Edwin te Sligte

Person

Eindhoven, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Method for removing a contamination layer by an atomic layer etchin...
- Patent number 11,199,363
- Issue date Dec 14, 2021
- Carl Zeiss SMT GmbH
- Fred Roozeboom
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Grant
Component for use in a patterning device environment
- Patent number 11,048,180
- Issue date Jun 29, 2021
- ASML Netherlands B.V.
- Andrey Nikipelov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical element and optical system for EUV lithography, and method...
- Patent number 10,690,812
- Issue date Jun 23, 2020
- Carl Zeiss SMT GmbH
- Hermanus Hendricus Petrus Theodorus Bekman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
EUV lithography system and operating method
- Patent number 10,073,361
- Issue date Sep 11, 2018
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device and method for generating a plasma discharge for patterning...
- Patent number 9,161,427
- Issue date Oct 13, 2015
- Vision Dynamics Holding B.V.
- Paulus Petrus Maria Blom
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for removing a contamination layer from an optical surface a...
- Patent number 8,980,009
- Issue date Mar 17, 2015
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- B08 - CLEANING

Patents Applicationslast 30 patents

Information Patent Application
LITHOGRAPHIC SYSTEM PROVIDED WITH A DEFLECTION APPARATUS FOR CHANGI...
- Publication number 20230063156
- Publication date Mar 2, 2023
- ASML Holding N.V.
- Ronald Peter ALBRIGHT
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR REMOVING A CONTAMINATION LAYER BY AN ATOMIC LAYER ETCHIN...
- Publication number 20200142327
- Publication date May 7, 2020
- Carl Zeiss SMT GMBH
- Fred ROOZEBOOM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Component for Use in a Patterning Device Environment
- Publication number 20200096880
- Publication date Mar 26, 2020
- ASML NETHERLANDS B.V.
- Andrey NIKIPELOV
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV Lithography System And Operating Method
- Publication number 20170212433
- Publication date Jul 27, 2017
- Carl Zeiss SMT GMBH
- Dirk Heinrich EHM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Cleaning Apparatus and Associated Low Pressure Chamber Apparatus
- Publication number 20170045832
- Publication date Feb 16, 2017
- ASML NETHERLANDS B.V.
- Freek Theodorus MOLKENBOER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ELEMENT AND OPTICAL SYSTEM FOR EUV LITHOGRAPHY, AND METHOD...
- Publication number 20160187543
- Publication date Jun 30, 2016
- Carl Zeiss SMT GMBH
- Hermanus Hendricus Petrus Theodorus BEKMAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEVICE AND METHOD FOR GENERATING A PLASMA DISCHARGE FOR PATTERNING...
- Publication number 20130206720
- Publication date Aug 15, 2013
- VISION DYNAMICS HOLDING B.V.
- Paulus Petrus Maria Blom
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR REMOVING A CONTAMINATION LAYER FROM AN OPTICAL SURFACE A...
- Publication number 20130186430
- Publication date Jul 25, 2013
- ASML NETHERLANDS B.V.
- Dirk Heinrich Ehm
- B08 - CLEANING
Information Patent Application
METHOD OF MAKING A SUPPORT STRUCTURE
- Publication number 20130126226
- Publication date May 23, 2013
- Nederlandse Organisatie voor toegepast- natuurwetenschappelijk Onderzoek TNO
- Norbertus Benedictus Koster
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYDROGEN RADICAL GENERATOR
- Publication number 20120006258
- Publication date Jan 12, 2012
- ASML NETHERLANDS B.V.
- Gerard Frans Jozef Schasfoort
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Edwin te Sligte

Person

Patents Grantslast 30 patents

Method for removing a contamination layer by an atomic layer etchin...

Component for use in a patterning device environment

Optical element and optical system for EUV lithography, and method...

EUV lithography system and operating method

Device and method for generating a plasma discharge for patterning...

Method for removing a contamination layer from an optical surface a...

Patents Applicationslast 30 patents

LITHOGRAPHIC SYSTEM PROVIDED WITH A DEFLECTION APPARATUS FOR CHANGI...

METHOD FOR REMOVING A CONTAMINATION LAYER BY AN ATOMIC LAYER ETCHIN...

Component for Use in a Patterning Device Environment

EUV Lithography System And Operating Method

Cleaning Apparatus and Associated Low Pressure Chamber Apparatus

OPTICAL ELEMENT AND OPTICAL SYSTEM FOR EUV LITHOGRAPHY, AND METHOD...

DEVICE AND METHOD FOR GENERATING A PLASMA DISCHARGE FOR PATTERNING...

METHOD FOR REMOVING A CONTAMINATION LAYER FROM AN OPTICAL SURFACE A...

METHOD OF MAKING A SUPPORT STRUCTURE

HYDROGEN RADICAL GENERATOR