Edward P. Hammond IV

Person

Hillsborough, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Magnetically coupled RF filter for substrate processing chambers
- Patent number 12,198,908
- Issue date Jan 14, 2025
- Applied Materials, Inc.
- Edward P. Hammond
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma-enhanced chemical vapor deposition of carbon hard-mask
- Patent number 12,136,549
- Issue date Nov 5, 2024
- Applied Materials, Inc.
- Byung Seok Kwon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrostatic chuck with multiple radio frequency meshes to control...
- Patent number 12,136,536
- Issue date Nov 5, 2024
- Applied Materials, Inc.
- Edward P. Hammond
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Bipolar esc with balanced RF impedance
- Patent number 12,094,748
- Issue date Sep 17, 2024
- Applied Materials, Inc.
- Jian Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device and method for tuning plasma distribution using phase control
- Patent number 11,908,662
- Issue date Feb 20, 2024
- Applied Materials, Inc.
- Xiaopu Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Power supply signal conditioning for an electrostatic chuck
- Patent number 11,776,835
- Issue date Oct 3, 2023
- Applied Materials, Inc.
- Zheng John Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support assemblies and components
- Patent number 11,699,602
- Issue date Jul 11, 2023
- Applied Materials, Inc.
- Jian Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF power delivery architecture with switchable match and frequency...
- Patent number 11,626,853
- Issue date Apr 11, 2023
- Applied Materials, Inc.
- Edward P. Hammond
- G05 - CONTROLLING REGULATING
Information Patent Grant
RF grounding configuration for pedestals
- Patent number 11,569,072
- Issue date Jan 31, 2023
- Applied Materials, Inc.
- Satya Thokachichu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma parameters and skew characterization by high speed imaging
- Patent number 11,545,376
- Issue date Jan 3, 2023
- Applied Materials, Inc.
- Sidharth Bhatia
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Ground path systems for providing a shorter and symmetrical ground...
- Patent number 11,434,569
- Issue date Sep 6, 2022
- Applied Materials, Inc.
- Tuan Anh Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Push-pull power supply for multi-mesh processing chambers
- Patent number 11,361,940
- Issue date Jun 14, 2022
- Applied Materials, Inc.
- Edward P. Hammond
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selective deposition of hardmask
- Patent number 10,923,334
- Issue date Feb 16, 2021
- Applied Materials, Inc.
- Satya Thokachichu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma parameters and skew characterization by high speed imaging
- Patent number 10,748,797
- Issue date Aug 18, 2020
- Applied Materials, Inc.
- Sidharth Bhatia
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Dual-feed tunable plasma source
- Patent number 10,395,893
- Issue date Aug 27, 2019
- Applied Materials, Inc.
- Edward P. Hammond
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dual radio-frequency tuner for process control of a plasma process
- Patent number 10,109,462
- Issue date Oct 23, 2018
- Applied Materials, Inc.
- Edward P. Hammond
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Anti-arc zero field plate
- Patent number 9,850,576
- Issue date Dec 26, 2017
- Applied Materials, Inc.
- Jonghoon Baek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electromagnet array in a sputter reactor
- Patent number 8,871,064
- Issue date Oct 28, 2014
- Applied Materials, Inc.
- Tza-Jing Gung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION OF CARBON HARD-MASK
- Publication number 20250022709
- Publication date Jan 16, 2025
- Applied Materials, Inc.
- Byung Seok KWON
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
BIPOLAR ELECTROSTATIC CHUCK ELECTRODE DESIGNS
- Publication number 20240249924
- Publication date Jul 25, 2024
- Applied Materials, Inc.
- Jian Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ELECTROSTATIC CHUCK WITH MULTIPLE RADIO FREQUENCY MESHES TO CONTROL...
- Publication number 20240222081
- Publication date Jul 4, 2024
- Applied Materials, Inc.
- Edward P. HAMMOND
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FARADAY FACEPLATE
- Publication number 20240145252
- Publication date May 2, 2024
- Applied Materials, Inc.
- Rutvij Naik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF GROUNDING CONFIGURATION FOR PEDESTALS
- Publication number 20230170190
- Publication date Jun 1, 2023
- Applied Materials, Inc.
- Satya THOKACHICHU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
BIPOLAR ESC WITH BALANCED RF IMPEDANCE
- Publication number 20230054444
- Publication date Feb 23, 2023
- Applied Materials, Inc.
- Jian Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-ZONE HEATER WITH MINIMUM RF LOSS
- Publication number 20230011261
- Publication date Jan 12, 2023
