Eishi Shiobara

Person

Mie-ken, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Reflective mask
- Patent number 11,366,380
- Issue date Jun 21, 2022
- Kioxia Corporation
- Eishi Shiobara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Particle measuring method and detection liquid
- Patent number 11,112,344
- Issue date Sep 7, 2021
- Kioxia Corporation
- Hiroshi Tomita
- G01 - MEASURING TESTING
Information Patent Grant
Manufacturing apparatus of semiconductor device and management meth...
- Patent number 9,958,794
- Issue date May 1, 2018
- Kabushiki Kaisha Toshiba
- Eishi Shiobara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor device and method of manufacturing the same
- Patent number 9,891,524
- Issue date Feb 13, 2018
- Kabushiki Kaisha Toshiba
- Eishi Shiobara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming pattern
- Patent number 8,883,405
- Issue date Nov 11, 2014
- Kabushiki Kaisha Toshiba
- Eishi Shiobara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method
- Patent number 8,753,803
- Issue date Jun 17, 2014
- Kabushiki Kaisha Toshiba
- Yoshihisa Kawamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern formation method and method for manufacturing semiconductor...
- Patent number 8,747,682
- Issue date Jun 10, 2014
- Kabushiki Kaisha Toshiba
- Kentaro Matsunaga
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Imprint method
- Patent number 8,419,995
- Issue date Apr 16, 2013
- Kabushiki Kaisha Toshiba
- Ikuo Yoneda
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 8,329,385
- Issue date Dec 11, 2012
- Kabushiki Kaisha Toshiba
- Eishi Shiobara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming resist pattern
- Patent number 8,198,005
- Issue date Jun 12, 2012
- Kabushiki Kaisha Toshiba
- Eishi Shiobara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 8,187,797
- Issue date May 29, 2012
- Kabushiki Kaisha Toshiba
- Eishi Shiobara
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 8,158,332
- Issue date Apr 17, 2012
- Kabushiki Kaisha Toshiba
- Kentaro Matsunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for manufacturing semiconductor device
- Patent number 8,097,398
- Issue date Jan 17, 2012
- Kabushiki Kaisha Toshiba
- Takehiro Kondoh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Evaluation method for chemical solution, qualification method for c...
- Patent number 8,080,429
- Issue date Dec 20, 2011
- Kabushiki Kaisha Toshiba
- Shinichi Ito
- G01 - MEASURING TESTING
Information Patent Grant
Method for treating substrate, method for conveying substrate, and...
- Patent number 7,973,907
- Issue date Jul 5, 2011
- Kabushiki Kaisha Toshiba
- Kentaro Matsunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor device manufacturing method to form resist pattern
- Patent number 7,968,272
- Issue date Jun 28, 2011
- Kabushiki Kaisha Toshiba
- Daisuke Kawamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method
- Patent number 7,851,139
- Issue date Dec 14, 2010
- Kabushiki Kaisha Toshiba
- Eishi Shiobara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate processing method, substrate processing apparatus, and ma...
- Patent number 7,794,923
- Issue date Sep 14, 2010
- Kabushiki Kaisha Toshiba
- Eishi Shiobara
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Substrate processing apparatus and method
- Patent number 7,779,777
- Issue date Aug 24, 2010
- Kabushiki Kaisha Toshiba
- Eishi Shiobara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist pattern forming method and manufacturing method of semicondu...
- Patent number 7,687,227
- Issue date Mar 30, 2010
- Kabushiki Kaisha Toshiba
- Eishi Shiobara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Evaluation method for chemical solution, qualification method for c...
- Patent number 7,687,279
- Issue date Mar 30, 2010
- Kabushiki Kaisha Toshiba
- Shinichi Ito
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus for processing substrate and method of processing the same
- Patent number 7,662,546
- Issue date Feb 16, 2010
- Kabushiki Kaisha Toshiba
- Kenji Kawano
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Pattern forming method and semiconductor device manufacturing method
- Patent number 7,662,542
- Issue date Feb 16, 2010
- Kabushiki Kaisha Toshiba
- Eishi Shiobara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 7,537,871
- Issue date May 26, 2009
- Kabushiki Kaisha Toshiba
- Kazuya Fukuhara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method and method for manufacturing a semiconductor...
- Patent number 7,527,918
- Issue date May 5, 2009
- Kabushiki Kaisha Toshiba
- Takehiro Kondoh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for evaluating sensitivity of photoresist, method for prepar...
- Patent number 7,368,209
- Issue date May 6, 2008
- Kabushiki Kaisha Toshiba
- Eishi Shiobara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of processing a substrate, heating apparatus, and method of...
- Patent number 7,294,586
- Issue date Nov 13, 2007
- Kabushiki Kaisha Toshiba
- Kenji Kawano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern forming method and method for manufacturing semiconductor d...
- Patent number 7,026,099
- Issue date Apr 11, 2006
- Kabushiki Kaisha Toshiba
- Hirokazu Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of processing a substrate, heating apparatus, and method of...
- Patent number 7,009,148
- Issue date Mar 7, 2006
- Kabushiki Kaisha Toshiba
- Kenji Kawano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for processing substrate and method of processing the same
- Patent number 7,005,238
- Issue date Feb 28, 2006
- Kabushiki Kaisha Toshiba
- Kenji Kawano
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...

