Eiji Setoyama

Person

Hitachi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Gas supply apparatus and film forming apparatus
- Patent number 6,224,676
- Issue date May 1, 2001
- Hitachi, Ltd.
- Katsunori Nakajima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and method of cleaning the apparatus
- Patent number 6,196,155
- Issue date Mar 6, 2001
- Hitachi, Ltd.
- Eiji Setoyama
- B08 - CLEANING
Information Patent Grant
Plasma processing apparatus with a dielectric body in the waveguide
- Patent number 6,084,356
- Issue date Jul 4, 2000
- Hitachi, Ltd.
- Hirofumi Seki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-chamber sputtering apparatus
- Patent number 5,783,055
- Issue date Jul 21, 1998
- Hitachi, Ltd.
- Mitsuhiro Kamei
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering apparatus, device for exchanging target and method for t...
- Patent number 5,429,729
- Issue date Jul 4, 1995
- Hitachi, Ltd.
- Mitsuhiro Kamei
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Control apparatus and method for a substrate tray on an in-line spu...
- Patent number 5,376,777
- Issue date Dec 27, 1994
- Hitachi, Ltd.
- Mitsuhiro Kamei
- G07 - CHECKING-DEVICES
Information Patent Grant
Film forming system using high frequency power and power supply uni...
- Patent number 5,116,482
- Issue date May 26, 1992
- Hitachi, Ltd.
- Eiji Setoyama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering apparatus for forming thin films
- Patent number 5,085,755
- Issue date Feb 4, 1992
- Hitachi, Ltd.
- Eiji Setoyama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vacuum treatment apparatus and vacuum treatment method
- Patent number 5,061,356
- Issue date Oct 29, 1991
- Hitachi, Ltd.
- Shigeru Tanaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Thin film deposition system
- Patent number 4,986,890
- Issue date Jan 22, 1991
- Hitachi, Ltd.
- Eiji Setoyama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering apparatus for production of thin films of magnetic mater...
- Patent number 4,911,815
- Issue date Mar 27, 1990
- Hitachi, Ltd.
- Mitsuhiro Kamei
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Magnetron sputter apparatus and method for forming films by using t...
- Patent number 4,865,709
- Issue date Sep 12, 1989
- Hitachi, Ltd.
- Yukio Nakagawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering apparatus
- Patent number 4,673,482
- Issue date Jun 16, 1987
- Hitachi, Ltd.
- Eiji Setoyama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Plasma processing apparatus and method of cleaning the apparatus
- Publication number 20010001185
- Publication date May 17, 2001
- Hitachi, Ltd.
- Eiji Setoyama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Eiji Setoyama

Person

Patents Grantslast 30 patents

Gas supply apparatus and film forming apparatus

Plasma processing apparatus and method of cleaning the apparatus

Plasma processing apparatus with a dielectric body in the waveguide

Multi-chamber sputtering apparatus

Sputtering apparatus, device for exchanging target and method for t...

Control apparatus and method for a substrate tray on an in-line spu...

Film forming system using high frequency power and power supply uni...

Sputtering apparatus for forming thin films

Vacuum treatment apparatus and vacuum treatment method

Thin film deposition system

Sputtering apparatus for production of thin films of magnetic mater...

Magnetron sputter apparatus and method for forming films by using t...

Sputtering apparatus

Patents Applicationslast 30 patents

Plasma processing apparatus and method of cleaning the apparatus