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Eli DAGAN
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Sunnyvale, CA, US
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Patents Grants
last 30 patents
Information
Patent Grant
Atomic oxygen and ozone cleaning device having a temperature contro...
Patent number
11,964,068
Issue date
Apr 23, 2024
Applied Materials, Inc.
Banqiu Wu
A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information
Patent Grant
Atomic oxygen and ozone device for cleaning and surface treatment
Patent number
11,908,679
Issue date
Feb 20, 2024
Applied Materials, Inc.
Banqiu Wu
B08 - CLEANING
Information
Patent Grant
Pellicle adhesive residue removal system and methods
Patent number
11,467,508
Issue date
Oct 11, 2022
Applied Materials, Inc.
Banqiu Wu
B08 - CLEANING
Information
Patent Grant
Method for removing photoresist from photomask substrate
Patent number
11,114,350
Issue date
Sep 7, 2021
Applied Materials, Inc.
Banqiu Wu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Portion of layer removal at substrate edge
Patent number
11,054,746
Issue date
Jul 6, 2021
Applied Materials, Inc.
Banqiu Wu
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method and apparatus for high throughput photomask curing
Patent number
10,962,889
Issue date
Mar 30, 2021
Applied Materials, Inc.
Banqiu Wu
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Photomask pellicle glue residue removal
Patent number
10,933,624
Issue date
Mar 2, 2021
Applied Materials, Inc.
Banqiu Wu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Attachment feature removal from photomask in extreme ultraviolet li...
Patent number
10,928,724
Issue date
Feb 23, 2021
Applied Materials, Inc.
Banqiu Wu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Photomask laser etch
Patent number
10,802,392
Issue date
Oct 13, 2020
Applied Materials, Inc.
Banqiu Wu
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Photomask pellicle glue residue removal
Patent number
10,710,358
Issue date
Jul 14, 2020
Applied Materials, Inc.
Banqiu Wu
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
Information
Patent Application
ATOMIC OXYGEN AND OZONE CLEANING DEVICE HAVING A TEMPERATURE CONTRO...
Publication number
20220288259
Publication date
Sep 15, 2022
Applied Materials, Inc.
Banqiu WU
A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information
Patent Application
ADHESIVE MATERIAL REMOVAL FROM PHOTOMASK IN ULTRAVIOLET LITHOGRAPHY...
Publication number
20210185793
Publication date
Jun 17, 2021
Applied Materials, Inc.
Banqiu WU
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHOD FOR REMOVING PHOTORESIST FROM PHOTOMASK SUBSTRATE
Publication number
20200328128
Publication date
Oct 15, 2020
Applied Materials, Inc.
Banqiu WU
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PHOTOMASK PELLICLE GLUE RESIDUE REMOVAL
Publication number
20200290339
Publication date
Sep 17, 2020
Applied Materials, Inc.
Banqiu WU
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
ATTACHMENT FEATURE REMOVAL FROM PHOTOMASK IN EXTREME ULTRAVIOLET LI...
Publication number
20200183268
Publication date
Jun 11, 2020
Applied Materials, Inc.
Banqiu WU
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHOD AND APPARATUS FOR HIGH THROUGHPUT PHOTOMASK CURING
Publication number
20200166834
Publication date
May 28, 2020
Applied Materials, Inc.
Banqiu WU
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PORTION OF LAYER REMOVAL AT SUBSTRATE EDGE
Publication number
20200096860
Publication date
Mar 26, 2020
Applied Materials, Inc.
Banqiu WU
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
ATOMIC OXYGEN AND OZONE DEVICE FOR CLEANING AND SURFACE TREATMENT
Publication number
20200098556
Publication date
Mar 26, 2020
Applied Materials, Inc.
Banqiu WU
B08 - CLEANING
Information
Patent Application
PHOTOMASK LASER ETCH
Publication number
20200057362
Publication date
Feb 20, 2020
Applied Materials, Inc.
Banqiu WU
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PELLICLE ADHESIVE RESIDUE REMOVAL SYSTEM AND METHODS
Publication number
20200033740
Publication date
Jan 30, 2020
Applied Materials, Inc.
Banqiu WU
B08 - CLEANING
Information
Patent Application
PHOTOMASK PELLICLE GLUE RESIDUE REMOVAL
Publication number
20200009854
Publication date
Jan 9, 2020
Applied Materials, Inc.
Banqiu WU
B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS