Eiji Yoneda

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Radiation-sensitive resin composition
- Patent number 9,348,226
- Issue date May 24, 2016
- JSR Corporation
- Isao Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lactone copolymer and radiation-sensitive resin composition
- Patent number 8,597,867
- Issue date Dec 3, 2013
- JSR Corporation
- Hiromitsu Nakashima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Sulfonium compound
- Patent number 7,897,821
- Issue date Mar 1, 2011
- JSR Corporation
- Tomoki Nagai
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound, polymer, and radiation-sensitive composition
- Patent number 7,812,105
- Issue date Oct 12, 2010
- JSR Corporation
- Tomoki Nagai
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiation-sensitive resin composition
- Patent number 7,314,701
- Issue date Jan 1, 2008
- JSR Corporation
- Kenichi Yokoyama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Onium salt compound and radiation-sensitive resin composition
- Patent number 7,217,492
- Issue date May 15, 2007
- JSR Corporation
- Eiji Yoneda
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Acid generator, sulfonic acid, sulfonic acid derivatives and radiat...
- Patent number 6,908,722
- Issue date Jun 21, 2005
- JSR Corporation
- Satoshi Ebata
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Sulfonyloxime compound, and radiation sensitive acid generator, pos...
- Patent number 6,824,954
- Issue date Nov 30, 2004
- JSR Corporation
- Eiji Yoneda
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD AND COMPOSITION
- Publication number 20240142876
- Publication date May 2, 2024
- JSR Corporation
- Hiroyuki MIYAUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD AND COMPOSITION
- Publication number 20240105451
- Publication date Mar 28, 2024
- JSR Corporation
- Eiji YONEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOUND
- Publication number 20100324329
- Publication date Dec 23, 2010
- JSR Corporation
- Tomoki Nagai
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Novel Compound, Polymer, and Radiation-Sensitive Composition
- Publication number 20090069521
- Publication date Mar 12, 2009
- JSR Corporation
- Tomoki Nagai
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Lactone copolymer and radiation-sensitive resin composition
- Publication number 20090053649
- Publication date Feb 26, 2009
- JSR CORPORATION
- Hiromitsu Nakashima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Radiation sensitive resin composition
- Publication number 20070042292
- Publication date Feb 22, 2007
- Eiji Yoneda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Radiation-sensitive resin composition
- Publication number 20060234154
- Publication date Oct 19, 2006
- Isao Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Radiation-sensitive resin composition
- Publication number 20050095527
- Publication date May 5, 2005
- Kenichi Yokoyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Onium salt compound and radiation-sensitive resin composition
- Publication number 20050053861
- Publication date Mar 10, 2005
- Eiji Yoneda
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Sulfonyloxime compound, and radiation sensitive acid generator, pos...
- Publication number 20030113660
- Publication date Jun 19, 2003
- Eiji Yoneda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Acid generator, sulfonic acid, sulfonic acid derivatives and radiat...
- Publication number 20030113658
- Publication date Jun 19, 2003
- Satoshi Ebata
- C07 - ORGANIC CHEMISTRY

Eiji Yoneda

Person

Patents Grantslast 30 patents

Radiation-sensitive resin composition

Lactone copolymer and radiation-sensitive resin composition

Sulfonium compound

Compound, polymer, and radiation-sensitive composition

Radiation-sensitive resin composition

Onium salt compound and radiation-sensitive resin composition

Acid generator, sulfonic acid, sulfonic acid derivatives and radiat...

Sulfonyloxime compound, and radiation sensitive acid generator, pos...

Patents Applicationslast 30 patents

SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD AND COMPOSITION

SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD AND COMPOSITION

COMPOUND

Novel Compound, Polymer, and Radiation-Sensitive Composition

Lactone copolymer and radiation-sensitive resin composition

Radiation sensitive resin composition

Radiation-sensitive resin composition

Radiation-sensitive resin composition

Onium salt compound and radiation-sensitive resin composition

Sulfonyloxime compound, and radiation sensitive acid generator, pos...

Acid generator, sulfonic acid, sulfonic acid derivatives and radiat...