Eiichi SEKIMOTO

Person

Koshi-Shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 11,612,017
- Issue date Mar 21, 2023
- Tokyo Electron Limited
- Eiichi Sekimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and method of adjusting substrate pr...
- Patent number 11,476,136
- Issue date Oct 18, 2022
- Tokyo Electron Limited
- Kenichi Shigetomi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 11,469,116
- Issue date Oct 11, 2022
- Tokyo Electron Limited
- Shoichiro Hidaka
- B08 - CLEANING
Information Patent Grant
Thermal treatment apparatus, thermal treatment method, and non-tran...
- Patent number 11,087,983
- Issue date Aug 10, 2021
- Tokyo Electron Limited
- Eiichi Sekimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and method of adjusting substrate pr...
- Patent number 10,504,757
- Issue date Dec 10, 2019
- Tokyo Electron Limited
- Kenichi Shigetomi
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Temperature control for performing heat process in coating/developi...
- Patent number 7,868,270
- Issue date Jan 11, 2011
- Tokyo Electron Limited
- Jun Ookura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature control for performing heat process on resist film
- Patent number 7,755,003
- Issue date Jul 13, 2010
- Tokyo Electron Limited
- Jun Ookura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for heat processing of substrate
- Patent number 7,517,217
- Issue date Apr 14, 2009
- Tokyo Electron Limited
- Masatoshi Deguchi
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Method for heat processing of substrate
- Patent number 6,969,538
- Issue date Nov 29, 2005
- Tokyo Electron Limited
- Masatoshi Deguchi
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Substrate processing apparatus
- Patent number 6,659,661
- Issue date Dec 9, 2003
- Tokyo Electron Limited
- Masatoshi Deguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method of thermal processing and method of pattern fo...
- Patent number 6,573,031
- Issue date Jun 3, 2003
- Tokyo Electron Limited
- Hiroshi Shinya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Heating apparatus for heating an object to be processed
- Patent number 6,185,370
- Issue date Feb 6, 2001
- Tokyo Electron Limited
- Eiichi Sekimoto
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
MOTOR CONTROL METHOD, TRANSFER DEVICE, AND STORING MEDIUM
- Publication number 20240120867
- Publication date Apr 11, 2024
- TOKYO ELECTRON LIMITED
- Youichi MASAKI
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20200146111
- Publication date May 7, 2020
- TOKYO ELECTRON LIMITED
- Eiichi SEKIMOTO
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND METHOD OF ADJUSTING SUBSTRATE PR...
- Publication number 20200066559
- Publication date Feb 27, 2020
- TOKYO ELECTRON LIMITED
- Kenichi SHIGETOMI
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20200035517
- Publication date Jan 30, 2020
- TOKYO ELECTRON LIMITED
- Shoichiro HIDAKA
- B08 - CLEANING
Information Patent Application
THERMAL TREATMENT APPARATUS, THERMAL TREATMENT METHOD, AND NON-TRAN...
- Publication number 20180182611
- Publication date Jun 28, 2018
- TOKYO ELECTRON LIMITED
- Eiichi SEKIMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND METHOD OF ADJUSTING SUBSTRATE PR...
- Publication number 20170170040
- Publication date Jun 15, 2017
- TOKYO ELECTRON LIMITED
- Kenichi SHIGETOMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TEMPERATURE CONTROL FOR PERFORMING HEAT PROCESS IN COATING/DEVELOPI...
- Publication number 20080283515
- Publication date Nov 20, 2008
- TOKYO ELECTRON LIMITED
- Jun Ookura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TEMPERATURE CONTROL FOR PERFORMING HEAT PROCESS ON RESIST FILM
- Publication number 20080156785
- Publication date Jul 3, 2008
- TOKYO ELECTRON LIMITED
- Jun Ookura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for heat processing of substrate
- Publication number 20060005420
- Publication date Jan 12, 2006
- TOKYO ELECTRON LIMITED
- Masatoshi Deguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate processing apparatus
- Publication number 20020114632
- Publication date Aug 22, 2002
- TOKYO ELECTRON LIMITED
- Masatoshi Deguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and method of thermal processing and method of pattern fo...
- Publication number 20020076659
- Publication date Jun 20, 2002
- TOKYO ELECTRON LIMITED
- Hiroshi Shinya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for heat processing of substrate
- Publication number 20020034714
- Publication date Mar 21, 2002
- Masatoshi Deguchi
- H01 - BASIC ELECTRIC ELEMENTS

Eiichi SEKIMOTO

Person

Patents Grantslast 30 patents

Substrate processing apparatus and substrate processing method

Substrate processing apparatus and method of adjusting substrate pr...

Substrate processing apparatus and substrate processing method

Thermal treatment apparatus, thermal treatment method, and non-tran...

Substrate processing apparatus and method of adjusting substrate pr...

Temperature control for performing heat process in coating/developi...

Temperature control for performing heat process on resist film

Method and apparatus for heat processing of substrate

Method for heat processing of substrate

Substrate processing apparatus

Apparatus and method of thermal processing and method of pattern fo...

Heating apparatus for heating an object to be processed

Patents Applicationslast 30 patents

MOTOR CONTROL METHOD, TRANSFER DEVICE, AND STORING MEDIUM

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND METHOD OF ADJUSTING SUBSTRATE PR...

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

THERMAL TREATMENT APPARATUS, THERMAL TREATMENT METHOD, AND NON-TRAN...

SUBSTRATE PROCESSING APPARATUS AND METHOD OF ADJUSTING SUBSTRATE PR...

TEMPERATURE CONTROL FOR PERFORMING HEAT PROCESS IN COATING/DEVELOPI...

TEMPERATURE CONTROL FOR PERFORMING HEAT PROCESS ON RESIST FILM

Method and apparatus for heat processing of substrate

Substrate processing apparatus

Apparatus and method of thermal processing and method of pattern fo...

Method and apparatus for heat processing of substrate