Eiichiro Kikuchi

Person

Nirasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Temperature adjustment method using wet surface in a processing cha...
- Patent number 10,541,158
- Issue date Jan 21, 2020
- Tokyo Electron Limited
- Yasuharu Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate mounting stage and surface treatment method therefor
- Patent number 9,214,376
- Issue date Dec 15, 2015
- Tokyo Electron Limited
- Masakazu Higuma
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 8,545,672
- Issue date Oct 1, 2013
- Tokyo Electron Limited
- Nobuyuki Nagayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface processing method for mounting stage
- Patent number 8,343,372
- Issue date Jan 1, 2013
- Tokyo Electron Limited
- Tadashi Aoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface treatment method
- Patent number 7,815,492
- Issue date Oct 19, 2010
- Tokyo Electron Limited
- Yasuharu Sasaki
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND TEMPERATURE ADJUSTMENT METHOD
- Publication number 20170323811
- Publication date Nov 9, 2017
- TOKYO ELECTRON LIMITED
- Yasuharu SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20150200080
- Publication date Jul 16, 2015
- TOKYO ELECTRON LIMITED
- Eiichiro KIKUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20120160808
- Publication date Jun 28, 2012
- TOKYO ELECTRON LIMITED
- Eiichiro KIKUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20120111500
- Publication date May 10, 2012
- TOKYO ELECTRON LIMITED
- Nobuyuki NAGAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND TEMPERATURE ADJUSTMENT METHOD
- Publication number 20120043024
- Publication date Feb 23, 2012
- TOKYO ELECTRON LIMITED
- Yasuharu SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SURFACE TREATMENT METHOD
- Publication number 20080280536
- Publication date Nov 13, 2008
- TOKYO ELECTRON LIMITED
- Yasuharu Sasaki
- B24 - GRINDING POLISHING
Information Patent Application
SURFACE PROCESSING METHOD FOR MOUNTING STAGE
- Publication number 20080237030
- Publication date Oct 2, 2008
- TOKYO ELECTRON LIMITED
- Tadashi Aoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE MOUNTING STAGE AND SURFACE TREATMENT METHOD THEREFOR
- Publication number 20080217291
- Publication date Sep 11, 2008
- TOKYO ELECTRON LIMITED
- Masakazu HIGUMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Eiichiro Kikuchi

Person

Patents Grantslast 30 patents

Temperature adjustment method using wet surface in a processing cha...

Substrate mounting stage and surface treatment method therefor

Plasma processing apparatus

Surface processing method for mounting stage

Surface treatment method

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING APPARATUS AND TEMPERATURE ADJUSTMENT METHOD

SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

PLASMA PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS AND TEMPERATURE ADJUSTMENT METHOD

SURFACE TREATMENT METHOD

SURFACE PROCESSING METHOD FOR MOUNTING STAGE

SUBSTRATE MOUNTING STAGE AND SURFACE TREATMENT METHOD THEREFOR