- Applied Materials, Inc.
- Jian Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GROUND PATH SYSTEMS FOR PROVIDING A SHORTER AND SYMMETRICAL GROUND...
- Publication number 20220403520
- Publication date Dec 22, 2022
- Applied Materials, Inc.
- Tuan Anh NGUYEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MAGNETICALLY COUPLED RF FILTER FOR SUBSTRATE PROCESSING CHAMBERS
- Publication number 20220364233
- Publication date Nov 17, 2022
- Applied Materials, Inc.
- Edward P. Hammond
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RF POWER DELIVERY ARCHITECTURE WITH SWITCHABLE MATCH AND FREQUENCY...
- Publication number 20220255525
- Publication date Aug 11, 2022
- Applied Materials, Inc.
- Edward P. HAMMOND
- G05 - CONTROLLING REGULATING
Information Patent Application
PUSH-PULL POWER SUPPLY FOR MULTI-MESH PROCESSING CHAMBERS
- Publication number 20220115206
- Publication date Apr 14, 2022
- Applied Materials, Inc.
- Edward P. Hammond
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
POWER SUPPLY SIGNAL CONDITIONING FOR AN ELECTROSTATIC CHUCK
- Publication number 20220102179
- Publication date Mar 31, 2022
- Applied Materials, Inc.
- Zheng John Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT ASSEMBLIES AND COMPONENTS
- Publication number 20220013373
- Publication date Jan 13, 2022
- Applied Materials, Inc.
- Jian Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT PEDESTAL HAVING PLASMA CONFINEMENT FEATURES
- Publication number 20210296144
- Publication date Sep 23, 2021
- Applied Materials, Inc.
- Xing LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK WITH MULTIPLE RADIO FREQUENCY MESHES TO CONTROL...
- Publication number 20210166915
- Publication date Jun 3, 2021
- Applied Materials, Inc.
- Edward P. HAMMOND
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION OF CARBON HARD-MASK
- Publication number 20210043455
- Publication date Feb 11, 2021
- Applied Materials, Inc.
- Byung Seok KWON
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PARAMETERS AND SKEW CHARACTERIZATION BY HIGH SPEED IMAGING
- Publication number 20200357668
- Publication date Nov 12, 2020
- Applied Materials, Inc.
- Sidharth BHATIA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DEVICE AND METHOD FOR TUNING PLASMA DISTRIBUTION USING PHASE CONTROL
- Publication number 20200161093
- Publication date May 21, 2020
- Applied Materials, Inc.
- Xiaopu LI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS FOR SUPPRESSING PARASITIC PLASMA IN PLASMA ENHANCED CHEMI...
- Publication number 20190378696
- Publication date Dec 12, 2019
- Applied Materials, Inc.
- Sai Susmita ADDEPALLI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GROUND PATH SYSTEMS FOR PROVIDING A SHORTER AND SYMMETRICAL GROUND...
- Publication number 20190360100
- Publication date Nov 28, 2019
- Applied Materials, Inc.
- Tuan Anh NGUYEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE DEPOSITION OF HARDMASK
- Publication number 20190341227
- Publication date Nov 7, 2019
- Applied Materials, Inc.
- Satya THOKACHICHU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RF GROUNDING CONFIGURATION FOR PEDESTALS
- Publication number 20190341232
- Publication date Nov 7, 2019
- Applied Materials, Inc.
- Satya THOKACHICHU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DUAL RADIO-FREQUENCY TUNER FOR PROCESS CONTROL OF A PLASMA PROCESS
- Publication number 20180261431
- Publication date Sep 13, 2018
- Applied Materials, Inc.
- Edward P. HAMMOND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PARAMETERS AND SKEW CHARACTERIZATION BY HIGH SPEED IMAGING
- Publication number 20180204750
- Publication date Jul 19, 2018
- Applied Materials, Inc.
- Sidharth BHATIA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ANTI-ARC ZERO FIELD PLATE
- Publication number 20180119281
- Publication date May 3, 2018
- Applied Materials, Inc.
- Jonghoon BAEK
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ELECTROSTATIC CHUCK HAVING PROPERTIES FOR OPTIMAL THIN FILM DEPOSIT...
- Publication number 20170352569
- Publication date Dec 7, 2017
- Applied Materials, Inc.
- Abdul Aziz KHAJA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK IMPEDANCE EVALUATION
- Publication number 20170345698
- Publication date Nov 30, 2017
- Applied Materials, Inc.
- Edward P. HAMMOND
- G01 - MEASURING TESTING
Information Patent Application
SUBSTRATE SUPPORT PEDESTAL HAVING PLASMA CONFINEMENT FEATURES
- Publication number 20170306494
- Publication date Oct 26, 2017
- Applied Materials, Inc.
- Xing LIN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Dual-Feed Tunable Plasma Source
- Publication number 20170213702
- Publication date Jul 27, 2017
- Applied Materials, Inc.
- Edward P. Hammond
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCH RATE AND CRITICAL DIMENSION UNIFORMITY BY SELECTION OF FOCUS R...
- Publication number 20170011891
- Publication date Jan 12, 2017
- Applied Materials, Inc.
- Edward P. HAMMOND
- H01 - BASIC ELECTRIC ELEMENTS

