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Eiichi NISHIMURA

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Patents Grantslast 30 patents

Patents Applicationslast 30 patents

  • Information Patent Application

    SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
    • Publication number 20200111646
    • Publication date Apr 9, 2020
    • TOKYO ELECTRON LIMITED
    • Eiichi Nishimura
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    METHOD OF CLEANING PLASMA PROCESSING APPARATUS
    • Publication number 20180327901
    • Publication date Nov 15, 2018
    • TOKYO ELECTRON LIMITED
    • Hiroki KISHI
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    METHOD OF ETCHING POROUS FILM
    • Publication number 20180082823
    • Publication date Mar 22, 2018
    • TOKYO ELECTRON LIMITED
    • Shigeru TAHARA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    METHOD FOR ETCHING MAGNETIC LAYER
    • Publication number 20180033958
    • Publication date Feb 1, 2018
    • TOKYO ELECTRON LIMITED
    • Shigeru TAHARA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS
    • Publication number 20170221682
    • Publication date Aug 3, 2017
    • TOKYO ELECTRON LIMITED
    • Eiichi NISHIMURA
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    METHOD FOR ETCHING MULTILAYER FILM
    • Publication number 20170222139
    • Publication date Aug 3, 2017
    • TOKYO ELECTRON LIMITED
    • Eiichi NISHIMURA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    METHOD FOR PROCESSING OBJECT TO BE PROCESSED
    • Publication number 20170133233
    • Publication date May 11, 2017
    • TOKYO ELECTRON LIMITED
    • Jun SATO
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    METHOD OF ETCHING POROUS FILM
    • Publication number 20160307732
    • Publication date Oct 20, 2016
    • TOKYO ELECTRON LIMITED
    • Shigeru TAHARA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    METHOD OF PROCESSING TARGET OBJECT TO BE PROCESSED
    • Publication number 20160307734
    • Publication date Oct 20, 2016
    • TOKYO ELECTRON LIMITED
    • Shigeru TAHARA
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    METHOD FOR ETCHING LAYER TO BE ETCHED
    • Publication number 20160276582
    • Publication date Sep 22, 2016
    • TOKYO ELECTRON LIMITED
    • Mitsuru HASHIMOTO
    • G11 - INFORMATION STORAGE
  • Information Patent Application

    PATTERN FORMING METHOD
    • Publication number 20160042970
    • Publication date Feb 11, 2016
    • TOKYO ELECTRON LIMITED
    • Shinya Morikita
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    OUTER MIRROR
    • Publication number 20150321608
    • Publication date Nov 12, 2015
    • Murakami Corporation
    • Eiichi Nishimura
    • B60 - VEHICLES IN GENERAL
  • Information Patent Application

    METHOD OF CLEANING PLASMA PROCESSING APPARATUS
    • Publication number 20150247235
    • Publication date Sep 3, 2015
    • TOKYO ELECTRON LIMITED
    • Hiroki KISHI
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    ETCHING METHOD AND SUBSTRATE PROCESSING APPARATUS
    • Publication number 20150214474
    • Publication date Jul 30, 2015
    • TOKYO ELECTRON LIMITED
    • Eiichi NISHIMURA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
    • Publication number 20150179408
    • Publication date Jun 25, 2015
    • TOKYO ELECTRON LIMITED
    • Kouji Shimomura
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    DOOR MIRROR
    • Publication number 20150138658
    • Publication date May 21, 2015
    • Murakami Corporation
    • Eiichi Nishimura
    • B60 - VEHICLES IN GENERAL
  • Information Patent Application

    SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
    • Publication number 20150132960
    • Publication date May 14, 2015
    • TOKYO ELECTRON LIMITED
    • Eiichi Nishimura
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
    • Publication number 20150132970
    • Publication date May 14, 2015
    • TOKYO ELECTRON LIMITED
    • Eiichi Nishimura
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    METHOD FOR ETCHING COPPER LAYER
    • Publication number 20150104951
    • Publication date Apr 16, 2015
    • TOKYO ELECTRON LIMITED
    • Eiichi NISHIMURA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    SEMICONDUCTOR DEVICE MANUFACTURING METHOD
    • Publication number 20150079790
    • Publication date Mar 19, 2015
    • TOKYO ELECTRON LIMITED
    • Eiichi Nishimura
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    DEPOSIT REMOVING METHOD AND GAS PROCESSING APPARATUS
    • Publication number 20150064925
    • Publication date Mar 5, 2015
    • TOKYO ELECTRON LIMITED
    • Shigeru TAHARA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
    • Publication number 20150050750
    • Publication date Feb 19, 2015
    • TOKYO ELECTRON LIMITED
    • Takashi Sone
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    METHOD AND APPARATUS FOR FORMING A PERIODIC PATTERN USING A SELF-AS...
    • Publication number 20150048049
    • Publication date Feb 19, 2015
    • TOKYO ELECTRON LIMITED
    • Eiichi Nishimura
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    ETCHING APPARATUS
    • Publication number 20150013908
    • Publication date Jan 15, 2015
    • TOKYO ELECTRON LIMITED
    • Eiichi NISHIMURA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    METHOD FOR ETCHING FILM CONTAINING COBALT AND PALLADIUM
    • Publication number 20140287591
    • Publication date Sep 25, 2014
    • TOKYO ELECTRON LIMITED
    • Eiichi NISHIMURA
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    METHOD OF ETCHING METAL LAYER
    • Publication number 20140251945
    • Publication date Sep 11, 2014
    • TOKYO ELECTRON LIMITED
    • Eiichi NISHIMURA
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    DEPOSIT REMOVAL METHOD
    • Publication number 20140206198
    • Publication date Jul 24, 2014
    • KABUSHIKI KAISHA TOSHIBA
    • Shigeru TAHARA
    • B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
  • Information Patent Application

    PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
    • Publication number 20140141532
    • Publication date May 22, 2014
    • TOKYO ELECTRON LIMITED
    • Eiichi Nishimura
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    ETCHING METHOD AND SUBSTRATE PROCESSING APPARATUS
    • Publication number 20140120635
    • Publication date May 1, 2014
    • TOKYO ELECTRON LIMITED
    • Eiichi Nishimura
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    METHOD OF ETCHING COPPER LAYER AND MASK
    • Publication number 20140110373
    • Publication date Apr 24, 2014
    • Eiichi Nishimura
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...