Patents Applicationslast 30 patents

Information Patent Application
REFLECTIVE MASK
- Publication number 20210072634
- Publication date Mar 11, 2021
- KIOXIA Corporation
- Eishi SHIOBARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARTICLE MEASURING METHOD AND DETECTION LIQUID
- Publication number 20200284714
- Publication date Sep 10, 2020
- KIOXIA Corporation
- Hiroshi TOMITA
- G01 - MEASURING TESTING
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20160216609
- Publication date Jul 28, 2016
- KABUSHIKI KAISHA TOSHIBA
- Eishi SHIOBARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MANUFACTURING APPARATUS OF SEMICONDUCTOR DEVICE AND MANAGEMENT METH...
- Publication number 20160204040
- Publication date Jul 14, 2016
- KABUSHIKI KAISHA TOSHIBA
- Eishi SHIOBARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING PATTERN
- Publication number 20130164691
- Publication date Jun 27, 2013
- Kabushiki Kaisha Toshiba
- Eishi SHIOBARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD TO FORM RESIST PATTERN, A...
- Publication number 20110229826
- Publication date Sep 22, 2011
- Daisuke Kawamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD
- Publication number 20110059406
- Publication date Mar 10, 2011
- Yoshihisa KAWAMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMATION METHOD AND METHOD FOR MANUFACTURING SEMICONDUCTOR...
- Publication number 20110034029
- Publication date Feb 10, 2011
- Kentaro MATSUNAGA
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
PATTERN FORMING METHOD
- Publication number 20100304568
- Publication date Dec 2, 2010
- Seiro MIYOSHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
- Publication number 20100183982
- Publication date Jul 22, 2010
- Kentaro MATSUNAGA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EVALUATION METHOD FOR CHEMICAL SOLUTION, QUALIFICATION METHOD FOR C...
- Publication number 20100139421
- Publication date Jun 10, 2010
- Kabushiki Kaisha Toshiba
- Shinichi Ito
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20100104984
- Publication date Apr 29, 2010
- Eishi SHIOBARA
- B82 - NANO-TECHNOLOGY
Information Patent Application
IMPRINT METHOD
- Publication number 20100078860
- Publication date Apr 1, 2010
- Ikuo Yoneda
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
- Publication number 20090305166
- Publication date Dec 10, 2009
- Eishi SHIOBARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING RESIST PATTERN
- Publication number 20090305174
- Publication date Dec 10, 2009
- Eishi SHIOBARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20090305167
- Publication date Dec 10, 2009
- Takehiro KONDOH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND METHOD
- Publication number 20090226624
- Publication date Sep 10, 2009
- Kabushiki Kaisha Toshiba
- Eishi Shiobara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERNING METHOD
- Publication number 20090123878
- Publication date May 14, 2009
- Seiro MIYOSHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR TREATING SUBSTRATE, METHOD FOR CONVEYING SUBSTRATE, AND...
- Publication number 20090115978
- Publication date May 7, 2009
- Kentaro MATSUNAGA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD
- Publication number 20090117498
- Publication date May 7, 2009
- Eishi Shiobara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pattern formation method using fine pattern formation material for...
- Publication number 20080138746
- Publication date Jun 12, 2008
- Takehiro Kondoh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Waste liquid processing method in semiconductor manufacturing proce...
- Publication number 20080073286
- Publication date Mar 27, 2008
- Eishi Shiobara
- G05 - CONTROLLING REGULATING
Information Patent Application
Method of processing a substrate, heating apparatus, and method of...
- Publication number 20080064226
- Publication date Mar 13, 2008
- Kabushiki Kaisha Toshiba
- Kenji Kawano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Substrate processing method and semiconductor device manufacturing...
- Publication number 20080003837
- Publication date Jan 3, 2008
- Kei Hayasaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Substrate processing apparatus and method
- Publication number 20070266936
- Publication date Nov 22, 2007
- Eishi Shiobara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate treatment method, substrate treatment apparatus, and semi...
- Publication number 20070199579
- Publication date Aug 30, 2007
- Kei Hayasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate processing method, substrate processing apparatus, and ma...
- Publication number 20070190462
- Publication date Aug 16, 2007
- Eishi Shiobara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Semiconductor device manufacturing method to form resist pattern, a...
- Publication number 20070128554
- Publication date Jun 7, 2007
- Daisuke Kawamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of manufacturing semiconductor device
- Publication number 20070082295
- Publication date Apr 12, 2007
- Kazuya Fukuhara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist pattern forming method and manufacturing method of semicondu...
- Publication number 20070042297
- Publication date Feb 22, 2007
- Eishi Shiobara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Eishi Shiobara

Person

Patents Grantslast 30 patents

Reflective mask

Particle measuring method and detection liquid

Manufacturing apparatus of semiconductor device and management meth...

Semiconductor device and method of manufacturing the same

Method for forming pattern

Pattern forming method

Pattern formation method and method for manufacturing semiconductor...

Imprint method

Method of manufacturing a semiconductor device

Method of forming resist pattern

Method of manufacturing semiconductor device

Method of manufacturing a semiconductor device

Method for manufacturing semiconductor device

Evaluation method for chemical solution, qualification method for c...

Method for treating substrate, method for conveying substrate, and...

Semiconductor device manufacturing method to form resist pattern

Pattern forming method

Substrate processing method, substrate processing apparatus, and ma...

Substrate processing apparatus and method

Resist pattern forming method and manufacturing method of semicondu...

Evaluation method for chemical solution, qualification method for c...

Apparatus for processing substrate and method of processing the same

Pattern forming method and semiconductor device manufacturing method

Method of manufacturing semiconductor device

Pattern forming method and method for manufacturing a semiconductor...

Method for evaluating sensitivity of photoresist, method for prepar...

Method of processing a substrate, heating apparatus, and method of...

Pattern forming method and method for manufacturing semiconductor d...

Method of processing a substrate, heating apparatus, and method of...

Apparatus for processing substrate and method of processing the same

Patents Applicationslast 30 patents

REFLECTIVE MASK

PARTICLE MEASURING METHOD AND DETECTION LIQUID

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

MANUFACTURING APPARATUS OF SEMICONDUCTOR DEVICE AND MANAGEMENT METH...

METHOD FOR FORMING PATTERN

SEMICONDUCTOR DEVICE MANUFACTURING METHOD TO FORM RESIST PATTERN, A...

PATTERN FORMING METHOD

PATTERN FORMATION METHOD AND METHOD FOR MANUFACTURING SEMICONDUCTOR...

PATTERN FORMING METHOD

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

EVALUATION METHOD FOR CHEMICAL SOLUTION, QUALIFICATION METHOD FOR C...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

IMPRINT METHOD

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

METHOD OF FORMING RESIST PATTERN

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

SUBSTRATE PROCESSING APPARATUS AND METHOD

PATTERNING METHOD

METHOD FOR TREATING SUBSTRATE, METHOD FOR CONVEYING SUBSTRATE, AND...

PATTERN FORMING METHOD

Pattern formation method using fine pattern formation material for...

Waste liquid processing method in semiconductor manufacturing proce...

Method of processing a substrate, heating apparatus, and method of...

Substrate processing method and semiconductor device manufacturing...

Substrate processing apparatus and method

Substrate treatment method, substrate treatment apparatus, and semi...

Substrate processing method, substrate processing apparatus, and ma...

Semiconductor device manufacturing method to form resist pattern, a...

Method of manufacturing semiconductor device

Resist pattern forming method and manufacturing method of semicondu...