Eitan Hajaj

Person

Ashqelon, IL

People

Patents Grantslast 30 patents

Information Patent Grant
Optical metrology utilizing short-wave infrared wavelengths
- Patent number 12,111,580
- Issue date Oct 8, 2024
- KLA Corporation
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Grant
Targets for diffraction-based overlay error metrology
- Patent number 12,105,414
- Issue date Oct 1, 2024
- KLA Corporation
- Itay Gdor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Overlay mark design for electron beam overlay
- Patent number 12,055,859
- Issue date Aug 6, 2024
- Inna Steely-Tarshish
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Overlay mark design for electron beam overlay
- Patent number 11,862,524
- Issue date Jan 2, 2024
- Inna Steely-Tarshish
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning overlay metrology using overlay targets having multiple sp...
- Patent number 11,796,925
- Issue date Oct 24, 2023
- KLA Corporation
- Yuval Lubashevsky
- G01 - MEASURING TESTING
Information Patent Grant
Multi-resolution overlay metrology targets
- Patent number 11,726,410
- Issue date Aug 15, 2023
- KLA Corporation
- Eitan Hajaj
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Overlay design for electron beam and scatterometry overlay measurem...
- Patent number 11,720,031
- Issue date Aug 8, 2023
- KLA Corporation
- Inna Steely-Tarshish
- G01 - MEASURING TESTING
Information Patent Grant
Overlay mark design for electron beam overlay
- Patent number 11,703,767
- Issue date Jul 18, 2023
- Inna Steely-Tarshish
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology targets for high topography semiconductor stacks
- Patent number 11,676,909
- Issue date Jun 13, 2023
- KLA Corporation
- Eitan Hajaj
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Single cell scatterometry overlay targets
- Patent number 10,837,919
- Issue date Nov 17, 2020
- KLA Corporation
- Eitan Hajaj
- G01 - MEASURING TESTING
Information Patent Grant
Process compatibility improvement by fill factor modulation
- Patent number 10,579,768
- Issue date Mar 3, 2020
- KLA-Tencor Corporation
- Vladimir Levinski
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
IMPROVED TARGETS FOR DIFFRACTION-BASED OVERLAY ERROR METROLOGY
- Publication number 20240118606
- Publication date Apr 11, 2024
- KLA Corporation
- Itay GDOR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-PITCH GRID OVERLAY TARGET FOR SCANNING OVERLAY METROLOGY
- Publication number 20240068804
- Publication date Feb 29, 2024
- KLA Corporation
- Yuval Lubashevsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OVERLAY MARK DESIGN FOR ELECTRON BEAM OVERLAY
- Publication number 20230324810
- Publication date Oct 12, 2023
- KLA Corporation
- Inna Steely-Tarshish
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SCANNING OVERLAY METROLOGY USING OVERLAY TARGETS HAVING MULTIPLE SP...
- Publication number 20230213875
- Publication date Jul 6, 2023
- Yuval Lubashevsky
- G01 - MEASURING TESTING
Information Patent Application
OVERLAY MARK DESIGN FOR ELECTRON BEAM OVERLAY
- Publication number 20220415725
- Publication date Dec 29, 2022
- KLA Corporation
- Inna Steely-Tarshish
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OVERLAY MARK DESIGN FOR ELECTRON BEAM OVERLAY
- Publication number 20220413395
- Publication date Dec 29, 2022
- KLA Corporation
- Inna Steely-Tarshish
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OVERLAY DESIGN FOR ELECTRON BEAM AND SCATTEROMETRY OVERLAY MEASUREM...
- Publication number 20220413394
- Publication date Dec 29, 2022
- KLA Corporation
- Inna Steely-Tarshish
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTI-RESOLUTION OVERLAY METROLOGY TARGETS
- Publication number 20220334501
- Publication date Oct 20, 2022
- KLA Corporation
- Eitan Hajaj
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL METROLOGY UTILIZING SHORT-WAVE INFRARED WAVELENGTHS
- Publication number 20220291143
- Publication date Sep 15, 2022
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Application
Metrology Targets for High Topography Semiconductor Stacks
- Publication number 20220020695
- Publication date Jan 20, 2022
- KLA Corporation
- Eitan Hajaj
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Single Cell Scatterometry Overlay Targets
- Publication number 20190137412
- Publication date May 9, 2019
- KLA-Tencor Corporation
- Eitan Hajaj
- G01 - MEASURING TESTING
Information Patent Application
Process Compatibility Improvement by Fill Factor Modulation
- Publication number 20180157784
- Publication date Jun 7, 2018
- KLA-Tencor Corporation
- Vladimir Levinski
- G06 - COMPUTING CALCULATING COUNTING

Eitan Hajaj

Person

Patents Grantslast 30 patents

Optical metrology utilizing short-wave infrared wavelengths

Targets for diffraction-based overlay error metrology

Overlay mark design for electron beam overlay

Overlay mark design for electron beam overlay

Scanning overlay metrology using overlay targets having multiple sp...

Multi-resolution overlay metrology targets

Overlay design for electron beam and scatterometry overlay measurem...

Overlay mark design for electron beam overlay

Metrology targets for high topography semiconductor stacks

Single cell scatterometry overlay targets

Process compatibility improvement by fill factor modulation

Patents Applicationslast 30 patents

IMPROVED TARGETS FOR DIFFRACTION-BASED OVERLAY ERROR METROLOGY

MULTI-PITCH GRID OVERLAY TARGET FOR SCANNING OVERLAY METROLOGY

OVERLAY MARK DESIGN FOR ELECTRON BEAM OVERLAY

SCANNING OVERLAY METROLOGY USING OVERLAY TARGETS HAVING MULTIPLE SP...

OVERLAY MARK DESIGN FOR ELECTRON BEAM OVERLAY

OVERLAY MARK DESIGN FOR ELECTRON BEAM OVERLAY

OVERLAY DESIGN FOR ELECTRON BEAM AND SCATTEROMETRY OVERLAY MEASUREM...

MULTI-RESOLUTION OVERLAY METROLOGY TARGETS

OPTICAL METROLOGY UTILIZING SHORT-WAVE INFRARED WAVELENGTHS

Metrology Targets for High Topography Semiconductor Stacks

Single Cell Scatterometry Overlay Targets

Process Compatibility Improvement by Fill Factor Modulation