Einstein Noel Abarra

Person

Hachioji, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Sputtering apparatus and method of controlling sputtering apparatus
- Patent number 12,002,667
- Issue date Jun 4, 2024
- Tokyo Electron Limited
- Masato Shinada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film thickness measuring apparatus and film thickness measuring met...
- Patent number 11,939,665
- Issue date Mar 26, 2024
- Tokyo Electron Limted
- Masato Shinada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for performing sputtering process
- Patent number 11,851,750
- Issue date Dec 26, 2023
- Tokyo Electron Limited
- Masato Shinada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Target structure and film forming apparatus
- Patent number 11,823,880
- Issue date Nov 21, 2023
- Tokyo Electron Limited
- Einstein Noel Abarra
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering apparatus and film forming method
- Patent number 11,742,190
- Issue date Aug 29, 2023
- Tokyo Electron Limited
- Einstein Noel Abarra
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming system, magnetization characteristic measuring device,...
- Patent number 11,715,671
- Issue date Aug 1, 2023
- Tokyo Electron Limited
- Hiroaki Chihaya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cathode unit and film forming apparatus
- Patent number 11,581,171
- Issue date Feb 14, 2023
- Tokyo Electron Limited
- Masato Shinada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film formation device and film formation method
- Patent number 11,495,446
- Issue date Nov 8, 2022
- Tokyo Electron Limited
- Masato Shinada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming apparatus and film forming method
- Patent number 11,220,741
- Issue date Jan 11, 2022
- Tokyo Electron Limited
- Einstein Noel Abarra
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming apparatus and film forming method
- Patent number 11,174,547
- Issue date Nov 16, 2021
- Tokyo Electron Limited
- Einstein Noel Abarra
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for processing substrate using ion beam
- Patent number 10,062,545
- Issue date Aug 28, 2018
- Canon Anelva Corporation
- Yasushi Kamiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnet unit and magnetron sputtering apparatus
- Patent number 9,911,526
- Issue date Mar 6, 2018
- Canon Anelva Corporation
- Tetsuya Endo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam generator and ion beam plasma processing apparatus
- Patent number 9,422,623
- Issue date Aug 23, 2016
- Canon Anelva Corporation
- Einstein Noel Abarra
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus
- Patent number 9,355,878
- Issue date May 31, 2016
- TDK Corporation
- Einstein Noel Abarra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for processing substrate using ion beam
- Patent number 9,312,102
- Issue date Apr 12, 2016
- Canon Anelva Corporation
- Yasushi Kamiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnet unit and magnetron sputtering apparatus
- Patent number 9,058,962
- Issue date Jun 16, 2015
- Canon Anelva Corporation
- Tetsuya Endo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sputtering apparatus
- Patent number 8,999,121
- Issue date Apr 7, 2015
- Canon Anelva Corporation
- Kyosuke Sugi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Magnetron sputtering cathode, magnetron sputtering apparatus, and m...
- Patent number 8,778,150
- Issue date Jul 15, 2014
- Canon Anelva Corporation
- Tetsuya Endo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cooling system
- Patent number 8,776,542
- Issue date Jul 15, 2014
- Canon Anelva Corporation
- Tetsuya Endo
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Magnet unit and magnetron sputtering apparatus
- Patent number 8,673,124
- Issue date Mar 18, 2014
- Canon Anelva Corporation
- Tetsuya Endo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam generator, and substrate processing apparatus and producti...
- Patent number 8,536,539
- Issue date Sep 17, 2013
- Canon Anelva Corporation
- Hirohisa Hirayanagi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetic sensor stack body, method of forming the same, film format...
- Patent number 8,507,113
- Issue date Aug 13, 2013
- Canon Anelva Corporation
- Einstein Noel Abarra
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Ion beam generator
- Patent number 8,378,576
- Issue date Feb 19, 2013
- Canon Anelva Corporation
- Einstein Noel Abarra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inline-type wafer conveyance device
- Patent number 8,092,139
- Issue date Jan 10, 2012
- Canon Anelva Corporation
- Naoki Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and cleaning method of the same
- Patent number 8,053,747
- Issue date Nov 8, 2011
- Canon Anelva Corporation
- Einstein Noel Abarra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnet unit and magnetron sputtering apparatus
- Patent number 8,048,277
- Issue date Nov 1, 2011
- Canon Anelva Corporation
- Tetsuya Endo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming method by sputtering and sputtering apparatus thereof
- Patent number 8,043,483
- Issue date Oct 25, 2011
- Canon Anelva Corporation
- Tetsuya Endo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Inline-type wafer conveyance device
- Patent number 8,016,537
- Issue date Sep 13, 2011
- Canon Anelva Corporation
- Naoki Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sputtering apparatus and film deposition method
- Patent number 7,955,480
- Issue date Jun 7, 2011
- Canon Anelva Corporation
- Tetsuya Endo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Magnetic Annealing Equipment and Method
- Publication number 20230304741
- Publication date Sep 28, 2023
- TOKYO ELECTRON LIMITED
- Ian Colgan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Conductive Superlattice Structures and Methods of Forming the Same
- Publication number 20230051311
- Publication date Feb 16, 2023
- TOKYO ELECTRON LIMITED
- Hiroaki Niimi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND ABNORMALITY DETECTION METHOD
- Publication number 20220285197
- Publication date Sep 8, 2022
- TOKYO ELECTRON LIMITED
- Hiroaki CHIHAYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND ABNORMALITY DETECTION METHOD
- Publication number 20220285182
- Publication date Sep 8, 2022
- TOKYO ELECTRON LIMITED
- Hiroaki CHIHAYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HOLDER TEMPERATURE DETECTION METHOD, HOLDER MONITORING METHOD AND S...
- Publication number 20220236202
- Publication date Jul 28, 2022
- TOKYO ELECTRON LIMITED
- Einstein Noel ABARRA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPUTTERING APPARATUS AND METHOD OF CONTROLLING SPUTTERING APPARATUS
- Publication number 20220208534
- Publication date Jun 30, 2022
- TOKYO ELECTRON LIMITED
- Masato SHINADA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING APPARATUS, FILM FORMING SYSTEM, AND FILM FORMING METHOD
- Publication number 20220081757
- Publication date Mar 17, 2022
- TOKYO ELECTRON LIMITED
- Masato Shinada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SPUTTERING APPARATUS AND FILM FORMING METHOD
- Publication number 20220044920
- Publication date Feb 10, 2022
- TOKYO ELECTRON LIMITED
- Einstein Noel ABARRA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR PERFORMING SPUTTERING PROCESS
- Publication number 20220025511
- Publication date Jan 27, 2022
- TOKYO ELECTRON LIMITED
- Masato SHINADA
- G02 - OPTICS
Information Patent Application
FILM THICKNESS MEASURING APPARATUS AND FILM THICKNESS MEASURING MET...
- Publication number 20210285096
- Publication date Sep 16, 2021
- TOKYO ELECTRON LIMITED
- Masato SHINADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CATHODE UNIT AND FILM FORMING APPARATUS
- Publication number 20210257198
- Publication date Aug 19, 2021
- TOKYO ELECTRON LIMITED
- Masato SHINADA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMATION DEVICE AND FILM FORMATION METHOD
- Publication number 20210118653
- Publication date Apr 22, 2021
- TOKYO ELECTRON LIMITED
- Masato SHINADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING SYSTEM, MAGNETIZATION CHARACTERISTIC MEASURING DEVICE,...
- Publication number 20210082777
- Publication date Mar 18, 2021
- TOKYO ELECTRON LIMITED
- Hiroaki CHIHAYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TARGET STRUCTURE AND FILM FORMING APPARATUS
- Publication number 20210020419
- Publication date Jan 21, 2021
- TOKYO ELECTRON LIMITED
- Einstein Noel ABARRA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PLACEMENT MECHANISM, FILM FORMING APPARATUS, AND FILM FOR...
- Publication number 20200093027
- Publication date Mar 19, 2020
- TOKYO ELECTRON LIMITED
- Einstein Noel Abarra
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING APPARATUS AND FILM FORMING METHOD
- Publication number 20190352771
- Publication date Nov 21, 2019
- TOKYO ELECTRON LIMITED
- Einstein Noel Abarra
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND METHOD FOR PROCESSING SUBSTRATE USING ION BEAM
- Publication number 20160189925
- Publication date Jun 30, 2016
- Canon ANELVA Corporation
- Yasushi KAMIYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MAGNET UNIT AND MANETRON SPUTTERING APPARATUS
- Publication number 20150235751
- Publication date Aug 20, 2015
- Canon ANELVA Corporation
- TETSUYA ENDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM GENERATOR AND ION BEAM PLASMA PROCESSING APPARATUS
- Publication number 20140124363
- Publication date May 8, 2014
- Canon ANELVA Corporation
- Einstein Noel ABARRA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20140105709
- Publication date Apr 17, 2014
- iZA CORPORATION
- Einstein Noel ABARRA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE COOLING DEVICE, SPUTTERING APPARATUS AND METHOD FOR MANUF...
- Publication number 20120193216
- Publication date Aug 2, 2012
- Canon ANELVA Corporation
- Tetsuya ENDO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MAGNET UNIT AND MAGNETRON SPUTTERING APPARATUS
- Publication number 20120160673
- Publication date Jun 28, 2012
- Canon ANELVA Corporation
- Tetsuya Endo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR PROCESSING SUBSTRATE USING ION BEAM
- Publication number 20120145535
- Publication date Jun 14, 2012
- Canon ANELVA Corporation
- Yasushi KAMIYA
- G05 - CONTROLLING REGULATING
Information Patent Application
ION BEAM GENERATING APPARATUS, SUBSTRATE PROCESSING APPARATUS AND M...
- Publication number 20120104274
- Publication date May 3, 2012
- Canon ANELVA Corporation
- Hirohisa Hirayanagi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MAGNETIC SENSOR STACK BODY, METHOD OF FORMING THE SAME, FILM FORMAT...
- Publication number 20120070693
- Publication date Mar 22, 2012
- Canon ANELVA Corporation
- Einstein Noel Abarra
- G01 - MEASURING TESTING
Information Patent Application
MAGNET UNIT AND MAGNETRON SPUTTERING APPARATUS
- Publication number 20110297537
- Publication date Dec 8, 2011
- Canon ANELVA Corporation
- Tetsuya Endo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPUTTERING APPARATUS
- Publication number 20110272278
- Publication date Nov 10, 2011
- Canon ANELVA Corporation
- Kyosuke Sugi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COOLING SYSTEM
- Publication number 20110155569
- Publication date Jun 30, 2011
- Canon ANELVA Corporation
- Tetsuya ENDO
- F25 - REFRIGERATION OR COOLING COMBINED HEATING AND REFRIGERATION SYSTEMS HEA...
Information Patent Application
Ion Beam Generator, and Substrate Processing Apparatus and Producti...
- Publication number 20110147200
- Publication date Jun 23, 2011
- Canon ANELVA Corporation
- Hirohisa Hirayanagi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM GENERATOR
- Publication number 20110139998
- Publication date Jun 16, 2011
- Canon ANELVA Corporation
- Einstein Noel ABARRA
- H01 - BASIC ELECTRIC ELEMENTS

Einstein Noel Abarra

Person

Patents Grantslast 30 patents

Sputtering apparatus and method of controlling sputtering apparatus

Film thickness measuring apparatus and film thickness measuring met...

Apparatus and method for performing sputtering process

Target structure and film forming apparatus

Sputtering apparatus and film forming method

Film forming system, magnetization characteristic measuring device,...

Cathode unit and film forming apparatus

Film formation device and film formation method

Film forming apparatus and film forming method

Film forming apparatus and film forming method

Apparatus and method for processing substrate using ion beam

Magnet unit and magnetron sputtering apparatus

Ion beam generator and ion beam plasma processing apparatus

Substrate processing apparatus

Apparatus and method for processing substrate using ion beam

Magnet unit and magnetron sputtering apparatus

Sputtering apparatus

Magnetron sputtering cathode, magnetron sputtering apparatus, and m...

Cooling system

Magnet unit and magnetron sputtering apparatus

Ion beam generator, and substrate processing apparatus and producti...

Magnetic sensor stack body, method of forming the same, film format...

Ion beam generator

Inline-type wafer conveyance device

Substrate processing apparatus and cleaning method of the same

Magnet unit and magnetron sputtering apparatus

Film forming method by sputtering and sputtering apparatus thereof

Inline-type wafer conveyance device

Sputtering apparatus and film deposition method

Patents Applicationslast 30 patents

Magnetic Annealing Equipment and Method

Conductive Superlattice Structures and Methods of Forming the Same

SUBSTRATE PROCESSING APPARATUS AND ABNORMALITY DETECTION METHOD

SUBSTRATE PROCESSING APPARATUS AND ABNORMALITY DETECTION METHOD

HOLDER TEMPERATURE DETECTION METHOD, HOLDER MONITORING METHOD AND S...

SPUTTERING APPARATUS AND METHOD OF CONTROLLING SPUTTERING APPARATUS

FILM FORMING APPARATUS, FILM FORMING SYSTEM, AND FILM FORMING METHOD

SPUTTERING APPARATUS AND FILM FORMING METHOD

APPARATUS AND METHOD FOR PERFORMING SPUTTERING PROCESS

FILM THICKNESS MEASURING APPARATUS AND FILM THICKNESS MEASURING MET...

CATHODE UNIT AND FILM FORMING APPARATUS

FILM FORMATION DEVICE AND FILM FORMATION METHOD

FILM FORMING SYSTEM, MAGNETIZATION CHARACTERISTIC MEASURING DEVICE,...

TARGET STRUCTURE AND FILM FORMING APPARATUS

SUBSTRATE PLACEMENT MECHANISM, FILM FORMING APPARATUS, AND FILM FOR...

FILM FORMING APPARATUS AND FILM FORMING METHOD

APPARATUS AND METHOD FOR PROCESSING SUBSTRATE USING ION BEAM

MAGNET UNIT AND MANETRON SPUTTERING APPARATUS

ION BEAM GENERATOR AND ION BEAM PLASMA PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS

SUBSTRATE COOLING DEVICE, SPUTTERING APPARATUS AND METHOD FOR MANUF...

MAGNET UNIT AND MAGNETRON SPUTTERING APPARATUS

APPARATUS AND METHOD FOR PROCESSING SUBSTRATE USING ION BEAM

ION BEAM GENERATING APPARATUS, SUBSTRATE PROCESSING APPARATUS AND M...

MAGNETIC SENSOR STACK BODY, METHOD OF FORMING THE SAME, FILM FORMAT...

MAGNET UNIT AND MAGNETRON SPUTTERING APPARATUS

SPUTTERING APPARATUS

COOLING SYSTEM

Ion Beam Generator, and Substrate Processing Apparatus and Producti...

ION BEAM GENERATOR