392
- Issue date Oct 22, 2013
- Intermolecular, Inc.
- Sandra Malhotra
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Titanium-based high-K dielectric films
- Patent number 8,551,851
- Issue date Oct 8, 2013
- Intermolecular, Inc.
- Hanhong Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for depositing high-K dielectrics
- Patent number 8,541,828
- Issue date Sep 24, 2013
- Intermolecular, Inc.
- Imran Hashim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Integration of non-noble DRAM electrode
- Patent number 8,530,348
- Issue date Sep 10, 2013
- Intermolecular, Inc.
- Sandra G. Malhotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming stacked metal oxide layers
- Patent number 8,530,322
- Issue date Sep 10, 2013
- Intermolecular, Inc.
- Hanhong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for step coverage measurement
- Patent number 8,486,727
- Issue date Jul 16, 2013
- Intermolecular, Inc.
- Hanhong Chen
- G01 - MEASURING TESTING
Information Patent Grant
Yttrium and titanium high-k dielectric films
- Patent number 8,278,735
- Issue date Oct 2, 2012
- Intermolecular, Inc.
- Imran Hashim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Titanium-based high-K dielectric films
- Patent number 7,968,452
- Issue date Jun 28, 2011
- Intermolecular, Inc.
- Hanhong Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for depositing high-K dielectrics
- Patent number 7,927,947
- Issue date Apr 19, 2011
- Intermolecular, Inc.
- Xiangxin Rui
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Atomic Layer Deposition of HfAlC as a Metal Gate Workfunction Mater...
- Publication number 20160035631
- Publication date Feb 4, 2016
- GLOBALFOUNDRIES, Inc.
- Albert Sanghyup Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate Carrier
- Publication number 20140166840
- Publication date Jun 19, 2014
- Intermolecular, Inc.
- Wayne R. French
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High Temperature ALD Process of Metal Oxide for DRAM Applications
- Publication number 20140080284
- Publication date Mar 20, 2014
- Elpida Memory, Inc.
- Hanhong Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
High Temperature ALD Process for Metal Oxide for DRAM Applications
- Publication number 20140077337
- Publication date Mar 20, 2014
- Intermolecular, Inc.
- Hanhong Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ENHANCED NON-NOBLE ELECTRODE LAYERS FOR DRAM CAPACITOR CELL
- Publication number 20130330902
- Publication date Dec 12, 2013
- Elpida Memory, Inc.
- Hanhong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Integration of Non-Noble DRAM Electrode
- Publication number 20130320495
- Publication date Dec 5, 2013
- Intermolecular, Inc.
- Sandra G. Malhotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and Method for Step Coverage Measurement
- Publication number 20130272496
- Publication date Oct 17, 2013
- Hanhong Chen
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF FORMING AN ALD MATERIAL
- Publication number 20130143383
- Publication date Jun 6, 2013
- Elpida Memory, Inc.
- Sandra Malhotra
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Yttrium and Titanium High-K Dielectric Films
- Publication number 20130069201
- Publication date Mar 21, 2013
- Intermolecular, Inc.
- Imran Hashim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Electrode Treatments for Enhanced DRAM Performance
- Publication number 20130071991
- Publication date Mar 21, 2013
- Elpida Memory, Inc.
- Xiangxin Rui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electrode Treatments for Enhanced DRAM Performance
- Publication number 20130069202
- Publication date Mar 21, 2013
- Elpida Memory, Inc.
- Xiangxin Rui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Yttrium and Titanium High-K Dielectric Films
- Publication number 20130071990
- Publication date Mar 21, 2013
- Intermolecular, Inc.
- Imran Hashim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods For Depositing High-K Dielectrics
- Publication number 20130056852
- Publication date Mar 7, 2013
- Intermolecular, Inc.
- Imran Hashim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Titanium-Based High-K Dielectric Films
- Publication number 20130044404
- Publication date Feb 21, 2013
- Intermolecular, Inc.
- Hanhong Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ELECTRODE TREATMENTS FOR ENHANCED DRAM PERFORMANCE
- Publication number 20120235276
- Publication date Sep 20, 2012
- Intermolecular, Inc.
- Xiangxin Rui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Vapor Based Processing System with Purge Mode
- Publication number 20120160173
- Publication date Jun 28, 2012
- Richard Endo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR FORMING HIGH-K CRYSTALLINE FILMS AND RELATED DEVICES
- Publication number 20120156889
- Publication date Jun 21, 2012
- Intermolecular, Inc.
- Hanhong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING STACKED METAL OXIDE LAYERS
- Publication number 20120156854
- Publication date Jun 21, 2012
- Hanhong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS SEQUENCING FOR HPC ALD SYSTEM
- Publication number 20120149209
- Publication date Jun 14, 2012
- Ed Haywood
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
System and Method for Step Coverage Measurement
- Publication number 20120123744
- Publication date May 17, 2012
- Hanhong Chen
- G01 - MEASURING TESTING
Information Patent Application
Yttrium and Titanium High-K Dielectric Films
- Publication number 20120061799
- Publication date Mar 15, 2012
- Imran Hashim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TITANIUM-BASED HIGH-K DIELECTRIC FILMS
- Publication number 20110203085
- Publication date Aug 25, 2011
- Intermolecular, Inc.
- Hanhong Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR DEPOSITING HIGH-K DIELECTRICS
- Publication number 20110151136
- Publication date Jun 23, 2011
- Xiangxin Rui
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Yttrium and Titanium High-K Dielectric Film
- Publication number 20110014359
- Publication date Jan 20, 2011
- Imran Hashim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Titanium-Based High-K Dielectric Films
- Publication number 20100330269
- Publication date Dec 30, 2010
- Hanhong Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR DEPOSITING HIGH-K DIELECTRICS
- Publication number 20100330772
- Publication date Dec 30, 2010
- Xiangxin Rui
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Edward L Haywood

Person

Patents Grantslast 30 patents

Atomic layer deposition of HfAlC as a metal gate workfunction mater...

Vapor based processing system with purge mode

Yttrium and titanium high-k dielectric films

Yttrium and titanium high-k dielectric films

Yttrium and titanium high-K dielectric film

System and method for step coverage measurement

High temperature ALD process of metal oxide for DRAM applications

High temperature ALD process for metal oxide for DRAM applications

Methods for forming high-K crystalline films and related devices

Titanium based high-K dielectric films

Integration of non-noble DRAM electrode

Enhanced non-noble electrode layers for DRAM capacitor cell

Enhanced non-noble electrode layers for DRAM capacitor cell

Methods for depositing high-K dielectrics

Method of forming an ALD material

Titanium-based high-K dielectric films

Methods for depositing high-K dielectrics

Integration of non-noble DRAM electrode

Method of forming stacked metal oxide layers

System and method for step coverage measurement

Yttrium and titanium high-k dielectric films

Titanium-based high-K dielectric films

Methods for depositing high-K dielectrics

Patents Applicationslast 30 patents

Atomic Layer Deposition of HfAlC as a Metal Gate Workfunction Mater...

Substrate Carrier

High Temperature ALD Process of Metal Oxide for DRAM Applications

High Temperature ALD Process for Metal Oxide for DRAM Applications

ENHANCED NON-NOBLE ELECTRODE LAYERS FOR DRAM CAPACITOR CELL

Integration of Non-Noble DRAM Electrode

System and Method for Step Coverage Measurement

METHOD OF FORMING AN ALD MATERIAL

Yttrium and Titanium High-K Dielectric Films

Electrode Treatments for Enhanced DRAM Performance

Electrode Treatments for Enhanced DRAM Performance

Yttrium and Titanium High-K Dielectric Films

Methods For Depositing High-K Dielectrics

Titanium-Based High-K Dielectric Films

ELECTRODE TREATMENTS FOR ENHANCED DRAM PERFORMANCE

Vapor Based Processing System with Purge Mode

METHODS FOR FORMING HIGH-K CRYSTALLINE FILMS AND RELATED DEVICES

METHOD OF FORMING STACKED METAL OXIDE LAYERS

PROCESS SEQUENCING FOR HPC ALD SYSTEM

System and Method for Step Coverage Measurement

Yttrium and Titanium High-K Dielectric Films

TITANIUM-BASED HIGH-K DIELECTRIC FILMS

METHODS FOR DEPOSITING HIGH-K DIELECTRICS

Yttrium and Titanium High-K Dielectric Film

Titanium-Based High-K Dielectric Films

METHODS FOR DEPOSITING HIGH-K DIELECTRICS