Eiji Fukuda

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Niigata-ken, JP

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Patents Grantslast 30 patents

Information Patent Grant
Positive resist composition and patterning process
- Patent number 8,703,384
- Issue date Apr 22, 2014
- Shin-Etsu Chemical Co., Ltd.
- Tomohiro Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fine contact hole forming method employing thermal flow process
- Patent number 7,344,827
- Issue date Mar 18, 2008
- Shin-Etsu Chemical Co., Inc.
- Katsuya Takemura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sulfonyldiazomethane compounds, photoacid generator, resist materia...
- Patent number 7,282,316
- Issue date Oct 16, 2007
- Shin-Etsu Chemical Co., Ltd.
- Katsuhiro Kobayashi
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20120135350
- Publication date May 31, 2012
- Tomohiro Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive resist composition, and patterning process using the same
- Publication number 20060183051
- Publication date Aug 17, 2006
- Shin-Etsu Chemical Co., Ltd.
- Takanobu Takeda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Novel sulfonyldiazomethane compounds, photoacid generator, resist m...
- Publication number 20050048395
- Publication date Mar 3, 2005
- Shin-Etsu Chemical Co., Ltd.
- Katsuhiro Kobayashi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Fine contact hole forming method employing thermal flow process
- Publication number 20040224513
- Publication date Nov 11, 2004
- Katsuya Takemura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY