Eisuke Nishitani

Person

Yokohama, JP

People

Patents Grantslast 30 patents

Information Patent Grant
MOS transistor apparatus and method of manufacturing same
- Patent number 6,905,928
- Issue date Jun 14, 2005
- Hitachi, Ltd.
- Naoki Kanda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
MOS transistor apparatus and method of manufacturing same
- Patent number 6,870,224
- Issue date Mar 22, 2005
- Hitachi, Ltd.
- Naoki Kanda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum processing apparatus, and a film deposition apparatus and a...
- Patent number 6,171,641
- Issue date Jan 9, 2001
- Hitachi, Ltd.
- Akira Okamoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vacuum processing device and film forming device and method using same
- Patent number 5,815,396
- Issue date Sep 29, 1998
- Hitachi, Ltd.
- Hideaki Shimamura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vacuum processing equipment, film coating equipment and deposition...
- Patent number 5,707,500
- Issue date Jan 13, 1998
- Hitachi, Ltd.
- Hideaki Shimamura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process for forming multilayer wiring
- Patent number 5,670,421
- Issue date Sep 23, 1997
- Hitachi, Ltd.
- Eisuke Nishitani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
CVD reactor apparatus
- Patent number 5,574,247
- Issue date Nov 12, 1996
- Hitachi, Ltd.
- Eisuke Nishitani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process for forming multilayer wiring
- Patent number 5,498,768
- Issue date Mar 12, 1996
- Hitachi, Ltd.
- Eisuke Nishitani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for selective deposition of metal thin film
- Patent number 4,979,466
- Issue date Dec 25, 1990
- Hitachi, Ltd.
- Eisuke Nishitani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for selective deposition of metal thin film
- Patent number 4,830,891
- Issue date May 16, 1989
- Hitachi, Ltd.
- Eisuke Nishitani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
MOS transistor devices and method of manufacturing same
- Publication number 20040145001
- Publication date Jul 29, 2004
- Hitachi, Ltd., Incorporation
- Naoki Kanda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MOS transistor apparatus and method of manufacturing same
- Publication number 20040051139
- Publication date Mar 18, 2004
- Hitachi, Ltd
- Naoki Kanda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MOS transistor apparatus and method of manufacturing same
- Publication number 20030183901
- Publication date Oct 2, 2003
- Hitachi, Ltd
- Naoki Kanda
- H01 - BASIC ELECTRIC ELEMENTS

Eisuke Nishitani

Person

Patents Grantslast 30 patents

MOS transistor apparatus and method of manufacturing same

MOS transistor apparatus and method of manufacturing same

Vacuum processing apparatus, and a film deposition apparatus and a...

Vacuum processing device and film forming device and method using same

Vacuum processing equipment, film coating equipment and deposition...

Process for forming multilayer wiring

CVD reactor apparatus

Process for forming multilayer wiring

Apparatus for selective deposition of metal thin film

Method for selective deposition of metal thin film

Patents Applicationslast 30 patents

MOS transistor devices and method of manufacturing same

MOS transistor apparatus and method of manufacturing same

MOS transistor apparatus and method of manufacturing same