Eiichi Hoshino

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Kawasaki, JP

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Patents Grantslast 30 patents

Information Patent Grant
Developer and method for forming resist pattern and photomask produ...
- Patent number 6,551,749
- Issue date Apr 22, 2003
- Fujitsu Limited
- Toshikatsu Minagawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition and pattern forming process
- Patent number 6,465,137
- Issue date Oct 15, 2002
- Fujitsu Limited
- Keiji Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Transparent optical device and fabrication method thereof
- Patent number 6,372,392
- Issue date Apr 16, 2002
- Fujitsu Limited
- Eiichi Hoshino
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Film patterning method utilizing post-development residue remover
- Patent number 6,143,473
- Issue date Nov 7, 2000
- Fujitsu Limited
- Eiichi Hoshino
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Processes for forming resist pattern and for producing semiconducto...
- Patent number 5,906,912
- Issue date May 25, 1999
- Fujitsu Limited
- Keiji Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Mask pattern inspection system and mask pattern-inspecting method
- Publication number 20030173529
- Publication date Sep 18, 2003
- FUJITSU LIMITED
- Eiichi Hoshino
- G01 - MEASURING TESTING
Information Patent Application
Method of fabricating reflective mask, and methods and apparatus of...
- Publication number 20020014403
- Publication date Feb 7, 2002
- Eiichi Hoshino
- B82 - NANO-TECHNOLOGY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20010006752
- Publication date Jul 5, 2001
- FUJITSU LIMITED
- KEIJI WATANABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY