Eelco VAN SETTEN

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Eindhoven, NL

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Patents Grantslast 30 patents

Information Patent Grant
Method for high numerical aperture thru-slit source mask optimization
- Patent number 11,815,808
- Issue date Nov 14, 2023
- ASML Netherlands B.V.
- Kars Zeger Troost
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and patterning devices and apparatuses for measuring focus...
- Patent number 11,314,174
- Issue date Apr 26, 2022
- ASML Netherlands B.V.
- Laurentius Cornelius De Winter
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning device
- Patent number 10,928,735
- Issue date Feb 23, 2021
- ASML Netherlands B.V.
- Marcus Adrianus Van De Kerkhof
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of characterizing, method of forming a model, method of simu...
- Patent number 9,798,225
- Issue date Oct 24, 2017
- ASML Netherlands B.V.
- Eelco Van Setten
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Methods and Patterning Devices and Apparatuses for Measuring Focus...
- Publication number 20200264522
- Publication date Aug 20, 2020
- ASML NETHERLANDS B.V.
- Laurentius Cornelius DE WINTER
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
PATTERNING DEVICE
- Publication number 20200096875
- Publication date Mar 26, 2020
- ASML NETHERLANDS B.V.
- Marcus Adrianus VAN DE KERKHOF
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF CHARACTERIZING, METHOD OF FORMING A MODEL, METHOD OF SIMU...
- Publication number 20160266483
- Publication date Sep 15, 2016
- ASML NETHERLANDS B.V.
- Eelco VAN SETTEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY