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COBALT CHEMISTRY FOR SMOOTH TOPOLOGY
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Publication date May 5, 2022
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MacDermid Enthone Inc.
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C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
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Cobalt Filling of Interconnects
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Publication date Oct 28, 2021
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MacDermid Enthone Inc.
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John Commander
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C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
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COBALT CHEMISTRY FOR SMOOTH TOPOLOGY
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Publication number 20210180200
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Publication date Jun 17, 2021
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MacDermid Enthone Inc.
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Shaopeng Sun
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C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
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FILLING THROUGH-HOLES
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Publication number 20160105975
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Publication date Apr 14, 2016
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Rohm and Haas Electronic Materials L.L.C.
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Nagarajan JAYARAJU
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C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
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METHOD OF FILLING THROUGH-HOLES
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Publication number 20140262801
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Publication date Sep 18, 2014
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Nagarajan JAYARAJU
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C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
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METHOD OF FILLING THROUGH-HOLES
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Publication number 20140262799
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Publication date Sep 18, 2014
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Rohm and Haas Electronic Materials L.L.C.
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Nagarajan JAYARAJU
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C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
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METHOD OF ELECTROPLATING UNIFORM COPPER LAYERS
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Publication number 20120318676
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Publication date Dec 20, 2012
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Rohm and Haas Electronic Materials L.L.C.
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Elie H. NAJJAR
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C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
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PLATING BATH AND METHOD
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Publication number 20110290660
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Publication date Dec 1, 2011
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Rohm and Haas Electronic Materials L.L.C.
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Zukhra I. Niazimbetova
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C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
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Plating bath and method
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Publication number 20110220512
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Publication date Sep 15, 2011
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Rohm and Haas Electronic Materials L.L.C.
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Zukhra I. Niazimbetova
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C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
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Plating bath analysis
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Publication number 20020074244
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Publication date Jun 20, 2002
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Shipley Company, L.L.C.
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