Eiichi Murakami

Person

Tochigi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Exposure apparatus with interferometer
- Patent number 7,236,254
- Issue date Jun 26, 2007
- Canon Kabushiki Kaisha
- Osamu Kakuchi
- G01 - MEASURING TESTING
Information Patent Grant
Exposure apparatus
- Patent number 7,046,330
- Issue date May 16, 2006
- Canon Kabushiki Kaisha
- Eiichi Murakami
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Exposure apparatus with interferometer
- Patent number 7,023,561
- Issue date Apr 4, 2006
- Canon Kabushiki Kaisha
- Osamu Kakuchi
- G01 - MEASURING TESTING
Information Patent Grant
Exposure apparatus
- Patent number 6,962,825
- Issue date Nov 8, 2005
- Canon Kabushiki Kaisha
- Eiichi Murakami
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Projection exposure apparatus
- Patent number 6,924,881
- Issue date Aug 2, 2005
- Canon Kabushiki Kaisha
- Eiichi Murakami
- G01 - MEASURING TESTING
Information Patent Grant
Stocker, exposure apparatus, device manufacturing method, semicondu...
- Patent number 6,826,442
- Issue date Nov 30, 2004
- Canon Kabushiki Kaisha
- Seiji Takeuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exposure apparatus, method of manufacturing semiconductor devices a...
- Patent number 6,795,161
- Issue date Sep 21, 2004
- Canon Kabushiki Kaisha
- Masaya Ogura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus
- Patent number 6,633,362
- Issue date Oct 14, 2003
- Canon Kabushiki Kaisha
- Eiichi Murakami
- G01 - MEASURING TESTING
Information Patent Grant
Exposure apparatus with interferometer
- Patent number 6,614,535
- Issue date Sep 2, 2003
- Canon Kabushiki Kaisha
- Osamu Kakuchi
- G01 - MEASURING TESTING
Information Patent Grant
Diffractive optical element and method of manufacturing the same
- Patent number 6,611,376
- Issue date Aug 26, 2003
- Canon Kabushiki Kaisha
- Eiichi Murakami
- G02 - OPTICS
Information Patent Grant
Method of manufacturing an element with multiple-level surface
- Patent number 6,569,608
- Issue date May 27, 2003
- Canon Kabushiki Kaisha
- Ichiro Tanaka
- G02 - OPTICS
Information Patent Grant
Exposure apparatus and method wherein alignment is carried out by c...
- Patent number 5,751,404
- Issue date May 12, 1998
- Canon Kabushiki Kaisha
- Eiichi Murakami
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment method and semiconductor exposure method
- Patent number 5,695,897
- Issue date Dec 9, 1997
- Canon Kabushiki Kaisha
- Noriyuki Mitome
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Position detecting method and projection exposure apparatus using t...
- Patent number 5,594,549
- Issue date Jan 14, 1997
- Canon Kabushiki Kaisha
- Tetsuya Mori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Surface examining apparatus for detecting the presence of foreign p...
- Patent number 5,017,798
- Issue date May 21, 1991
- Canon Kabushiki Kaisha
- Eiichi Murakami
- G01 - MEASURING TESTING
Information Patent Grant
Alignment method in a wafer prober
- Patent number 4,934,064
- Issue date Jun 19, 1990
- Canon Kabushiki Kaisha
- Nobuhito Yamaguchi
- G01 - MEASURING TESTING
Information Patent Grant
Wafer prober
- Patent number 4,929,893
- Issue date May 29, 1990
- Canon Kabushiki Kaisha
- Mitsuya Sato
- G01 - MEASURING TESTING
Information Patent Grant
Surface examining apparatus for detecting the presence of foreign p...
- Patent number 4,886,975
- Issue date Dec 12, 1989
- Canon Kabushiki Kaisha
- Eiichi Murakami
- G01 - MEASURING TESTING
Information Patent Grant
Surface examining apparatus for detecting the presence of foreign p...
- Patent number 4,795,911
- Issue date Jan 3, 1989
- Canon Kabushiki Kaisha
- Michio Kohno
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
Exposure apparatus with interferometer
- Publication number 20060114476
- Publication date Jun 1, 2006
- Canon Kabushiki Kaisha
- Osamu Kakuchi
- G01 - MEASURING TESTING
Information Patent Application
Exposure apparatus
- Publication number 20060007416
- Publication date Jan 12, 2006
- Canon Kabushiki Kaisha
- Eiichi Murakami
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure apparatus with interferometer
- Publication number 20050099635
- Publication date May 12, 2005
- Canon Kabushiki Kaisha
- Osamu Kakuchi
- G01 - MEASURING TESTING
Information Patent Application
Projection exposure apparatus
- Publication number 20040036883
- Publication date Feb 26, 2004
- Canon Kabushiki Kaisha
- Eiichi Murakami
- G01 - MEASURING TESTING
Information Patent Application
PROJECTION EXPOSURE APPARATUS
- Publication number 20030128346
- Publication date Jul 10, 2003
- Eiichi Murakami
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF MANUFACTURING AN ELEMENT WITH MULTIPLE-LEVEL SURFACE, SUC...
- Publication number 20020042024
- Publication date Apr 11, 2002
- ICHIRO TANAKA
- G02 - OPTICS
Information Patent Application
Exposure apparatus
- Publication number 20010055100
- Publication date Dec 27, 2001
- Eiichi Murakami
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Exposure apparatus, method of manufacturing semiconductor devices a...
- Publication number 20010052967
- Publication date Dec 20, 2001
- Masaya Ogura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Stocker, exposure apparatus, device manufacturing method, semicondu...
- Publication number 20010027351
- Publication date Oct 4, 2001
- Seiji Takeuchi
- H01 - BASIC ELECTRIC ELEMENTS

Eiichi Murakami

Person

Patents Grantslast 30 patents

Exposure apparatus with interferometer

Exposure apparatus

Exposure apparatus with interferometer

Exposure apparatus

Projection exposure apparatus

Stocker, exposure apparatus, device manufacturing method, semicondu...

Exposure apparatus, method of manufacturing semiconductor devices a...

Projection exposure apparatus

Exposure apparatus with interferometer

Diffractive optical element and method of manufacturing the same

Method of manufacturing an element with multiple-level surface

Exposure apparatus and method wherein alignment is carried out by c...

Alignment method and semiconductor exposure method

Position detecting method and projection exposure apparatus using t...

Surface examining apparatus for detecting the presence of foreign p...

Alignment method in a wafer prober

Wafer prober

Surface examining apparatus for detecting the presence of foreign p...

Surface examining apparatus for detecting the presence of foreign p...

Patents Applicationslast 30 patents

Exposure apparatus with interferometer

Exposure apparatus

Exposure apparatus with interferometer

Projection exposure apparatus

PROJECTION EXPOSURE APPARATUS

METHOD OF MANUFACTURING AN ELEMENT WITH MULTIPLE-LEVEL SURFACE, SUC...

Exposure apparatus

Exposure apparatus, method of manufacturing semiconductor devices a...

Stocker, exposure apparatus, device manufacturing method, semicondu...