Eiki KAMATA

Person

Yamanashi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus
- Patent number 12,046,453
- Issue date Jul 23, 2024
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,967,485
- Issue date Apr 23, 2024
- Tokyo Electron Limited
- Eiki Kamata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control method and plasma processing apparatus
- Patent number 11,887,825
- Issue date Jan 30, 2024
- Tokyo Electron Limited
- Mikio Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 11,842,886
- Issue date Dec 12, 2023
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,784,085
- Issue date Oct 10, 2023
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and control method
- Patent number 11,721,528
- Issue date Aug 8, 2023
- Tokyo Electron Limited
- Taro Ikeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma probe device, plasma processing apparatus, and control method
- Patent number 11,705,310
- Issue date Jul 18, 2023
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and control method
- Patent number 11,600,475
- Issue date Mar 7, 2023
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Array antenna and plasma processing apparatus
- Patent number 11,476,088
- Issue date Oct 18, 2022
- Tokyo Electron Limited
- Eiki Kamata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma density monitor, plasma processing apparatus, and plasma pro...
- Patent number 11,410,835
- Issue date Aug 9, 2022
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and control method
- Patent number 11,355,326
- Issue date Jun 7, 2022
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma probe device and plasma processing apparatus
- Patent number 11,164,730
- Issue date Nov 2, 2021
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Plasma Processing Apparatus
- Publication number 20240312767
- Publication date Sep 19, 2024
- TOKYO ELECTRON LIMITED
- Taro HAYAKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND ASSEMBLY METHOD OF RESONATOR ARRAY...
- Publication number 20240186114
- Publication date Jun 6, 2024
- TOKYO ELECTRON LIMITED
- Kazushi KANEKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240186115
- Publication date Jun 6, 2024
- TOKYO ELECTRON LIMITED
- Kazushi KANEKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240186113
- Publication date Jun 6, 2024
- TOKYO ELECTRON LIMITED
- Kazushi KANEKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING DEVICE, AND PLASMA PROCESSING METHOD
- Publication number 20240170260
- Publication date May 23, 2024
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240170259
- Publication date May 23, 2024
- TOKYO ELECTRON LIMITED
- Hiroshi KONDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20240030008
- Publication date Jan 25, 2024
- TOKYO ELECTRON LIMITED
- Eiki KAMATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA STATE ESTIMATION METHOD
- Publication number 20240030015
- Publication date Jan 25, 2024
- TOKYO ELECTRON LIMITED
- Eiki KAMATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND CEILING WALL
- Publication number 20230343561
- Publication date Oct 26, 2023
- TOKYO ELECTRON LIMITED
- Satoshi ITOH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TUNER, AND IMPEDANCE MATCHING METHOD
- Publication number 20230335876
- Publication date Oct 19, 2023
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, AND DIELECTR...
- Publication number 20230326716
- Publication date Oct 12, 2023
- Tokyo Electron Limited
- Eiki KAMATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20230238217
- Publication date Jul 27, 2023
- TOKYO ELECTRON LIMITED
- Koji KOTANI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20230238219
- Publication date Jul 27, 2023
- TOKYO ELECTRON LIMITED
- Eiki KAMATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA MEASUREMENT METHOD
- Publication number 20230066120
- Publication date Mar 2, 2023
- TOKYO ELECTRON LIMITED
- Eiki KAMATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROWAVE PLASMA PROCESSING APPARATUS
- Publication number 20220277935
- Publication date Sep 1, 2022
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20220230848
- Publication date Jul 21, 2022
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING DEVICE
- Publication number 20220199369
- Publication date Jun 23, 2022
- TOKYO ELECTRON LIMITED
- Eiki KAMATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20220068606
- Publication date Mar 3, 2022
- TOKYO ELECTRON LIMITED
- Eiki KAMATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ARRAY ANTENNA AND PLASMA PROCESSING APPARATUS
- Publication number 20210225612
- Publication date Jul 22, 2021
- TOKYO ELECTRON LIMITED
- Eiki KAMATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20210134560
- Publication date May 6, 2021
- TOKYO ELECTRON LIMITED
- Eiki KAMATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20210125814
- Publication date Apr 29, 2021
- TOKYO ELECTRON LIMITED
- Mikio SATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20210111003
- Publication date Apr 15, 2021
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- B08 - CLEANING
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20210082727
- Publication date Mar 18, 2021
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND CONTROL METHOD
- Publication number 20210074517
- Publication date Mar 11, 2021
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROBE DEVICE, PLASMA PROCESSING APPARATUS, AND CONTROL METHOD
- Publication number 20210074516
- Publication date Mar 11, 2021
- TOYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND CONTROL METHOD
- Publication number 20210035788
- Publication date Feb 4, 2021
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND CONTROL METHOD
- Publication number 20210035787
- Publication date Feb 4, 2021
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HEATING APPARATUS, HEATING METHOD, AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20200411340
- Publication date Dec 31, 2020
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PLASMA ELECTRIC FIELD MONITOR, PLASMA PROCESSING APPARATUS AND PLAS...
- Publication number 20200388473
- Publication date Dec 10, 2020
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA DENSITY MONITOR, PLASMA PROCESSING APPARATUS, AND PLASMA PRO...
- Publication number 20200381224
- Publication date Dec 3, 2020
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS

Eiki KAMATA

Person

Patents Grantslast 30 patents

Plasma processing apparatus

Plasma processing apparatus and plasma processing method

Control method and plasma processing apparatus

Plasma processing method and plasma processing apparatus

Plasma processing apparatus

Plasma processing apparatus and control method

Plasma probe device, plasma processing apparatus, and control method

Plasma processing apparatus and control method

Array antenna and plasma processing apparatus

Plasma density monitor, plasma processing apparatus, and plasma pro...

Plasma processing apparatus and control method

Plasma probe device and plasma processing apparatus

Patents Applicationslast 30 patents

Plasma Processing Apparatus

PLASMA PROCESSING APPARATUS AND ASSEMBLY METHOD OF RESONATOR ARRAY...

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING DEVICE, AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA STATE ESTIMATION METHOD

PLASMA PROCESSING APPARATUS AND CEILING WALL

TUNER, AND IMPEDANCE MATCHING METHOD

PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, AND DIELECTR...

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA MEASUREMENT METHOD

MICROWAVE PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING DEVICE

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

ARRAY ANTENNA AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

CONTROL METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND CONTROL METHOD

PLASMA PROBE DEVICE, PLASMA PROCESSING APPARATUS, AND CONTROL METHOD

PLASMA PROCESSING APPARATUS AND CONTROL METHOD

PLASMA PROCESSING APPARATUS AND CONTROL METHOD

HEATING APPARATUS, HEATING METHOD, AND SUBSTRATE PROCESSING APPARATUS

PLASMA ELECTRIC FIELD MONITOR, PLASMA PROCESSING APPARATUS AND PLAS...

PLASMA DENSITY MONITOR, PLASMA PROCESSING APPARATUS, AND PLASMA PRO...