Eiichi Shimura

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Kawasaki-shi, JP

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Patents Grantslast 30 patents

Information Patent Grant
Method of forming resist pattern, resist composition and method of...
- Patent number 11,754,926
- Issue date Sep 12, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Eiichi Shimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming photosensitive resin layer, method for producing...
- Patent number 10,353,291
- Issue date Jul 16, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Eiichi Shimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing thick film photoresist pattern
- Patent number 9,244,354
- Issue date Jan 26, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Yasushi Washio
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
RESIST PATTERN FORMATION METHOD
- Publication number 20230127914
- Publication date Apr 27, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Eiichi SHIMURA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD OF FORMING RESIST PATTERN, RESIST COMPOSITION AND METHOD OF...
- Publication number 20200150541
- Publication date May 14, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Eiichi SHIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FORMING PHOTOSENSITIVE RESIN LAYER, METHOD FOR PRODUCING...
- Publication number 20160274459
- Publication date Sep 22, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Eiichi SHIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING THICK FILM PHOTORESIST PATTERN
- Publication number 20130171572
- Publication date Jul 4, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Yasushi Washio
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY