Eiichiro ISHIMIZU

Person

Funabashi-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Polishing composition comprising polishing particles having high wa...
- Patent number 12,227,674
- Issue date Feb 18, 2025
- NISSAN CHEMICAL CORPORATION
- Shigeru Mitsui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for polishing silicon wafer with reduced wear on carrier, an...
- Patent number 11,984,320
- Issue date May 14, 2024
- NISSAN CHEMICAL CORPORATION
- Hayato Yamaguchi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition for post-polishing to be used after primary polishing o...
- Patent number 11,884,844
- Issue date Jan 30, 2024
- NISSAN CHEMICAL CORPORATION
- Hibiki Ishijima
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Cation-containing polishing composition for eliminating protrusions...
- Patent number 11,873,420
- Issue date Jan 16, 2024
- NISSAN CHEMICAL CORPORATION
- Hayato Yamaguchi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method for polishing silicon wafer with reduced wear on carrier, an...
- Patent number 11,621,171
- Issue date Apr 4, 2023
- NISSAN CHEMICAL CORPORATION
- Hayato Yamaguchi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polishing composition containing amphoteric surfactant
- Patent number 11,459,486
- Issue date Oct 4, 2022
- NISSAN CHEMICAL CORPORATION
- Hiroaki Sakaida
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method for producing purified aqueous solution of silicic acid
- Patent number 10,865,113
- Issue date Dec 15, 2020
- Nissan Chemical Industries, Ltd.
- Hiroaki Sakaida
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL

Patents Applicationslast 30 patents

Information Patent Application
COMPOSITION FOR POST-POLISHING TO BE USED AFTER PRIMARY POLISHING O...
- Publication number 20230416569
- Publication date Dec 28, 2023
- NISSAN CHEMICAL CORPORATION
- Hibiki ISHIJIMA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD FOR POLISHING SILICON WAFER WITH REDUCED WEAR ON CARRIER, AN...
- Publication number 20230178376
- Publication date Jun 8, 2023
- NISSAN CHEMICAL CORPORATION
- Hayato YAMAGUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING COMPOSITION COMPRISING POLISHING PARTICLES HAVING HIGH WA...
- Publication number 20220356373
- Publication date Nov 10, 2022
- NISSAN CHEMICAL CORPORATION
- Shigeru MITSUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING COMPOSITION USING POLISHING PARTICLES CONTAINING BASIC SU...
- Publication number 20220228031
- Publication date Jul 21, 2022
- NISSAN CHEMICAL CORPORATION
- Shigeru MITSUI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CATION-CONTAINING POLISHING COMPOSITION FOR ELIMINATING PROTRUSIONS...
- Publication number 20220049126
- Publication date Feb 17, 2022
- NISSAN CHEMICAL CORPORATION
- Hayato YAMAGUCHI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD FOR POLISHING SILICON WAFER WITH REDUCED WEAR ON CARRIER, AN...
- Publication number 20210407816
- Publication date Dec 30, 2021
- NISSAN CHEMICAL CORPORATION
- Hayato YAMAGUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR POLISHING FOR USE IN ELIMINATING PROTRUSION IN PERI...
- Publication number 20200317955
- Publication date Oct 8, 2020
- NISSAN CHEMICAL CORPORATION
- Eiichiro ISHIMIZU
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLISHING COMPOSITION COMPRISING POLISHING PARTICLES HAVING HIGH WA...
- Publication number 20200308448
- Publication date Oct 1, 2020
- NISSAN CHEMICAL CORPORATION
- Shigeru MITSUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING COMPOSITION CONTAINING AMPHOTERIC SURFACTANT
- Publication number 20200123414
- Publication date Apr 23, 2020
- NISSAN CHEMICAL CORPORATION
- Hiroaki SAKAIDA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD FOR PRODUCING PURIFIED AQUEOUS SOLUTION OF SILICIC ACID
- Publication number 20190055131
- Publication date Feb 21, 2019
- Nissan Chemical Industries, Ltd.
- Hiroaki SAKAIDA
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL

Eiichiro ISHIMIZU

Person

Patents Grantslast 30 patents

Polishing composition comprising polishing particles having high wa...

Method for polishing silicon wafer with reduced wear on carrier, an...

Composition for post-polishing to be used after primary polishing o...

Cation-containing polishing composition for eliminating protrusions...

Method for polishing silicon wafer with reduced wear on carrier, an...

Polishing composition containing amphoteric surfactant

Method for producing purified aqueous solution of silicic acid

Patents Applicationslast 30 patents

COMPOSITION FOR POST-POLISHING TO BE USED AFTER PRIMARY POLISHING O...

METHOD FOR POLISHING SILICON WAFER WITH REDUCED WEAR ON CARRIER, AN...

POLISHING COMPOSITION COMPRISING POLISHING PARTICLES HAVING HIGH WA...

POLISHING COMPOSITION USING POLISHING PARTICLES CONTAINING BASIC SU...

CATION-CONTAINING POLISHING COMPOSITION FOR ELIMINATING PROTRUSIONS...

METHOD FOR POLISHING SILICON WAFER WITH REDUCED WEAR ON CARRIER, AN...

COMPOSITION FOR POLISHING FOR USE IN ELIMINATING PROTRUSION IN PERI...

POLISHING COMPOSITION COMPRISING POLISHING PARTICLES HAVING HIGH WA...

POLISHING COMPOSITION CONTAINING AMPHOTERIC SURFACTANT

METHOD FOR PRODUCING PURIFIED AQUEOUS SOLUTION OF SILICIC ACID