Edward P. Hammond IV

Person

Patents Grantslast 30 patents

Magnetically coupled RF filter for substrate processing chambers

Plasma-enhanced chemical vapor deposition of carbon hard-mask

Electrostatic chuck with multiple radio frequency meshes to control...

Bipolar esc with balanced RF impedance

Device and method for tuning plasma distribution using phase control

Power supply signal conditioning for an electrostatic chuck

Substrate support assemblies and components

RF power delivery architecture with switchable match and frequency...

RF grounding configuration for pedestals

Plasma parameters and skew characterization by high speed imaging

Ground path systems for providing a shorter and symmetrical ground...

Push-pull power supply for multi-mesh processing chambers

Selective deposition of hardmask

Plasma parameters and skew characterization by high speed imaging

Dual-feed tunable plasma source

Dual radio-frequency tuner for process control of a plasma process

Anti-arc zero field plate

Electromagnet array in a sputter reactor

Patents Applicationslast 30 patents

PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION OF CARBON HARD-MASK

BIPOLAR ELECTROSTATIC CHUCK ELECTRODE DESIGNS

ELECTROSTATIC CHUCK WITH MULTIPLE RADIO FREQUENCY MESHES TO CONTROL...

FARADAY FACEPLATE

RF GROUNDING CONFIGURATION FOR PEDESTALS

BIPOLAR ESC WITH BALANCED RF IMPEDANCE

MULTI-ZONE HEATER WITH MINIMUM RF LOSS

GROUND PATH SYSTEMS FOR PROVIDING A SHORTER AND SYMMETRICAL GROUND...

MAGNETICALLY COUPLED RF FILTER FOR SUBSTRATE PROCESSING CHAMBERS

RF POWER DELIVERY ARCHITECTURE WITH SWITCHABLE MATCH AND FREQUENCY...

PUSH-PULL POWER SUPPLY FOR MULTI-MESH PROCESSING CHAMBERS

POWER SUPPLY SIGNAL CONDITIONING FOR AN ELECTROSTATIC CHUCK

SUBSTRATE SUPPORT ASSEMBLIES AND COMPONENTS

SUBSTRATE SUPPORT PEDESTAL HAVING PLASMA CONFINEMENT FEATURES

ELECTROSTATIC CHUCK WITH MULTIPLE RADIO FREQUENCY MESHES TO CONTROL...

PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION OF CARBON HARD-MASK

PLASMA PARAMETERS AND SKEW CHARACTERIZATION BY HIGH SPEED IMAGING

DEVICE AND METHOD FOR TUNING PLASMA DISTRIBUTION USING PHASE CONTROL

APPARATUS FOR SUPPRESSING PARASITIC PLASMA IN PLASMA ENHANCED CHEMI...

GROUND PATH SYSTEMS FOR PROVIDING A SHORTER AND SYMMETRICAL GROUND...

SELECTIVE DEPOSITION OF HARDMASK

RF GROUNDING CONFIGURATION FOR PEDESTALS

DUAL RADIO-FREQUENCY TUNER FOR PROCESS CONTROL OF A PLASMA PROCESS

PLASMA PARAMETERS AND SKEW CHARACTERIZATION BY HIGH SPEED IMAGING

ANTI-ARC ZERO FIELD PLATE

ELECTROSTATIC CHUCK HAVING PROPERTIES FOR OPTIMAL THIN FILM DEPOSIT...

ELECTROSTATIC CHUCK IMPEDANCE EVALUATION

SUBSTRATE SUPPORT PEDESTAL HAVING PLASMA CONFINEMENT FEATURES

Dual-Feed Tunable Plasma Source

ETCH RATE AND CRITICAL DIMENSION UNIFORMITY BY SELECTION OF FOCUS R...